Patents by Inventor Keith F. Best

Keith F. Best has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method for optimizing a lithography exposure process
    Patent number: 11531279
    Abstract: A method for correcting misalignments is provided. An alignment for each device of a group of devices mounted on a substrate is determined. An alignment error for the group of devices mounted on the substrate is determined based on the respective alignment for each device. One or more correction factors are calculated based on the alignment error. The alignment error is corrected based on the one or more correction factors.
    Type: Grant
    Filed: August 20, 2021
    Date of Patent: December 20, 2022
    Assignee: Onto Innovation Inc.
    Inventors: Elvino da Silveira, Keith F. Best, Wayne Fitzgerald, Jian Lu, Xin Song, J. Casey Donaher, Christopher J. McLaughlin
  • SYSTEM AND METHOD FOR OPTIMIZING A LITHOGRAPHY EXPOSURE PROCESS
    Publication number: 20220075282
    Abstract: A method for correcting misalignments is provided. An alignment for each device of a group of devices mounted on a substrate is determined. An alignment error for the group of devices mounted on the substrate is determined based on the respective alignment for each device. One or more correction factors are calculated based on the alignment error. The alignment error is corrected based on the one or more correction factors.
    Type: Application
    Filed: August 20, 2021
    Publication date: March 10, 2022
    Inventors: Elvino da Silveira, Keith F. Best, Wayne Fitzgerald, Jian Lu, Xin Song, J. Casey Donaher, Christopher J. McLaughlin