Patents by Inventor Keitarou OGAWA

Keitarou OGAWA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • OPERATION METHOD OF VACUUM PROCESSING DEVICE
    Publication number: 20220051917
    Abstract: According to one embodiment, a vacuum processing device is provided which is capable of being controlled to create the most suitable gas flow under the situation where the device is placed by allowing a plurality of vacuum transfer chambers to communicate with each other via the intermediate chamber in an operation method of the vacuum processing device including the plurality of vacuum transfer chambers connected to each other via the intermediate chamber and a plurality of vacuum processing chambers respectively connected to the vacuum transfer chambers.
    Type: Application
    Filed: October 22, 2021
    Publication date: February 17, 2022
    Inventors: Ryoichi Isomura, Keitarou Ogawa, Takahiro Sakuragi
  • Operation method of vacuum processing device
    Patent number: 11195733
    Abstract: According to one embodiment, a vacuum processing device is provided which is capable of being controlled to create the most suitable gas flow under the situation where the device is placed by allowing a plurality of vacuum transfer chambers to communicate with each other via the intermediate chamber in an operation method of the vacuum processing device including the plurality of vacuum transfer chambers connected to each other via the intermediate chamber and a plurality of vacuum processing chambers respectively connected to the vacuum transfer chambers.
    Type: Grant
    Filed: March 22, 2019
    Date of Patent: December 7, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Ryoichi Isomura, Keitarou Ogawa, Takahiro Sakuragi
  • OPERATION METHOD OF VACUUM PROCESSING DEVICE
    Publication number: 20190295871
    Abstract: According to one embodiment, a vacuum processing device is provided which is capable of being controlled to create the most suitable gas flow under the situation where the device is placed by allowing a plurality of vacuum transfer chambers to communicate with each other via the intermediate chamber in an operation method of the vacuum processing device including the plurality of vacuum transfer chambers connected to each other via the intermediate chamber and a plurality of vacuum processing chambers respectively connected to the vacuum transfer chambers.
    Type: Application
    Filed: March 22, 2019
    Publication date: September 26, 2019
    Inventors: Ryoichi ISOMURA, Keitarou OGAWA, Takahiro SAKURAGI
  • Discharge chamber for a plasma processing apparatus
    Patent number: D907593
    Type: Grant
    Filed: July 18, 2017
    Date of Patent: January 12, 2021
    Assignee: Hitachi High-Tech Corporation
    Inventors: Nobuhide Nunomura, Keitarou Ogawa