Abstract: A system for assembling a group composite image from individual subject images is described. Often subjects of a group vary in height. Additionally, as each subject is photographed individually, different zoom factors can be applied by a camera that affects a pixel density of the image captured. The system includes a fiducial marking device that emits collimated light to form one or more fiducial markers on a subject while an image is captured by the camera. Based on a location of the fiducial markers in the image, a pixel density of the image and a reference height of the subject can be determined. The individual subject image can be scaled based on the pixel density and reference height to account for the varying subject heights and zoom factors to generate a group composite image that accurately represents the subjects of the group relative to one another.

Abstract: The modular tubular exhaust system includes a first tubular body, a second tubular body and at least one third tubular body connecting to form, a fully assembled configuration, a vertically arranged exhaust pipe. The first, the second, and the third tubular bodies each have a tubular body first end and a tubular body second end where the first ends and second ends are configured to mate with each other to form the vertically arranged exhaust pipe. The system further includes tabs that extend radially outward on opposing sides of the tubular bodies to allow a plurality of fasteners to attach tubular bodies together when arranged in the vertical configuration. The assembled configuration may vary within the spirit and scope of the disclosure, for example, in some embodiments, the system may only have a first and a second tubular section or a first, second, and a plurality of third tubular sections.

Abstract: A method and apparatus for biogas extraction. The method includes obtaining a set of images that includes a field of view encompassing at least a portion of the flexible roof and a background; generating a sample region having a first end overlapping only the flexible roof and a second end overlapping only the background; determining an average pixel color of an end slice located at the first end or the second end of the sample region; determining, based on the average pixel color of the end slice of the sample region, a fill percentage of the sample region attributed to an object overlapped by the end slice; estimating an amount of inflation of the flexible roof based on the fill percentage and a correlation between fill percentages of the sample region and predetermined amounts of inflation included in calibration data; and controlling extraction of the biogas based on the estimation.

Abstract: Methods and apparatus to allocate bandwidth between first and second subscribers of a communications network are disclosed. An example method includes, based on a projection that a first data allotment for a first network access account of the first subscriber within a time period will be exceeded, identifying the second subscriber. The first and second subscribers are in a same subscriber group. The second subscriber is projected to have a second network data usage that is below a second data allotment for a second network access account of the second subscriber within the time period. The first and second subscribers have different billing addresses. Assent from the second subscriber to transfer a portion of the second data allotment to the first subscriber is determined. In response, the portion of the second data allotment from the second network access account is transferred to the first network access account.

Abstract: Methods and apparatus to allocate bandwidth between first and second subscribers of a communications network are disclosed. An example method includes, based on a projection that a first data allotment for a first network access account of the first subscriber within a time period will be exceeded, identifying the second subscriber. The first and second subscribers are in a same subscriber group. The second subscriber is projected to have a second network data usage that is below a second data allotment for a second network access account of the second subscriber within the time period. The first and second subscribers have different billing addresses. Assent from the second subscriber to transfer a portion of the second data allotment to the first subscriber is determined. In response, the portion of the second data allotment from the second network access account is transferred to the first network access account.

Abstract: Methods and apparatus to allocate bandwidth between subscribers of a communications network are disclosed. An example method to allocate bandwidth between subscribers of a communications network includes projecting that a first network data usage of a first subscriber of the network service provider will exceed a first data allotment for a first network access account of the first subscriber within a time period. The example method also includes identifying a second subscriber of the network service provider who is included in a subscriber group with the first subscriber and projected to have a second network data usage that is below a second data allotment for a second account of the second subscriber within that time period. The example method also includes requesting assent from the second subscriber to transfer a portion of the second data allotment to the first subscriber.

Abstract: Methods and apparatus to allocate bandwidth between subscribers of a communications network are disclosed. An example method to allocate bandwidth between subscribers of a communications network includes projecting that a first network data usage of a first subscriber of the network service provider will exceed a first data allotment for a first network access account of the first subscriber within a time period. The example method also includes identifying a second subscriber of the network service provider who is included in a subscriber group with the first subscriber and projected to have a second network data usage that is below a second data allotment for a second account of the second subscriber within that time period. The example method also includes requesting assent from the second subscriber to transfer a portion of the second data allotment to the first subscriber.

Abstract: A chemical vapor deposition process for preparing a low dielectric constant organosilicate (OSG) having enhanced mechanical properties by adjusting the amount of organic groups, such as methyl groups, within the mixture is disclosed herein. In one embodiment of the present invention, the OSG film is deposited from a mixture comprising a first silicon-containing precursor that comprises from 3 to 4 Si—O bonds per Si atom, from 0 to 1 of bonds selected from the group consisting of Si—H, Si—Br, and Si—Cl bonds per Si atom and no Si—C bonds and a second silicon-containing precursor that comprises at least one Si—C bond per Si atom. In another embodiment of the present invention, the OSG film is deposited from a mixture comprising an asymmetric silicon-containing precursor. In either embodiment, the mixture may further contain a porogen precursor to provide a porous OSG film.

Abstract: A method of generating an authentication code for a consumable in an imaging device, includes the steps of: an identification number assigned to the consumable; processing an indemnification number assigned to the consumable using a first algorithm to generate a preliminary number different from the identification number; and compressing the preliminary number using a compression algorithm that utilizes the identification number to generate the authentication code.

Abstract: The invention relates to an improvement in a cell which is normally susceptible to damage from overcharging comprised of a negative electrode, a positive electrode, and an electrolyte comprised of an overcharge protection salt carried in a carrier or solvent. Representative overcharge protection salts are embraced by the formula: MaQ where M is an electrochemically stable cation selected from the group consisting of alkali metal, alkaline earth metal, tetraalkylammonium, or imidazolium groups, and Q is a borate or heteroborate cluster and a is the integer 1 or 2.

Abstract: An image forming device including an electronic filing cabinet is provided. The electronic filing cabinet stores documents output from the image forming device or read into the image forming device. The electronic filing cabinet may include an optical character recognition unit, an indexing engine and a storage device. The optical character recognition unit scans or otherwise inspects the documents and generates timestamps for the documents. The scanned information is provided to the indexing engine. The indexing engine classifies and indexes the documents according to a first predefined set of rules. Thereafter, the indexed documents are stored in the storage device. A human machine interface is provided for updating the first predefined set of rules. Previously stored documents may also be retrieved through the human machine interface.

Abstract: Silica-based materials and films having a dielectric constant of 3.7 or below and compositions and methods for making and using same are disclosed herein. In one aspect, there is provided a composition for preparing a silica-based material comprising an at least one silica source, a solvent, an at least one porogen, optionally a catalyst, and optionally a flow additive wherein the solvent boils at a temperature ranging from 90° C. to 170° C. and is selected from the group of compounds represented by the following formulas: HO—CHR8—CHR9—CH2—CHR10R11 where R8, R9, R10 and R11 can independently be an alkyl group ranging from 1 to 4 carbon atoms or a hydrogen atom; and R12—CO—R13 where R12 is a hydrocarbon group having from 3 to 6 carbon atoms; R13 is a hydrocarbon group having from 1 to 3 carbon atoms; and mixtures thereof.

Abstract: Low dielectric materials and films comprising same have been identified for improved performance when used as performance materials, for example, in interlevel dielectrics integrated circuits as well as methods for making same. In one aspect of the present invention, the performance of the dielectric material may be improved by controlling the weight percentage of ethylene oxide groups in the at least one porogen.

Abstract: Low dielectric materials and films comprising same have been identified for improved performance when used as interlevel dielectrics in integrated circuits as well as methods for making same. These materials are characterized as having a dielectric constant (?) a dielectric constant of about 3.7 or less; a normalized wall elastic modulus (E0?), derived in part from the dielectric constant of the material, of about 15 GPa or greater; and a metal impurity level of about 500 ppm or less. Low dielectric materials are also disclosed having a dielectric constant of less than about 1.95 and a normalized wall elastic modulus (E0?), derived in part from the dielectric constant of the material, of greater than about 26 GPa.

Abstract: Low dielectric materials and films comprising same have been identified for improved performance when used as performance materials, for example, in interlevel dielectrics integrated circuits as well as methods for making same. In one aspect of the present invention, the performance of the dielectric material may be improved by controlling the weight percentage of ethylene oxide groups in the at least one porogen.

Abstract: Low dielectric materials and films comprising same have been identified for improved performance when used as interlevel dielectrics in integrated circuits as well as methods for making same. These materials are characterized as having a dielectric constant (?) a dielectric constant of about 3.7 or less; a normalized wall elastic modulus (E0?), derived in part from the dielectric constant of the material, of about 15 GPa or greater; and a metal impurity level of about 500 ppm or less. Low dielectric materials are also disclosed having a dielectric constant of less than about 1.95 and a normalized wall elastic modulus (E0?), derived in part from the dielectric constant of the material, of greater than about 26 GPa.

Abstract: Low dielectric materials and films comprising same have been identified for improved performance when used as performance materials, for example, in interlevel dielectrics integrated circuits as well as methods for making same. In one aspect of the present invention, the performance of the dielectric material may be improved by controlling the weight percentage of ethylene oxide groups in the at least one porogen.

Abstract: A chemical vapor deposition process for preparing a low dielectric constant organosilicate (OSG) having enhanced mechanical properties by adjusting the amount of organic groups, such as methyl groups, within the mixture is disclosed herein. In one embodiment of the present invention, the OSG film is deposited from a mixture comprising a first silicon-containing precursor that comprises from 3 to 4 Si—O bonds per Si atom, from 0 to 1 of bonds selected from the group consisting of Si—H, Si—Br, and Si—Cl bonds per Si atom and no Si—C bonds and a second silicon-containing precursor that comprises at least one Si—C bond per Si atom. In another embodiment of the present invention, the OSG film is deposited from a mixture comprising an asymmetric silicon-containing precursor. In either embodiment, the mixture may further contain a porogen precursor to provide a porous OSG film.

Abstract: Organosilica glass and organic polymeric films useful for electronic devices and methods for making same are disclosed herein. In one embodiment of the present invention, there is provided a method for enhancing the chemical vapor deposition of a film comprising an organic species comprising: providing a substrate within a reaction chamber; introducing into the chamber gaseous chemical reagents comprising an organic precursor having carbon and hydrogen bonds contained therein and a rate enhancer wherein the rate enhancer is at least one member selected from the group consisting of an oxygen-containing compound; a peroxide compound having the formula R1OOR2; a peracid compound having the formula R3C(O)OC(O)R4; a fluorine-containing compound; and a heavy inert gas; and applying energy to the chemical reagents in the reaction chamber sufficient to induce the reaction of the reagents and deposit the film upon at least a portion of the substrate.

Abstract: Organofluorosilicate glass films contain both organic species and inorganic fluorines, exclusive of significant amounts of fluorocarbon species. Preferred films are represented by the formula SivOwCxHyFz, where v+w+x+y+z=100%, v is from 10 to 35 atomic %, w is from 10 to 65 atomic % y is from 10 to 50 atomic %, x is from 1 to 30 atomic %, z is from 0.1 to 15 atomic %, and x/z is optionally greater than 0.25, wherein substantially none of the fluorine is bonded to the carbon. A CVD method includes: (a) providing a substrate within a vacuum chamber; (b) introducing into the vacuum chamber gaseous reagents including a fluorine-providing gas, an oxygen-providing gas and at least one precursor gas selected from an organosilane and an organosiloxane; and (c) applying energy to the gaseous reagents in the chamber to induce reaction of the gaseous reagents and to form the film on the substrate.