Abstract: Imprint apparatus performs, on shot regions of substrate, imprint process for transferring pattern of mold to imprint material arranged on the substrate. The apparatus includes detector for detecting first mark of the substrate and second mark of the mold, and controller configured to control positioning of the detector based on driving amount, held in a storage, by which the detector is to be driven to fit the first mark and the second mark within specific region of field of view of the detector, and correction value held in the storage and used to correct the driving amount. The controller performs alignment between shot region selected from the shot regions and the mold based on output of the detector, and updates the correction value held in the storage based on the output of the detector.

Abstract: Imprint apparatus performs, on shot regions of substrate, imprint process for transferring pattern of mold to imprint material arranged on the substrate. The apparatus includes detector for detecting first mark of the substrate and second mark of the mold, and controller configured to control positioning of the detector based on driving amount, held in a storage, by which the detector is to be driven to fit the first mark and the second mark within specific region of field of view of the detector, and correction value held in the storage and used to correct the driving amount. The controller performs alignment between shot region selected from the shot regions and the mold based on output of the detector, and updates the correction value held in the storage based on the output of the detector.