Patents by Inventor Keith Douglas Campbell

Keith Douglas Campbell has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Solvent free aqueous polyurethane dispersions and methods of making and using the same
    Patent number: 9617453
    Abstract: Substantially solvent-free aqueous polyurethane dispersions and methods of making and using the same are provided. The substantially solvent-free aqueous polyurethane dispersions are provided in a substantially solvent-free system of a prepolymer made by reacting at least one polyol, at least one polyisocyanate, at least one isocyanate-reactive compound comprising one or more ionic or potential ionic groups, and at least one isocyanate chain terminating agent.
    Type: Grant
    Filed: December 6, 2010
    Date of Patent: April 11, 2017
    Assignee: AIR PRODUCTS AND CHEMICALS, INC.
    Inventors: Keith Douglas Campbell, Shiying Zheng, Shafiq Nisarali Fazel
  • Solvent Free Aqueous Polyurethane Dispersions and Methods of Making and Using the Same
    Publication number: 20110306724
    Abstract: Substantially solvent-free aqueous polyurethane dispersions and methods of making and using the same are provided. The substantially solvent-free aqueous polyurethane dispersions are provided in a substantially solvent-free system of a prepolymer made by reacting at least one polyol, at least one polyisocyanate, at least one isocyanate-reactive compound comprising one or more ionic or potential ionic groups, and at least one isocyanate chain terminating agent.
    Type: Application
    Filed: December 6, 2010
    Publication date: December 15, 2011
    Applicant: Air Products and Chemicals, Inc.
    Inventors: Keith Douglas Campbell, Shiying Zheng, Shafiq Nisarali Fazel
  • Compositions for preparing low dielectric materials
    Patent number: 7482676
    Abstract: Low dielectric materials and films comprising same have been identified for improved performance when used as performance materials, for example, in interlevel dielectrics integrated circuits as well as methods for making same. In one aspect of the present invention, the performance of the dielectric material may be improved by controlling the weight percentage of ethylene oxide groups in the at least one porogen.
    Type: Grant
    Filed: July 11, 2006
    Date of Patent: January 27, 2009
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Brian Keith Peterson, John Francis Kirner, Scott Jeffrey Weigel, James Edward MacDougall, Lisa Deis, Thomas Albert Braymer, Keith Douglas Campbell, Martin Devenney, C. Eric Ramberg, Konstantinos Chondroudis, Keith Cendak
  • Compositions for preparing low dielectric materials
    Patent number: 7294585
    Abstract: Low dielectric materials and films comprising same have been identified for improved performance when used as performance materials, for example, in interlevel dielectrics integrated circuits as well as methods for making same. In one aspect of the present invention, the performance of the dielectric material may be improved by controlling the weight percentage of ethylene oxide groups in the at least one porogen.
    Type: Grant
    Filed: July 11, 2006
    Date of Patent: November 13, 2007
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Brian Keith Peterson, John Francis Kirner, Scott Jeffrey Weigel, James Edward MacDougall, Lisa Deis, legal representative, Thomas Albert Braymer, Keith Douglas Campbell, Martin Devenney, C. Eric Ramberg, Konstantinos Chondroudis, Keith Cendak, Thomas Alan Deis, deceased
  • Compositions for preparing low dielectric materials
    Patent number: 7122880
    Abstract: Low dielectric materials and films comprising same have been identified for improved performance when used as performance materials, for example, in interlevel dielectrics integrated circuits as well as methods for making same. In one aspect of the present invention, the performance of the dielectric material may be improved by controlling the weight percentage of ethylene oxide groups in the at least one porogen.
    Type: Grant
    Filed: May 20, 2003
    Date of Patent: October 17, 2006
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Brian Keith Peterson, John Francis Kirner, Scott Jeffrey Weigel, James Edward MacDougall, Lisa Deis, Thomas Albert Braymer, Keith Douglas Campbell, Martin Devenney, C. Eric Ramberg, Konstantinos Chondroudis, Keith Cendak
  • Compositions for preparing low dielectric materials
    Publication number: 20040048960
    Abstract: Low dielectric materials and films comprising same have been identified for improved performance when used as performance materials, for example, in interlevel dielectrics integrated circuits as well as methods for making same. In one aspect of the present invention, the performance of the dielectric material may be improved by controlling the weight percentage of ethylene oxide groups in the at least one porogen.
    Type: Application
    Filed: May 20, 2003
    Publication date: March 11, 2004
    Inventors: Brian Keith Peterson, John Francis Kirner, Scott Jeffrey Weigel, James Edward MacDougall, Lisa Deis, Thomas Albert Braymer, Keith Douglas Campbell, Martin Devenney, C. Eric Ramberg, Konstantinos Chondroudis, Keith Cendak