Patents by Inventor Ken K. Lee
Ken K. Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240150099Abstract: A water-soluble film, comprising a first water-soluble film, wherein the first water soluble film disintegrates in water within less than about 24 hours and dissolves in water within less than about 48 hours as measured by the MSTM-205 at 20° C. The disclosure provides a water-soluble film comprising a first water-soluble film that disintegrates in water within less than 24 hours and dissolves in water within less than 48 hours as measured by MSTM-205 at 20° C. The first water-soluble film optionally may be further characterized in that it does not disintegrate in water for at least about 1 hour and does not dissolve in water for at least about 1 hour as measured by MSTM-205 at 20° C. The disclosure further provides a water-soluble film comprising a first water-soluble film characterized in that the degradation and/or dissolution of the first water-soluble film is adapted to be activated by consumer handling.Type: ApplicationFiled: December 13, 2023Publication date: May 9, 2024Inventors: David M. Lee, Jennifer L. Childers, Lee K. Yeung, Ken Jenke, Jonathon Knight, Nicholas Zeese, P. Scott Bening, Yashodhan S. Parulekar, Sumeet Kumar
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Patent number: 7433031Abstract: A defect review system includes a stage, a light source, a turning mirror, and a ring of collectors. The stage supports and moves an article for inspection, the article having a surface. The light source provides light. The turning mirror turns the light toward the surface at an oblique incident angle whereby the light illuminates a spot on the surface and the light scatters from the spot. The ring of collectors is adapted to collect scattering light. A method of reviewing surface of a wafer is disclosed. The method provides a dark-field mode of operation adapted to inspect the surface by illuminating a spot on the surface at an oblique angle and collecting scattering light from the surface. Further, the method provides a bright-field mode of operation adapted to inspect the surface by illuminating a spot on the surface at a normal angle to examine the reflecting light.Type: GrantFiled: October 28, 2004Date of Patent: October 7, 2008Assignee: Core Tech Optical, Inc.Inventors: James J. Xu, Ken K. Lee
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Patent number: 7384806Abstract: A method is described for characterizing defects on a test surface of a semiconductor wafer using a confocal-microscope-based automatic defect characterization (ADC) system. The surface to be tested and a reference surface are scanned using a confocal microscope to obtain three-dimensional images of the test and reference surfaces. The test and reference images are converted into sets of geometric constructs, or “primitives,” that are used to approximate features of the images. Next, the sets of test and reference primitives are compared to determine whether the set of test primitives is different from the set of reference primitives. If such a difference exists, then the difference data is used to generate defect parameters, which are then compared to a knowledge base of defect reference data. Based on this comparison, the ADC system characterizes the defect and estimates a degree of confidence in the characterization.Type: GrantFiled: December 21, 2006Date of Patent: June 10, 2008Assignee: KLA-Tencor CorporationInventors: Bruce W. Worster, Ken K. Lee
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Patent number: 7154605Abstract: A method is described for characterizing defects on a test surface of a semiconductor wafer using a confocal-microscope-based automatic defect characterization (ADC) system. The surface to be tested and a reference surface are scanned using a confocal microscope to obtain three-dimensional images of the test and reference surfaces. The test and reference images are converted into sets of geometric constructs, or “primitives,” that are used to approximate features of the images. Next, the sets of test and reference primitives are compared to determine whether the set of test primitives is different from the set of reference primitives. If such a difference exists, then the difference data is used to generate defect parameters, which are then compared to a knowledge base of defect reference data. Based on this comparison, the ADC system characterizes the defect and estimates a degree of confidence in the characterization.Type: GrantFiled: May 8, 2003Date of Patent: December 26, 2006Assignee: KLA-Tencor CorporationInventors: Bruce W. Worster, Ken K. Lee
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Patent number: 7110106Abstract: An inspection system includes a stage, a light source, and a light collection subsystem is disclosed. The stage supports an article for inspection, the article having a surface. The light source provides light impinging on and scattering from an illumination area of the surface. The light collection system includes a plurality of collectors arranged generally in a semi-spherical layout such that each collector collects at least a portion of the scattering light at a collection polar angle and a collection azimuthal angle that are unique relative to collection polar angle and collection azimuthal angle of other collectors. The collectors are arranged in three rings of collectors. The inspection system includes a plurality of channels where each collector of the light collection subsystem is associated with a channel. The inspection system includes a processor connected to the channels. The processor is adapted to process information from the channels.Type: GrantFiled: October 28, 2004Date of Patent: September 19, 2006Assignee: CoreTech Optical, Inc.Inventors: James J. Xu, Ken K. Lee
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Patent number: 6661515Abstract: A method is described for characterizing defects on a test surface of a semiconductor wafer using a confocal-microscope-based automatic defect characterization (ADC) system. The surface to be tested and a reference surface are scanned using a confocal microscope to obtain three-dimensional images of the test and reference surfaces. The test and reference images are converted into sets of geometric constructs, or “primitives,” that are used to approximate features of the images. Next, the sets of test and reference primitives are compared to determine whether the set of test primitives is different from the set of reference primitives. If such a difference exists, then the difference data is used to generate defect parameters, which are then compared to a knowledge base of defect reference data. Based on this comparison, the ADC system characterizes the defect and estimates a degree of confidence in the characterization.Type: GrantFiled: September 11, 2001Date of Patent: December 9, 2003Assignee: KLA-Tencor CorporationInventors: Bruce W. Worster, Ken K. Lee
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Patent number: 6650096Abstract: A switching regulator includes an inductive element to provide a first voltage across the element and at least one switch to energize and de-energize the inductive element to produce an output voltage. A controller of the regulator constructs an indication of a current from the first voltage and operates the switch(es) to regulate the output voltage in response to the indication.Type: GrantFiled: December 19, 2002Date of Patent: November 18, 2003Assignee: Intel CorporationInventor: Ken K. Lee
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Publication number: 20030203520Abstract: A method is described for characterizing defects on a test surface of a semiconductor wafer using a confocal-microscope-based automatic defect characterization (ADC) system. The surface to be tested and a reference surface are scanned using a confocal microscope to obtain three-dimensional images of the test and reference surfaces. The test and reference images are converted into sets of geometric constructs, or “primitives,” that are used to approximate features of the images. Next, the sets of test and reference primitives are compared to determine whether the set of test primitives is different from the set of reference primitives. If such a difference exists, then the difference data is used to generate defect parameters, which are then compared to a knowledge base of defect reference data. Based on this comparison, the ADC system characterizes the defect and estimates a degree of confidence in the characterization.Type: ApplicationFiled: May 8, 2003Publication date: October 30, 2003Inventors: Bruce W. Worster, Ken K. Lee
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Patent number: 6631556Abstract: A fixture to couple an integrated circuit to a circuit board is disclosed and claimed. The fixture includes a base member and a holder to retain the circuit board in a selected position relative to the base member. A clamp assembly is included to hold a package containing the integrated circuit in a predetermined position on the circuit board and to cause electrical contact between the integrated circuit and the circuit board.Type: GrantFiled: May 30, 2001Date of Patent: October 14, 2003Assignee: Intel CorporationInventor: Ken K. Lee
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Patent number: 6614136Abstract: A switching regulator includes an inductive element to provide a first voltage across the element and at least one switch to energize and de-energize the inductive element to produce an output voltage. A controller of the regulator constructs an indication of a current from the first voltage and operates the switch(es) to regulate the output voltage in response to the indication.Type: GrantFiled: December 19, 2002Date of Patent: September 2, 2003Assignee: Intel CorporationInventor: Ken K. Lee
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Publication number: 20030085692Abstract: A switching regulator includes an inductive element to provide a first voltage across the element and at least one switch to energize and de-energize the inductive element to produce an output voltage. A controller of the regulator constructs an indication of a current from the first voltage and operates the switch(es) to regulate the output voltage in response to the indication.Type: ApplicationFiled: December 19, 2002Publication date: May 8, 2003Inventor: Ken K. Lee
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Publication number: 20030085694Abstract: A switching regulator includes an inductive element to provide a first voltage across the element and at least one switch to energize and de-energize the inductive element to produce an output voltage. A controller of the regulator constructs an indication of a current from the first voltage and operates the switch(es) to regulate the output voltage in response to the indication.Type: ApplicationFiled: December 19, 2002Publication date: May 8, 2003Inventor: Ken K. Lee
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Patent number: 6534962Abstract: A switching regulator includes an inductive element to provide a first voltage across the element and at least one switch to energize and de-energize the inductive element to produce an output voltage. A controller of the regulator constructs an indication of a current from the first voltage and operates the switch(es) to regulate the output voltage in response to the indication.Type: GrantFiled: November 21, 2000Date of Patent: March 18, 2003Assignee: Intel CorporationInventor: Ken K. Lee
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Publication number: 20020178577Abstract: A fixture to couple an integrated circuit to a circuit board is disclosed and claimed. The fixture includes a base member and a holder to retain the circuit board in a selected position relative to the base member. A clamp assembly is included to hold a package containing the integrated circuit in a predetermined position on the circuit board and to cause electrical contact between the integrated circuit and the circuit board.Type: ApplicationFiled: May 30, 2001Publication date: December 5, 2002Applicant: Intel CorporationInventor: Ken K. Lee
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Publication number: 20020012118Abstract: A method is described for characterizing defects on a test surface of a semiconductor wafer using a confocal-microscope-based automatic defect characterization (ADC) system. The surface to be tested and a reference surface are scanned using a confocal microscope to obtain three-dimensional images of the test and reference surfaces. The test and reference images are converted into sets of geometric constructs, or “primitives,” that are used to approximate features of the images. Next, the sets of test and reference primitives are compared to determine whether the set of test primitives is different from the set of reference primitives. If such a difference exists, then the difference data is used to generate defect parameters, which are then compared to a knowledge base of defect reference data. Based on this comparison, the ADC system characterizes the defect and estimates a degree of confidence in the characterization.Type: ApplicationFiled: September 11, 2001Publication date: January 31, 2002Inventors: Bruce W. Worster, Ken K. Lee
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Patent number: 6288782Abstract: A method is described for characterizing defects on a test surface of a semiconductor wafer using a confocal-microscope-based automatic defect characterization (ADC) system. The surface to be tested and a reference surface are scanned using a confocal microscope to obtain three-dimensional images of the test and reference surfaces. The test and reference images are converted into sets of geometric constructs, or “primitives,” that are used to approximate features of the images. Next, the sets of test and reference primitives are compared to determine whether the set of test primitives is different from the set of reference primitives. If such a difference a exists, then the difference data is used to generate defect parameters, which are then compared to a knowledge base of defect reference data. Based on this comparison, the ADC system characterizes the defect and estimates a degree of confidence in the characterization.Type: GrantFiled: May 5, 1999Date of Patent: September 11, 2001Assignee: Ultrapointe CorporationInventors: Bruce W. Worster, Ken K. Lee
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Patent number: 6069690Abstract: A system for analyzing an object has two operating modes such as scanned imaging mode and stop scan spectral analysis mode. A beam scanner is optically connected to a laser to receive laser beams from the laser. Beam scanner also scans the beams if the system is in the scanned imaging mode. A lens (e.g., an objective lens) is optically coupled to the beam scanner to focus the beams received from the beam scanner. A sensor is optically coupled to the lens to receive the beams that reflect from the object. The sensor may detect characteristics of the beam such as color and intensity. A spectrometer is optically coupled to the objective lens. During stop scan spectral analysis mode, spectrometer generates wavelength spectrum data.Type: GrantFiled: November 13, 1998Date of Patent: May 30, 2000Assignee: Uniphase CorporationInventors: James J. Xu, Bruce Worster, Ken K. Lee
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Patent number: 5963314Abstract: A laser imaging system is used to analyze defects on semiconductor wafers that have been detected by patterned wafer defect detecting systems (wafer scanners). The laser imaging system replaces optical microscope review stations now utilized in the semiconductor fab environment to examine detected optical anomalies that may represent wafer defects. In addition to analyzing defects, the laser imaging system can perform a variety of microscopic inspection functions including defect detection and metrology. The laser imaging system uses confocal laser scanning microscopy techniques, and operates under class 1 cleanroom conditions and without exposure of the wafers to operator contamination or airflow.Type: GrantFiled: October 15, 1996Date of Patent: October 5, 1999Assignee: Ultrapointe CorporationInventors: Bruce W. Worster, Dale E. Crane, Hans J. Hansen, Christopher R. Fairley, Ken K. Lee
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Patent number: 5923430Abstract: A method is described for characterizing defects on a test surface of a semiconductor wafer using a confocal-microscope-based automatic defect characterization (ADC) system. The surface to be tested and a reference surface are scanned using a confocal microscope to obtain three-dimensional images of the test and reference surfaces. The test and reference images are converted into sets of geometric constructs, or "primitives," that are used to approximate features of the images. Next, the sets of test and reference primitives are compared to determine whether the set of test primitives is different from the set of reference primitives. If such a difference exists, then the difference data is used to generate defect parameters, which are then compared to a knowledge base of defect reference data. Based on this comparison, the ADC system characterizes the defect and estimates a degree of confidence in the characterization.Type: GrantFiled: February 3, 1997Date of Patent: July 13, 1999Assignee: Ultrapointe CorporationInventors: Bruce W. Worster, Ken K. Lee
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Patent number: 5808735Abstract: 10A method is described for detecting and characterizing defects on a test surface of a semiconductor wafer. A three-dimensional image of the test surface is aligned and compared with a three-dimensional image of a defect-free reference surface. Intensity differences between corresponding pixels in the two images that exceed a predefined threshold value are deemed defect pixels. According to the method, the pixels of the reference image are grouped according to their respective z values (elevation) to identify different physical layers of the reference surface. Because different surface layers can have different image properties, such as reflectance and image texture, the groups of pixels are analyzed separately to determine an optimal threshold value for each of the groups, and therefore for each layer of the reference surface.Type: GrantFiled: November 26, 1996Date of Patent: September 15, 1998Assignee: Ultrapointe CorporationInventors: Ken K. Lee, Ke Han, Lakshman Srinivasan, Bruce W. Worster