Patents by Inventor Ken Kinsun Lee

Ken Kinsun Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230087619
    Abstract: A three-dimensional (3D) microscope includes various insertable components that facilitate multiple imaging and measurement capabilities. These capabilities include Nomarski imaging, polarized light imaging, quantitative differential interference contrast (q-DIC) imaging, motorized polarized light imaging, phase-shifting interferometry (PSI), and vertical-scanning interferometry (VSI).
    Type: Application
    Filed: November 28, 2022
    Publication date: March 23, 2023
    Inventors: James Jianguo Xu, Ken Kinsun Lee, Rusmin Kudinar, Ronny Soetarman, Hung Phi Nguyen, Zhen Hou
  • Patent number: 11536940
    Abstract: A three-dimensional (3D) microscope includes various insertable components that facilitate multiple imaging and measurement capabilities. These capabilities include Nomarski imaging, polarized light imaging, quantitative differential interference contrast (q-DIC) imaging, motorized polarized light imaging, phase-shifting interferometry (PSI), and vertical-scanning interferometry (VSI).
    Type: Grant
    Filed: December 2, 2020
    Date of Patent: December 27, 2022
    Assignee: KLA-Tencor Corporation
    Inventors: James Jianguo Xu, Ken Kinsun Lee, Rusmin Kudinar, Ronny Soetarman, Hung Phi Nguyen, Zhen Hou
  • Patent number: 11294161
    Abstract: A three-dimensional (3D) microscope includes various insertable components that facilitate multiple imaging and measurement capabilities. These capabilities include Nomarski imaging, polarized light imaging, quantitative differential interference contrast (q-DIC) imaging, motorized polarized light imaging, phase-shifting interferometry (PSI), and vertical-scanning interferometry (VSI).
    Type: Grant
    Filed: December 2, 2020
    Date of Patent: April 5, 2022
    Assignee: KLA-Tencor Corporation
    Inventors: James Jianguo Xu, Ken Kinsun Lee, Rusmin Kudinar, Ronny Soetarman, Hung Phi Nguyen, Zhen Hou
  • Publication number: 20210088768
    Abstract: A three-dimensional (3D) microscope includes various insertable components that facilitate multiple imaging and measurement capabilities. These capabilities include Nomarski imaging, polarized light imaging, quantitative differential interference contrast (q-DIC) imaging, motorized polarized light imaging, phase-shifting interferometry (PSI), and vertical-scanning interferometry (VSI).
    Type: Application
    Filed: December 2, 2020
    Publication date: March 25, 2021
    Inventors: James Jianguo Xu, Ken Kinsun Lee, Rusmin Kudinar, Ronny Soetarman, Hung Phi Nguyen, Zhen Hou
  • Publication number: 20210080710
    Abstract: A three-dimensional (3D) microscope includes various insertable components that facilitate multiple imaging and measurement capabilities. These capabilities include Nomarski imaging, polarized light imaging, quantitative differential interference contrast (q-DIC) imaging, motorized polarized light imaging, phase-shifting interferometry (PSI), and vertical-scanning interferometry (VSI).
    Type: Application
    Filed: December 2, 2020
    Publication date: March 18, 2021
    Inventors: James Jianguo Xu, Ken Kinsun Lee, Rusmin Kudinar, Ronny Soetarman, Hung Phi Nguyen, Zhen Hou
  • Patent number: 10884228
    Abstract: A three-dimensional (3D) microscope includes various insertable components that facilitate multiple imaging and measurement capabilities. These capabilities include Nomarski imaging, polarized light imaging, quantitative differential interference contrast (q-DIC) imaging, motorized polarized light imaging, phase-shifting interferometry (PSI), and vertical-scanning interferometry (VSI).
    Type: Grant
    Filed: August 7, 2018
    Date of Patent: January 5, 2021
    Assignee: KLA-Tencor Corporation
    Inventors: James Jianguo Xu, Ken Kinsun Lee, Rusmin Kudinar, Ronny Soetarman, Hung Phi Nguyen, Zhen Hou
  • Patent number: 10209501
    Abstract: A three-dimensional (3D) microscope for patterned substrate measurement can include an objective lens, a reflected illuminator, a transmitted illuminator, a focusing adjustment device, an optical sensor, and a processor. The focusing adjustment device can automatically adjust the objective lens focus at a plurality of Z steps. The optical sensor can be capable of acquiring images at each of these Z steps. The processor can control the reflected illuminator, the transmitted illuminator, the focusing adjustment device, and the optical sensor. The processor can be configured to capture first and second images at multiple Z steps, the first image with the pattern using the reflected illuminator and the second image without the pattern using one of the reflected illuminator and the transmitted illuminator.
    Type: Grant
    Filed: May 9, 2016
    Date of Patent: February 19, 2019
    Assignee: KLA-Tencor Corporation
    Inventors: Zhen Hou, James Jianguo Xu, Ken Kinsun Lee, James Nelson Stainton, Hung Phi Nguyen, Rusmin Kudinar, Ronny Soetarman
  • Patent number: 10157457
    Abstract: A method of generating 3D information of a sample using an optical microscope includes: varying the distance between the sample and an objective lens of the optical microscope at pre-determined steps, capturing an image at each pre-determined step, determining a characteristic value of each pixel in each captured image, determining a first captured image that is focused on a first surface of the sample based on the characteristic value of each pixel in each captured image, and determining a measurement of an opening in the first surface of the sample based on the first captured image. The first surface of the sample and the second surface of the sample are within a field of view of each of the captured images. The first captured image includes a pattern overlay. In another example, the opening measurement is determined using a second captured image without a pattern overlay.
    Type: Grant
    Filed: October 31, 2016
    Date of Patent: December 18, 2018
    Assignee: KLA-TENCOR CORPORATION
    Inventors: James Jianguo Xu, Ronny Soetarman, Ken Kinsun Lee, Nitigya Kathuria
  • Publication number: 20180356623
    Abstract: A three-dimensional (3D) microscope includes various insertable components that facilitate multiple imaging and measurement capabilities. These capabilities include Nomarski imaging, polarized light imaging, quantitative differential interference contrast (q-DIC) imaging, motorized polarized light imaging, phase-shifting interferometry (PSI), and vertical-scanning interferometry (VSI).
    Type: Application
    Filed: August 7, 2018
    Publication date: December 13, 2018
    Inventors: James Jianguo Xu, Ken Kinsun Lee, Rusmin Kudinar, Ronny Soetaman, Hung Phi Nguyen, Zhen Hou
  • Patent number: 10048480
    Abstract: A three-dimensional (3D) microscope includes various insertable components that facilitate multiple imaging and measurement capabilities. These capabilities include Nomarski imaging, polarized light imaging, quantitative differential interference contrast (q-DIC) imaging, motorized polarized light imaging, phase-shifting interferometry (PSI), and vertical-scanning interferometry (VSI).
    Type: Grant
    Filed: December 21, 2011
    Date of Patent: August 14, 2018
    Assignee: Zeta Instruments, Inc.
    Inventors: James Jianguo Xu, Ken Kinsun Lee, Rusmin Kudinar, Ronny Soetarman, Hung Phi Nguyen, Zhen Hou
  • Publication number: 20180047148
    Abstract: A method of generating 3D information of a sample using an optical microscope includes: varying the distance between the sample and an objective lens of the optical microscope at pre-determined steps, capturing an image at each pre-determined step, determining a characteristic value of each pixel in each captured image, determining a first captured image that is focused on a first surface of the sample based on the characteristic value of each pixel in each captured image, and determining a measurement of an opening in the first surface of the sample based on the first captured image. The first surface of the sample and the second surface of the sample are within a field of view of each of the captured images. The first captured image includes a pattern overlay. In another example, the opening measurement is determined using a second captured image without a pattern overlay.
    Type: Application
    Filed: October 31, 2016
    Publication date: February 15, 2018
    Inventors: James Jianguo Xu, Ronny Soetarman, Ken Kinsun Lee, Nitigya Kathuria
  • Patent number: 9664888
    Abstract: A method of detecting multi-surfaces of an object includes providing an imaging system capable of detecting surfaces of the object. After system parameters are set up, two-dimensional images of the object at multiple Z steps can be acquired. Each surface of the object can then be extracted using two steps. In a first step, the surface can be constructed based on a confidence threshold. In a second step, the surface can be enhanced using an interpolation filter.
    Type: Grant
    Filed: April 21, 2015
    Date of Patent: May 30, 2017
    Assignee: Zeta Instruments, Inc.
    Inventors: Ken Kinsun Lee, Ronny Soetaman, Zhen Hou, James Jianguo Xu, Rusmin Kudinar, Vamsi Mohan Velidandla, Ben Garland
  • Patent number: 9645381
    Abstract: A method of detecting multi-surfaces of an object includes providing an imaging system capable of detecting surfaces of the object. After system parameters are set up, two-dimensional images of the object at multiple Z steps can be acquired. Each surface of the object can then be extracted using two steps. In a first step, the surface can be constructed based on a confidence threshold. In a second step, the surface can be enhanced using an interpolation filter.
    Type: Grant
    Filed: April 21, 2015
    Date of Patent: May 9, 2017
    Assignee: Zeta Instruments, Inc.
    Inventors: Ken Kinsun Lee, Ronny Soetaman, Zhen Hou, James Jianguo Xu, Rusmin Kudinar, Vamsi Mohan Velidandla, Ben Garland
  • Publication number: 20160252714
    Abstract: A three-dimensional (3D) microscope for patterned substrate measurement can include an objective lens, a reflected illuminator, a transmitted illuminator, a focusing adjustment device, an optical sensor, and a processor. The focusing adjustment device can automatically adjust the objective lens focus at a plurality of Z steps. The optical sensor can be capable of acquiring images at each of these Z steps. The processor can control the reflected illuminator, the transmitted illuminator, the focusing adjustment device, and the optical sensor. The processor can be configured to capture first and second images at multiple Z steps, the first image with the pattern using the reflected illuminator and the second image without the pattern using one of the reflected illuminator and the transmitted illuminator.
    Type: Application
    Filed: May 9, 2016
    Publication date: September 1, 2016
    Inventors: Zhen Hou, James Jianguo Xu, Ken Kinsun Lee, James Nelson Stainton, Hung Phi Nguyen, Rusmin Kudinar, Ronny Soetarman
  • Publication number: 20160253813
    Abstract: A three-dimensional (3D) microscope for patterned substrate measurement can include an objective lens, a reflected illuminator, a transmitted illuminator, a focusing adjustment device, an optical sensor, and a processor. The focusing adjustment device can automatically adjust the objective lens focus at a plurality of Z steps. The optical sensor can be capable of acquiring images at each of these Z steps. The processor can control the reflected illuminator, the transmitted illuminator, the focusing adjustment device, and the optical sensor. The processor can be configured to capture first and second images at multiple Z steps, the first image with the pattern using the reflected illuminator and the second image without the pattern using one of the reflected illuminator and the transmitted illuminator.
    Type: Application
    Filed: May 9, 2016
    Publication date: September 1, 2016
    Inventors: Zhen Hou, James Jianguo Xu, Ken Kinsun Lee, James Nelson Stainton, Hung Phi Nguyen, Rusmin Kudinar, Ronny Soetarman
  • Patent number: 9389408
    Abstract: A three-dimensional (3D) microscope for patterned substrate measurement can include an objective lens, a reflected illuminator, a transmitted illuminator, a focusing adjustment device, an optical sensor, and a processor. The focusing adjustment device can automatically adjust the objective lens focus at a plurality of Z steps. The optical sensor can be capable of acquiring images at each of these Z steps. The processor can control the reflected illuminator, the transmitted illuminator, the focusing adjustment device, and the optical sensor. The processor can be configured to capture first and second images at multiple Z steps, the first image with the pattern using the reflected illuminator and the second image without the pattern using one of the reflected illuminator and the transmitted illuminator.
    Type: Grant
    Filed: June 29, 2011
    Date of Patent: July 12, 2016
    Assignee: Zeta Instruments, Inc.
    Inventors: Zhen Hou, James Jianguo Xu, Ken Kinsun Lee, James Nelson Stainton, Hung Phi Nguyen, Rusmin Kudinar, Ronny Soetarman
  • Publication number: 20150226953
    Abstract: A method of detecting multi-surfaces of an object includes providing an imaging system capable of detecting surfaces of the object. After system parameters are set up, two-dimensional images of the object at multiple Z steps can be acquired. Each surface of the object can then be extracted using two steps. In a first step, the surface can be constructed based on a confidence threshold. In a second step, the surface can be enhanced using an interpolation filter.
    Type: Application
    Filed: April 21, 2015
    Publication date: August 13, 2015
    Inventors: Ken Kinsun Lee, Ronny Soetaman, Zhen Hou, James Jianguo Xu, Rusmin Kudinar, Vamsi Mohan Velidandla, Ben Garland
  • Publication number: 20150226952
    Abstract: A method of detecting multi-surfaces of an object includes providing an imaging system capable of detecting surfaces of the object. After system parameters are set up, two-dimensional images of the object at multiple Z steps can be acquired. Each surface of the object can then be extracted using two steps. In a first step, the surface can be constructed based on a confidence threshold. In a second step, the surface can be enhanced using an interpolation filter.
    Type: Application
    Filed: April 21, 2015
    Publication date: August 13, 2015
    Inventors: Ken Kinsun Lee, Ronny Soetaman, Zhen Hou, James Jianguo Xu, Rusmin Kudinar, Vamsi Mohan Velidandla, Ben Garland
  • Patent number: 9036869
    Abstract: A method of detecting multi-surfaces of an object includes providing an imaging system capable of detecting surfaces of the object. After system parameters are set up, two-dimensional images of the object at multiple Z steps can be acquired. Each surface of the object can then be extracted using two steps. In a first step, the surface can be constructed based on a confidence threshold. In a second step, the surface can be enhanced using an interpolation filter.
    Type: Grant
    Filed: August 29, 2011
    Date of Patent: May 19, 2015
    Assignee: Zeta Instruments, Inc.
    Inventors: Ken Kinsun Lee, Ronny Soetarman, Zhen Hou, James Jianguo Xu, Rusmin Kudinar, Vamsi Mohan Velidandla, Ben Garland
  • Patent number: 8976366
    Abstract: A measurement system for monitoring an LED chip surface roughening process is described. A reflective illuminator can run reflectance measurements. A vertical positioning means can adjust a distance between an objective lens and an industrial sample. A horizontal positioning means can move objects in XY plane, and is specifically configured to hold the industrial sample and a reference sample. An optical sensor can acquire images of the industrial sample. A spectrometer can acquire reflectance spectrums of the industrial sample and the reference sample. A processor can control these components. The processor can perform deskew, and calculate an average reflectance and an oscillation amplitude from the reflectance spectrums of the industrial sample.
    Type: Grant
    Filed: June 12, 2012
    Date of Patent: March 10, 2015
    Assignee: Zeta Instruments, Inc.
    Inventors: James Jianguo Xu, Ken Kinsun Lee, Rusmin Kudinar, Ronny Soetarman, Hung Phi Nguyen, Zhen Hou