Patents by Inventor Ken S. Chen

Ken S. Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6461678
    Abstract: An improved additive process for metallization of substrates is described whereby a catalyst solution is applied to a surface of a substrate. Metallic catalytic clusters can be formed in the catalyst solution on the substrate surface by heating the substrate. Electroless plating can then deposit metal onto the portion of the substrate surface coated with catalyst solution. Additional metallization thickness can be obtained by electrolytically plating the substrate surface after the electroless plating step.
    Type: Grant
    Filed: April 29, 1997
    Date of Patent: October 8, 2002
    Assignee: Sandia Corporation
    Inventors: Ken S. Chen, William P. Morgan, John L. Zich
  • Patent number: 5989653
    Abstract: An improved additive process for metallization of substrates is described whereby a catalyst solution is applied to a surface of a substrate. Metallic catalytic clusters can be formed in the catalyst solution on the substrate surface by irradiating the substrate. Electroless plating can then deposit metal onto the portion of the substrate surface having metallic clusters. Additional metallization thickness can be obtained by electrolytically plating the substrate surface after the electroless plating step.
    Type: Grant
    Filed: December 8, 1997
    Date of Patent: November 23, 1999
    Assignee: Sandia Corporation
    Inventors: Ken S. Chen, William P. Morgan, John L. Zich
  • Patent number: 5348574
    Abstract: Electroless deposition-catalyzing film-forming solutions comprising polyamic acid and noble metal, e.g. palladium complexed with ammonia, in an aprotic solvent, e.g. N-methyl-2-pyrrolidone with a surfactant. Such solutions are used to provide articles having a coating or patterned image of a electrolessly-depositable element such as copper, nickel and the like on high heat resistant substrates, e.g. metals, ceramics, glass, silicon, high heat polymers and thermoset polymers. In the methods of this invention a polyamic acid/noble metal solution is applied as a coating or patterned image to provide a coherent polyamic acid film which can be imidized, e.g. by heat treatment at 250.degree. C. or higher, providing a tough, adhesive polyimide film that can catalyze electroless deposition.
    Type: Grant
    Filed: July 2, 1993
    Date of Patent: September 20, 1994
    Assignee: Monsanto Company
    Inventors: Edward F. Tokas, Raafat M. Shaltout, Ken S. Chen