Patents by Inventor Kenichi Kurihara

Kenichi Kurihara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5048179
    Abstract: An IC mounting method and its resulting structure, such as an IC card is provided. An IC card includes a metal plate formed with at least one hole, and an IC chip is located fixed in position in the hole with a filler material filling the gap between the hole and the IC chip. An interconnect pattern is provided on the plate with an electrically insulating film sandwiched therebetween, and the interconnect pattern is in electrical contact with a contact pad of the IC chip. Preferably, the surface of the IC chip on which the contact pad is provided is substantially flush with one surface of the plate. When an electrically insulating film is fixedly attached to a substrate having a hole, in which an IC chip is fixedly provided, by an adhesive agent, the material of the film is selected to be similar to the material of the adhesive agent.
    Type: Grant
    Filed: February 14, 1990
    Date of Patent: September 17, 1991
    Assignee: Ricoh Company, Ltd.
    Inventors: Masahiro Shindo, Toshikazu Yoshimizu, Kenichi Kurihara, Shunpei Tamaki, Toshio Kawakami, Yukio Kadowaki, Shoji Matsumoto
  • Patent number: 4938923
    Abstract: The gold wire used for the wire bonding of a semiconductor device comprises at least three kinds of elements selected from rare earth elements such as La, Ce and Pr: Be, Ca, Mg, Ag, Fe: and platinum group elements; and the balance of Au at high purity.
    Type: Grant
    Filed: October 31, 1989
    Date of Patent: July 3, 1990
    Inventors: Takeshi Kujiraoka, Koichiro Mukoyama, Hiromi Yamamoto, Kenichi Kurihara
  • Patent number: 4890151
    Abstract: A method for forming an interconnection pattern of Al on a structure, such as a semiconductor device, includes the step of introducing ions of a selected material, such as As, P, B and Ar, into a film of Al to be formed into an interconnection pattern prior to the step of heat treatment, thereby substantially preventing undesired results, such as hillocks, when the pattern is heat-treated.
    Type: Grant
    Filed: November 29, 1988
    Date of Patent: December 26, 1989
    Assignee: Ricoh Company, Ltd.
    Inventors: Masahiro Kameda, Yojiro Kamei, Kenichi Kurihara