Abstract: To provide a highly hard coating film formed on a substrate, as adhered to the surface of the substrate and having a refractive index of from 1.28 to 1.41 and a contact angle with water of from 90° to 115°. A coating film having a refractive index of from 1.28 to 1.41 and a contact angle with water of from 90° to 115°, which is formed as adhered to a substrate surface by forming a reaction mixture comprising a silicon compound (A) of the formula Si(OR)4, a silicon compound (B) of the formula CF3(CF2)nCH2CH2Si(OR1)3, a silicon compound (C) of the formula H2NCOH(CH)mSi(OR2)3, an alcohol (D) of the formula R3CH2OH and oxalic acid (E), in a specific ratio, heating this reaction mixture at a temperature of from 40 to 180° C. in the absence of water to form a solution of a polysiloxane, then applying a coating fluid comprising the polysiloxane solution on a substrate surface to form a coating, and heat-curing the coating at a temperature of from 40 to 450° C.

Abstract: To provide a highly hard coating film formed on a substrate, as adhered to the surface of the substrate and having a refractive index of from 1.28 to 1.41 and a contact angle with water of from 90° to 115°. A coating film having a refractive index of from 1.28 to 1.41 and a contact angle with water of from 90° to 115°, which is formed as adhered to a substrate surface by forming a reaction mixture comprising a silicon compound (A) of the formula Si(OR)4, a silicon compound (B) of the formula CF3(CF2)nCH2CH2Si(OR1)3, a silicon compound (C) of the formula H2NCOH(CH)mSi(OR2)3, an alcohol (D) of the formula R3CH2OH and oxalic acid (E), in a specific ratio, heating this reaction mixture at a temperature of from 40 to 180° C. in the absence of water to form a solution of a polysiloxane, then applying a coating fluid comprising the polysiloxane solution on a substrate surface to form a coating, and heat-curing the coating at a temperature of from 40 to 450° C.

Abstract: A composite thin film-holding substrate for a surface light emitter, which is a transparent substrate including a composite thin film containing fine particles and a binder formed on the surface of a transparent base material. The refractive index of the composite thin film is higher than the refractive index of the transparent base material. The difference in the refractive index between the fine particles and the binder contained in the composite thin film is at least 0.1, and the ratio of (solid content mass of the fine particles)/(solid content mass of the binder+solid content mass of the fine particles) of the composite thin film is from 0.01 to 0.5. A surface light emitter can use the substrate.

Abstract: To provide a coating fluid for forming a film, which is curable sufficiently by heat treatment at a low temperature of at most 70° C. to form a cured film excellent in abrasion resistance and which is excellent in storage stability, a film obtained from the coating fluid for forming a film, and a process for forming the film. A coating fluid for forming a film, which comprises a polysiloxane (A) obtained by condensation polymerization of a silicon compound of the formula (1) as the essential component, and a compound (B) of the formula (2): Si(OR1)4??(1) wherein R1 is a C1-5 hydrocarbon group, each of R2, R3, R4 and R5 which are independent of one another, is a hydrogen atom or a C1-12 organic group.

Abstract: To provide a coating fluid for forming a film, which is curable sufficiently by heat treatment at a low temperature of at most 70° C. to form a cured film excellent in abrasion resistance and which is excellent in storage stability, a film obtained from the coating fluid for forming a film, and a process for forming the film. A coating fluid for forming a film, which comprises a polysiloxane (A) obtained by condensation polymerization of a silicon compound of the formula (1) as the essential component, and a compound (B) of the formula (2): Si(OR1)4??(1) wherein R1 is a C1-5 hydrocarbon group, each of R2, R3, R4 and R5 which are independent of one another, is a hydrogen atom or a C1-12 organic group.

Abstract: To provide a coating fluid for forming a film, which is curable sufficiently by heat treatment at a low temperature of at most 70° C. to form a cured film excellent in abrasion resistance and which is excellent in storage stability, a film obtained from the coating fluid for forming a film, and a process for forming the film. A coating fluid for forming a film, which comprises a polysiloxane (A) obtained by condensation polymerization of a silicon compound of the formula (1) as the essential component, and a compound (B) of the formula (2): Si(OR1)4??(1) wherein R1 is a C1-5 hydrocarbon group, each of R2, R3, R4 and R5 which are independent of one another, is a hydrogen atom or a C1-12 organic group.

Abstract: A silica-based coating film on a substrate surface is prepared by forming a reaction mixture comprising a tetraalkoxysilicon compound (A) and/or an alkyl/alkoxy silane compound (B), an alcohol (C), and oxalic acid (D), in such ratios that the amount of alcohol (C) ranges from 0.5 to 100 mols per mol of all alkoxy groups present in the silicon compounds (A) and (B), and the amount of oxalic acid (D) ranges from 0.2 to 2 mols per mol of all alkoxy groups in the silicon compounds (A) and (B), and while maintaining the mixture at a SiO2 concentration ranging from 0.5 to 11%, as calculated from silicon atoms in the mixture, by means of the alcohol (C); heating the reaction mixture at a temperature ranging from 50 to 180° C.

Abstract: The present invention provides a transparent substrate capable of improving the light extraction efficiency of an organic electroluminescence device, and an organic electroluminescence device with high luminous efficiency and with excellent mass productivity using the substrate. The present invention relates to a transparent substrate for an organic electroluminescence device characterized in that an optical interference film comprising at least one layer having such a refractive index and a film thickness as to reduce a quantity of reflection of light emitted from a light-emitting layer is provided on both sides of the transparent substrate in the organic electroluminescence device, and to an organic electroluminescence device comprising the transparent substrate.

Abstract: A composite thin film-holding substrate for a surface light emitter, which is a transparent substrate including a composite thin film containing fine particles and a binder formed on the surface of a transparent base material. The refractive index of the composite thin film is higher than the refractive index of the transparent base material. The difference in the refractive index between the fine particles and the binder contained in the composite thin film is at least 0.1, and the ratio of (solid content mass of the fine particles)/(solid content mass of the binder+solid content mass of the fine particles) of the composite thin film is from 0.01 to 0.5. A surface light emitter can use the substrate.

Abstract: To provide a process for forming an improved coating film on a substrate, particularly to provide a coating film formed on a substrate, as adhered to the surface of the substrate, having a refractive index of from 1.28 to 1.38 and a contact angle with water of from 90° to 115°. A coating film having a refractive index of from 1.28 to 1.38 and a contact angle with water of from 90° to 115°, which is formed as adhered to a substrate surface by forming a reaction mixture comprising a silicon compound (A) of the formula Si(OR)4, a silicon compound (B) of the formula (R1O)3SiCH2CH2(CF2)nCH2CH2Si(OR1)3, an alcohol (C) of the formula R2CH2OH, and oxalic acid (D), in a specific ratio; heating this reaction mixture at a temperature of from 50 to 180° C. in the absence of water, to form a solution of a polysiloxane; then applying a coating fluid comprising the polysiloxane solution on a substrate surface to form a coating; and heat-curing the coating at a temperature of from 80 to 450° C.

Abstract: To provide a highly hard coating film formed on a substrate, as adhered to the surface of the substrate and having a refractive index of from 1.28 to 1.41 and a contact angle with water of from 90° to 115°. A coating film having a refractive index of from 1.28 to 1.41 and a contact angle with water of from 90° to 115°, which is formed as adhered to a substrate surface by forming a reaction mixture comprising a silicon compound (A) of the formula Si(OR)4, a silicon compound (B) of the formula CF3(CF2)nCH2CH2Si(OR1)3, a silicon compound (C) of the formula H2NCOH(CH2)mSi(OR2)3, an alcohol (D) of the formula R3CH2OH and oxalic acid (E), in a specific ratio, heating this reaction mixture at a temperature of from 40 to 180° C. in the absence of water to form a solution of a polysiloxane, then applying a coating fluid comprising the polysiloxane solution on a substrate surface to form a coating, and heat-curing the coating at a temperature of from 40 to 450° C.

Abstract: The present invention provides a process for forming a silica-based coating film, characterized by heating a reaction mixture comprising a silicon compound (A) represented by Si (OR)4 and/or a silicon compound (B) represented by R1nSi (OR2)4?n (wherein n is an integer of from 1 to 3), an alcohol (C) represented by R3CH2OH and oxalic acid (D) in specific ratios, at a temperature of from 50 to 180° C. in the absence of water, to form a solution of a polysiloxane having a number average molecular weight, as calculated as polystyrene, of from 2,000 to 15,000, applying a coating fluid containing such a solution on a substrate surface, and thermally curing a coating film obtained by such coating, at a temperature of from 80 to 600° C., and such a coating film having a film thickness of from 0.5 to 5 ?m, a coating fluid to be used for such a coating film, and a process for producing such a coating fluid.

Abstract: To provide a coating fluid for forming a film, which is curable sufficiently by heat treatment at a low temperature of at most 70° C. to form a cured film excellent in abrasion resistance and which is excellent in storage stability, a film obtained from the coating fluid for forming a film, and a process for forming the film. A coating fluid for forming a film, which comprises a polysiloxane (A) obtained by condensation polymerization of a silicon compound of the formula (1) as the essential component, and a compound (B) of the formula (2): Si(OR1)4 ??(1) wherein R1 is a C1-5 hydrocarbon group, each of R2, R3, R4 and R5 which are independent of one another, is a hydrogen atom or a C1-12 organic group.

Abstract: A process for easily and efficiently forming a silica-based coating film having a film thickness of from 0.5 to 5 ?m on a substrate, such a coating film, a coating fluid to be used for forming such a coating film, and a process for producing such a coating fluid, are presented. The present invention provides a process for forming a silica-based coating film, characterized by heating a reaction mixture comprising a silicon compound (A) represented by Si(OR)4 and/or a silicon compound (B) represented by R1nSi (OR2)4-n (wherein n is an integer of from 1 to 3), an alcohol (C) represented by R3CH2OH and oxalic acid (D) in specific ratios, at a temperature of from 50 to 180° C. in the absence of water, to form a solution of a polysiloxane having a number average molecular weight, as calculated as polystyrene, of from 2,000 to 15,000, applying a coating fluid containing such a solution on a substrate surface, and thermally curing a coating film obtained by such coating, at a temperature of from 80 to 600° C.

Abstract: The present invention provides a transparent substrate capable of improving the light extraction efficiency of an organic electroluminescence device, and an organic electroluminescence device with high luminous efficiency and with excellent mass productivity using the substrate.

Abstract: Provided are a transparent substrate capable of improving the light extraction efficiency of an organic electroluminescence device, and a practical organic electroluminescence device using the substrate.

Abstract: A process for easily and efficiently forming a silica-based coating film having a film thickness of from 0.5 to 5 &mgr;m on a substrate, such a coating film, a coating fluid to be used for forming such a coating film, and a process for producing such a coating fluid, are presented.

Abstract: A method for obtaining an electroconductive tin oxide pattern film simply and efficiently without using a resist film. A method for patterning an electroconductive tin oxide film, characterized by employing a solution having a tin compound and a dopant compound soluble in an organic solvent dissolved in the organic solvent, drying it to such an extent that the dried film retains the solubility in a developing solution, exposing the dried film with a light containing an ultraviolet region to render it partially insoluble, and etching the unexposed portion with the developing solution.

Abstract: The present invention relates to an antireflection film effective for improving the transparency of an image display device such as a liquid crystal display (LCD), a plasma display (PDP), CRT, EL or a touch panel, to an optical product made of glass, such as a lens for eye glasses, and to an antireflection glass. The present invention is also directed to a process of coating a glass surface with a mixture comprising particular silicon compounds and thermosetting the coating film at a temperature ranging from 480 to 520° C. This process can be used to form an antireflection film on a glass surface having a refractive index ranging from 1.33 to 1.38 and a contact angle of water of at most 40 degrees.

Abstract: The present invention relates to an antireflection film effective for improving the transparency of an image display device such as a liquid crystal display (LCD), a plasma display (PDP), CRT, EL or a touch panel, to an optical product made of glass, such as a lens for eye glasses, and to an antireflection glass. The present invention is also directed to a process of coating a glass surface with a mixture comprising particular silicon compounds and thermosetting the coating film at a temperature ranging from 480 to 520° C. This process can be used to form an antireflection film on a glass surface having a refractive index ranging from 1.33 to 1.38 and a contact angle of water of at most 40 degrees.