Patents by Inventor Ken Nanaumi

Ken Nanaumi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9786576
    Abstract: A positive-type photosensitive resin composition includes (A) a phenol resin modified by a compound having an unsaturated hydrocarbon group having 4 to 100 carbon atoms; (B) a compound that produces an acid by light; (C) a thermal crosslinking agent; and (D) a solvent. The positive-type photosensitive resin composition according to the present invention can be developed by an alkaline aqueous solution, and an effect thereof is that a resist pattern having sufficiently high sensitivity and resolution, excellent adhesion, and good thermal shock resistance can be formed.
    Type: Grant
    Filed: November 7, 2008
    Date of Patent: October 10, 2017
    Assignee: HITACHI CHEMICAL COMPANY, LTD
    Inventors: Hiroshi Matsutani, Takumi Ueno, Alexandre Nicolas, Ken Nanaumi
  • Patent number: 8461699
    Abstract: The positive tone photosensitive composition of the invention comprises an alkali-soluble resin having a phenolic hydroxyl group, a compound producing an acid by light, a thermal crosslinking agent and an acrylic resin. It is possible to provide a positive tone photosensitive composition that can be developed with an aqueous alkali solution, has sufficiently high sensitivity and resolution, and can form a resist pattern with excellent adhesiveness and thermal shock resistance.
    Type: Grant
    Filed: December 16, 2009
    Date of Patent: June 11, 2013
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Hiroshi Matsutani, Takumi Ueno, Alexandre Nicolas, Yukihiko Yamashita, Ken Nanaumi, Akitoshi Tanimoto
  • Patent number: 8426985
    Abstract: A positive tone photosensitive composition comprising: (A) an alkali-soluble resin having a phenolic hydroxyl group; (B) a phenol resin modified by a compound having an unsaturated hydrocarbon group containing 4 to 100 carbon atoms; (C) a compound that generates an acid by the action of light; (D) a thermal cross-linker that crosslinks the ingredient (A) and the ingredient (B) by heating; and (E) a solvent.
    Type: Grant
    Filed: September 2, 2009
    Date of Patent: April 23, 2013
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Hiroshi Matsutani, Takumi Ueno, Alexandre Nicolas, Ken Nanaumi
  • Patent number: 8084130
    Abstract: The present invention provides an epoxy resin molding material for sealing that is excellent in fluidability and solder reflow resistance without lowering the curability thereof, and an electronic component device provided with an element sealed with the material. The epoxy resin molding material for sealing, comprising (A) an epoxy resin, (B) a curing agent, (C) a curing accelerating agent, (D) an inorganic filler, and (E) an alkoxysilane polymer, wherein the alkoxysilane polymer (E) is a polymer obtained by polymerizing an alkoxysilyl group moiety of a specific alkoxysilane compound.
    Type: Grant
    Filed: September 25, 2007
    Date of Patent: December 27, 2011
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Mitsuyoshi Hamada, Akira Nagai, Hiroaki Ikeba, Ken Nanaumi, Kouhei Yasuzawa
  • Publication number: 20110254178
    Abstract: The positive tone photosensitive composition of the invention comprises an alkali-soluble resin having a phenolic hydroxyl group, a compound producing an acid by light, a thermal crosslinking agent and an acrylic resin. It is possible to provide a positive tone photosensitive composition that can be developed with an aqueous alkali solution, has sufficiently high sensitivity and resolution, and can form a resist pattern with excellent adhesiveness and thermal shock resistance.
    Type: Application
    Filed: December 16, 2009
    Publication date: October 20, 2011
    Inventors: Hiroshi Matsutani, Takumi Ueno, Alexandre Nicolas, Yukihiko Yamashita, Ken Nanaumi, Akitoshi Tanimoto
  • Publication number: 20110250396
    Abstract: A positive-type photosensitive resin composition includes (A) a phenol resin modified by a compound having an unsaturated hydrocarbon group having 4 to 100 carbon atoms; (B) a compound that produces an acid by light; (C) a thermal crosslinking agent; and (D) a solvent. The positive-type photosensitive resin composition according to the present invention can be developed by an alkaline aqueous solution, and an effect thereof is that a resist pattern having sufficiently high sensitivity and resolution, excellent adhesion, and good thermal shock resistance can be formed.
    Type: Application
    Filed: November 7, 2008
    Publication date: October 13, 2011
    Inventors: Hiroshi Matsutani, Takumi Ueno, Alexandre Nicolas, Ken Nanaumi
  • Publication number: 20110204528
    Abstract: A positive tone photosensitive composition comprising: (A) an alkali-soluble resin having a phenolic hydroxyl group; (B) a phenol resin modified by a compound having an unsaturated hydrocarbon group containing 4 to 100 carbon atoms; (C) a compound that generates an acid by the action of light; (D) a thermal cross-linker that crosslinks the ingredient (A) and the ingredient (B) by heating; and (E) a solvent.
    Type: Application
    Filed: September 2, 2009
    Publication date: August 25, 2011
    Inventors: Hiroshi Matsutani, Takumi Ueno, Alexandre Nicolas, Ken Nanaumi
  • Publication number: 20090326100
    Abstract: The present invention provides an epoxy resin molding material for sealing that is excellent in fluidability and solder reflow resistance without lowering the curability thereof, and an electronic component device provided with an element sealed with the material. The epoxy resin molding material for sealing, comprising (A) an epoxy resin, (B) a curing agent, (C) a curing accelerating agent, (D) an inorganic filler, and (E) an alkoxysilane polymer, wherein the alkoxysilane polymer (E) is a polymer obtained by polymerizing an alkoxysilyl group moiety of a specific alkoxysilane compound.
    Type: Application
    Filed: September 25, 2007
    Publication date: December 31, 2009
    Inventors: Mitsuyoshi Hamada, Akira Nagai, Hiroaki Ikeba, Ken Nanaumi, Kouhei Yasuzawa
  • Patent number: 7538150
    Abstract: The present invention discloses a thermosetting resin composition which comprises (A) 35 to 75 parts by weight of a thermosetting resin comprising a compound having a hydrobenzoxazine ring as a main component, (B) 10 to 25 parts by weight of a polycondensation product of a phenol, a compound having a triazine ring and an aldehyde, and (C) 10 to 45 parts by weight of an epoxy resin, based on 100 parts by weight of the total amount of organic solid components of Components (A), (B) and (C), and (i) a bisphenol F epoxy resin having a weight-average molecular weight of 1,000 to 3,000, or (ii) a mixed epoxy resin of bisphenol F epoxy resin and bisphenol A epoxy resin having a weight average molecular weight of 1,000 to 3,000, is contained in Component (C) in an amount of 0 to 100% by weight of Component (C); and a prepreg, a laminated board for a wiring board and a wiring board using the same.
    Type: Grant
    Filed: September 7, 2005
    Date of Patent: May 26, 2009
    Assignee: Hitachi Chemical Company, Ltd
    Inventors: Kenichi Oohori, Yoshihiro Nakamura, Hikari Murai, Yoshiyuki Takeda, Yasuyuki Hirai, Shinichi Kamoshida, Minoru Kakitani, Norihiro Abe, Syunichi Numata, Teruki Aizawa, Ken Nanaumi
  • Publication number: 20060008632
    Abstract: The present invention discloses a thermosetting resin composition which comprises (A) 35 to 75 parts by weight of a thermosetting resin comprising a compound having a hydrobenzoxazine ring as a main component, (B) 10 to 25 parts by weight of a polycondensation product of a phenol, a compound having a triazine ring and an aldehyde, and (C) 10 to 45 parts by weight of an epoxy resin, based on 100 parts by weight of the total amount of organic solid components of Components (A), (B) and (C), and (i) a bisphenol F epoxy resin having a weight-average molecular weight of 1,000 to 3,000, or (ii) a mixed epoxy resin of bisphenol F epoxy resin and bisphenol A epoxy resin having a weight average molecular weight of 1,000 to 3,000, is contained in Component (C) in an amount of 0 to 100% by weight of Component (C); and a prepreg, a laminated board for a wiring board and a wiring board using the same.
    Type: Application
    Filed: September 7, 2005
    Publication date: January 12, 2006
    Inventors: Kenichi Oohori, Yoshihiro Nakamura, Hikari Murai, Yoshiyuki Takeda, Yasuyuki Hirai, Shinichi Kamoshida, Minoru Kakitani, Norihiro Abe, Syunichi Numata, Teruki Aizawa, Ken Nanaumi
  • Publication number: 20040076805
    Abstract: The present invention discloses a thermosetting resin composition which comprises (A) 35 to 75 parts by weight of a thermosetting resin comprising a compound having a dihydrobenzoxazine ring as a main component, (B) 10 to 25 parts by weight of a polycondensation product of a phenol, a compound having a triazine ring and an aldehyde, and (C) 10 to 45 parts by weight of an epoxy resin, based on 100 parts by weight of the total amount of organic solid components of Components (A), (B) and (C), and (i) a bisphenol F epoxy resin having a weight average molecular weight of 1,000 to 3,000, or (ii) a mixed epoxy resin of bisphenol F epoxy resin and bisphenol A epoxy resin having a weight average molecular weight of 1,000 to 3,000, is contained in Component (C) in an amount of 0 to 100% by weight of Component (C); and a prepreg, a laminated board for a wiring board and a wiring board using the same.
    Type: Application
    Filed: July 9, 2003
    Publication date: April 22, 2004
    Inventors: Kenichi Oohori, Yoshihiro Nakamura, Hiraki Murai, Yoshiyuki Takeda, Yasuyuki Hirai, Shinichi Kamoshida, Minoru Kakitani, Norihiro Abe, Syunichi Numata, Teruki Aizawa, Ken Nanaumi
  • Patent number: 6475629
    Abstract: Adhesive film useful for the production of semiconductor devices is produced from a siloxane-modified polyamideimide resin composition, comprising 100 parts by weight of a siloxane-modified polyamideimide resin and 1 to 200 parts by weight of a thermosetting resin ingredient.
    Type: Grant
    Filed: February 2, 2001
    Date of Patent: November 5, 2002
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Kazumasa Takeuchi, Tetsuya Saito, Ken Nanaumi
  • Patent number: 6252010
    Abstract: Adhesive film useful for the production of semiconductor devices is produced from a siloxane-modified polyamideimide resin composition, comprising 100 parts by weight of a siloxane-modified polyamideimide resin and 1 to 200 parts by weight of a thermosetting resin ingredient.
    Type: Grant
    Filed: October 29, 1998
    Date of Patent: June 26, 2001
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Kazumasa Takeuchi, Tetsuya Saito, Ken Nanaumi
  • Patent number: 5885723
    Abstract: Provided is bonding film for printed circuit boards which is resistant to cracking even when bent with a small radius of curvature, has a sufficient mechanical strength even in its semi-cured state so that the handling may be facilitated, is not undesirably brittle and therefore does not produce undesired debris when cut, and is flexible and flame retardant at the same time. The bonding film may consist of (i) high polymer epoxy resin; (ii) denatured polyamide obtained by reacting epoxy resin and polyamide; (iii) polyfunctional epoxy resin; and (iv) curing agent. Preferably, the denatured polyamide includes a polyalkylene-glycol residue or a polycarbonate-diol residue. Preferably, the high polymer epoxy resin is produced by the polymerization of bifunctional epoxy resin and bifunctional phenol resin, and has a weight averaged molecular weight equal to 50,000 or higher.
    Type: Grant
    Filed: December 19, 1997
    Date of Patent: March 23, 1999
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Atsushi Takahashi, Shinji Ogi, Koji Morita, Kazunori Yamamoto, Ken Nanaumi, Kiyoshi Hirosawa, Akinari Kida, Takao Hirayama, Toshihiko Ito, Hiroaki Hirakura
  • Patent number: 5380789
    Abstract: A catalyst selected from a perfluorosulfonic acid and an anhydride thereof enables a non-conjugated drying oil to react with a phenol to form a phenol-added vegetable oil without causing hydrolysis of the non-conjugated drying oil. The phenol-added vegetable oil is allowed to react with an aldehyde to form a vegetable oil-modified phenolic resin. A laminate produced by impregnating paper with the vegetable oil-modified phenolic resin and laminating and molding the impregnated paper is excellent in low temperature punching quality and electrical properties and is free from low molecular weight components oozing out the surface of the laminate.
    Type: Grant
    Filed: August 10, 1993
    Date of Patent: January 10, 1995
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Ken Nanaumi, Takeshi Horiuchi, Masahiro Nomoto, Mitsuhiro Inoue
  • Patent number: 5206333
    Abstract: A copolycondensation of a phenol, a naphthol and formaldehyde proceeds smoothly in the presence of an acid and a metallic element selected from the group consisting of transition metallic elements and metallic elements of Group IIa, Group IIIa, Group IVa, Group Va and Group VIa of the Periodic Table, and a naphthol-modified phenolic resin which has a large molecular weight and does not gel is obtained.
    Type: Grant
    Filed: May 7, 1992
    Date of Patent: April 27, 1993
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Haruaki Sue, Ken Nanaumi, Takuji Itou, Ken Madarame, Shinsuke Hagiwara
  • Patent number: 5066691
    Abstract: An adhesive composition for metal-clad laminates which comprises:(a) 100 parts by weight of a polyvinylbutyral having an average polymerization degree of from 500 to 3,000 and a degree of butyralization of at least 60 mol %,(b) from 10 to 200 parts by weight of an epoxidized polybutadiene per 100 parts by weight of the polyvinylbutyral, the epoxidized polybutadiene having a number average molecular weight of from 1,000 to 10,000 and an epoxy equivalent weight of from 200 to 2,000, and(c) from 1 to 10 parts by weight of a hardener for the epoxidized polybutadiene per 100 parts by weight of the epoxidized polybutadiene.
    Type: Grant
    Filed: November 29, 1989
    Date of Patent: November 19, 1991
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Toshihisa Kumakura, Ken Nanaumi, Ryoichi Ikezawa, Hideki Eriguchi
  • Patent number: 4278786
    Abstract: A heat-resistant polyamide polymer having melt-moldability is obtained by reacting an aromatic diamine having the general formula: ##STR1## with an equivalent amount of aromatic dicarboxylic acid dihalide in an organic solvent in the presence of an aqueous solution of an alkali-metal hydroxide. When an equimolar mixture of terephthalic acid dihalide and isophthalic dihalide is reacted with the diamine, polyamide polymers with good melt-moldability are obtained.
    Type: Grant
    Filed: July 5, 1979
    Date of Patent: July 14, 1981
    Assignee: Hitachi, Ltd.
    Inventors: Ken Nanaumi, Fusaji Shoji, Hisashi Kohkame, Susumu Era
  • Patent number: 4229330
    Abstract: Internally plasticized phenolic resins suitable for use in preparing laminates and the like excellent in electrical properties, heat resistance, solvent resistance as well as punchability are produced by reacting a compound of the formula: ##STR1## wherein R.sub.1 is an alkylene residue having 1 to 3 carbon atoms; and R.sub.2 and R.sub.3 are independently hydrogen or a saturated or unsaturated hydrocarbon group having 1 to 3 carbon atoms, with an epoxidized vegetable oil with heating in the presence of one or more secondary and/or tertiary amines, and adding formaldehyde or one or more phenols and formaldehyde to the reaction system to further proceed the reaction.
    Type: Grant
    Filed: August 28, 1978
    Date of Patent: October 21, 1980
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Susumu Konii, Yukio Yoshimura, Ken Nanaumi, Kohei Yasuzawa, Takeshi Yoshida, Toyotaro Shinko
  • Patent number: 4209429
    Abstract: Internally plasticized phenolic resins suitable for use in preparing laminates and the like excellent in electrical properties, heat resistance, solvent resistance as well as punchability are produced by reacting a phenol-formaldehyde resin containing less than 4% by weight of unreacted free monohydric phenol or phenols with an epoxidized vegetable oil, and if required with formaldehyde, with heating preferably in the presence of one or more secondary and/or tertiary amines.
    Type: Grant
    Filed: August 28, 1978
    Date of Patent: June 24, 1980
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Susumu Konii, Yukio Yoshimura, Ken Nanaumi, Kohei Yasuzawa, Takeshi Yoshida, Toyotaro Shinko