Abstract: A laser annealing apparatus according to an embodiment includes a laser light source, an annealing optical system, a linear irradiation region along a Y-direction, a moving mechanism configured to change a relative position of the irradiation region with respect to the substrate along an X-direction, an illumination light source configured to generate illumination light for illuminating the substrate along a third direction, and a detector configured to detect detection light reflected, in a fourth direction, on the substrate illuminated by the illumination light so as to photograph an annealed part of the substrate in a linear field of view along the Y-direction. In a YZ-plane view, the third direction is inclined from the vertical direction and the fourth direction is inclined from the vertical direction.

Abstract: A laser annealing apparatus according to an embodiment includes a laser light source, an annealing optical system, a linear irradiation region along a Y-direction, a moving mechanism configured to change a relative position of the irradiation region with respect to the substrate along an X-direction, an illumination light source configured to generate illumination light for illuminating the substrate along a third direction, and a detector configured to detect detection light reflected, in a fourth direction, on the substrate illuminated by the illumination light so as to photograph an annealed part of the substrate in a linear field of view along the Y-direction. In a YZ-plane view, the third direction is inclined from the vertical direction and the fourth direction is inclined from the vertical direction.

Abstract: Provided is a method of manufacturing an optical device that includes a multicore fiber including a plurality of cores and a fan-in/fan-out device including single-core fibers that are respectively connected to the cores based on a plurality of connection combinations when the multicore fiber is rotated. The method includes: a first step of determining an optical loss for each of the cores while changing the connection combinations between the single-core fibers and the cores; and a second step of selecting one of the connection combinations according to a result of the first step and connecting an end portion of the multicore fiber and an end portion of the fan-in/fan-out device to connect the single-core fibers with the cores based on the one of the connection combinations.

Abstract: A laser irradiation apparatus including a laser light source includes a first detection unit and a second detection unit configured to detect luminance of a substrate irradiated with laser light from the laser light source, and a control unit configured to perform control related to laser light emitted from the laser light source, in which the control unit specifies an energy density of laser light based on luminance detected by the first detection unit, specifies reference luminance based on a specified energy density and luminance detected by the second detection unit, and changes an energy density of laser light according to the reference luminance and luminance detected by the second detection unit.

Abstract: A laser irradiation apparatus is a laser irradiation apparatus including a laser light source, the laser irradiation apparatus including a failure prediction unit configured to perform failure prediction on a movable part used when a substrate is processed by the laser light source, in which the failure prediction unit acquires a physical quantity when the movable part is movable, and derives a failure time of the movable part based on an acquired physical quantity.

Abstract: A laser irradiation apparatus is a laser irradiation apparatus including a plurality of laser light sources, the laser irradiation apparatus including a control unit configured to perform control with regard to laser emitted from the plurality of laser light sources, in which the control unit acquires characteristic information of each of the plurality of laser light sources, and performs a predetermined process according to each piece of acquired characteristic information.

Abstract: A laser processing device and a laser processing method that are capable of forming a high-quality semiconductor film are provided. An ELA device (excimer laser annealing device) (1) includes a laser oscillator (10) that generates laser light for forming a polysilicon film by irradiating an amorphous silicon film over a substrate to be processed with the laser light, a pulse measuring instrument (100) for detecting first partial light and second partial light contained in the laser light, and a monitoring device (60) for comparing a detection result of the first partial light with a detection result of the second partial light.

Abstract: There are provided a laser irradiation apparatus, a laser irradiation method, and a semiconductor device manufacturing method that reduce irradiation unevenness of a laser beam. A laser irradiation apparatus includes a waveform shaping device (20). The waveform shaping device (20) includes a laser beam source (11), a first waveform shaping unit (30) that shapes the pulse waveform of a pulse laser beam by applying a delay according to an optical path length difference between two light beams (L11 and L12) branched by a first beam splitter (31), a wave plate that changes the polarization state of the pulse laser beam from the first waveform shaping unit (30), and a second waveform shaping unit (40) that shapes the pulse waveform of the pulse laser beam by applying a delay according to an optical path length difference between two light beams (L15 and L16) branched by a second beam splitter (41).

Abstract: An optical device includes a core, a first cladding, a second cladding, a slanted fiber Bragg grating, and a high refractive index material. The first cladding covers the core and has a lower refractive index than the core. The second cladding covers the first cladding and has a lower refractive index than the first cladding. The slanted fiber Bragg grating is formed in the core and couples stimulated Raman scattering light, propagating through the core, to the first cladding. The high refractive index material has a higher refractive index than the second cladding and covers an outer peripheral surface of a removal portion where the second cladding is removed and a portion of the first cladding that covers the region where the slanted fiber Bragg grating is formed in the core.

Abstract: A laser annealing apparatus according to an embodiment includes a laser light source, an annealing optical system, a linear irradiation region along a Y-direction, a moving mechanism configured to change a relative position of the irradiation region with respect to the substrate along an X-direction, an illumination light source configured to generate illumination light for illuminating the substrate along a third direction, and a detector configured to detect detection light reflected, in a fourth direction, on the substrate illuminated by the illumination light so as to photograph an annealed part of the substrate in a linear field of view along the Y-direction. In a YZ-plane view, the third direction is inclined from the vertical direction and the fourth direction is inclined from the vertical direction.

Abstract: A laser annealing apparatus (1) according to the embodiment includes: a laser beam source (11) configured to emit a laser beam (L1) to crystallize an amorphous silicon film (101a) on a substrate (100) and to form a poly-silicon film (101b); a projection lens (13) configured to condense the laser beam to irradiate a silicon film (101); a probe beam source configured to emit a probe beam (L2); a photodetector (25) configured to detect the probe beam (L3) transmitted through the silicon film (101), a processing apparatus (26) configured to calculate a standard deviation of detection values of a detection signal output from the photodetector, and to determine a crystalline state of the crystallized film based on the standard deviation.

Abstract: A laser annealing apparatus (1) according to the embodiment includes: a laser beam source (11) configured to emit a laser beam (L1) to crystallize an amorphous silicon film (101a) on a substrate (100) and to form a poly-silicon film (101b); a projection lens (13) configured to condense the laser beam to irradiate a silicon film (101); a probe beam source configured to emit a probe beam (L2); a photodetector (25) configured to detect the probe beam (L3) transmitted through the silicon film (101); a processing apparatus (26) configured to calculate a standard deviation of detection values of a detection signal output from the photodetector, and to determine a crystalline state of the crystallized film based on the standard deviation.

Abstract: A manufacturing device of an optical fiber grating to write a grating in a core of an optical fiber by irradiating the optical fiber with laser light includes: a fixing device that fixes the optical fiber to at least one of a first position located more on an upstream side and a second position located more on a downstream side in a conveyance direction of the optical fiber than a laser light irradiating position of the optical fiber in a case of writing the grating; and a feeder having a structure capable of linearly reciprocating in the conveyance direction and adapted to feed a predetermined length of the optical fiber in the conveyance direction in a case where a fixed state of the optical fiber by the fixing device is released.

Abstract: An optical fiber sensor includes: a central core disposed at a center of an optical fiber; and an outer peripheral core that spirally surrounds the central core. The effective refractive index ne2 of the outer peripheral core is lower than the effective refractive index ne1 of the central core. A ratio between the effective refractive index ne2 and the effective refractive index ne1 matches a ratio between an optical path length of the central core and an optical path length of the outer peripheral core.

Abstract: A method for setting a heating condition for thermal aging of each of fiber Bragg gratings, includes: determining, based on a correspondence ?(Ed) between a temperature coefficient ? of each of the fiber Bragg gratings and a demarcation energy Ed of each of the fiber Bragg gratings, a first lower limit Edmin of the demarcation energy Ed such that the temperature coefficient ? is not more than a desired upper limit ?max; and setting the heating condition for thermal aging of each of the fiber Bragg gratings such that the demarcation energy Ed is not less than the first lower limit Edmin.

Abstract: Provided is a method of manufacturing an optical device that includes a multicore fiber including a plurality of cores and a fan-in/fan-out device including single-core fibers that are respectively connected to the cores based on a plurality of connection combinations when the multicore fiber is rotated. The method includes: a first step of determining an optical loss for each of the cores while changing the connection combinations between the single-core fibers and the cores; and a second step of selecting one of the connection combinations according to a result of the first step and connecting an end portion of the multicore fiber and an end portion of the fan-in/fan-out device to connect the single-core fibers with the cores based on the one of the connection combinations.

Abstract: An optical fiber sensor includes: a central core disposed at a center of an optical fiber; and an outer peripheral core that spirally surrounds the central core. The effective refractive index ne2 of the outer peripheral core is lower than the effective refractive index ne1 of the central core. A ratio between the effective refractive index ne2 and the effective refractive index ne1 matches a ratio between an optical path length of the central core and an optical path length of the outer peripheral core.

Abstract: A laser annealing apparatus (1) according to the embodiment includes: a laser beam source (11) configured to emit a laser beam (L1) to crystallize an amorphous silicon film (101a) on a substrate (100) and to form a poly-silicon film (101b); a projection lens (13) configured to condense the laser beam to irradiate a silicon film (101); a probe beam source configured to emit a probe beam (L2); a photodetector (25) configured to detect the probe beam (L3) transmitted through the silicon film (101); a processing apparatus (26) configured to calculate a standard deviation of detection values of a detection signal output from the photodetector, and to determine a crystalline state of the crystallized film based on the standard deviation.

Abstract: A manufacturing device of an optical fiber grating to write a grating in a core of an optical fiber by irradiating the optical fiber with laser light includes: a fixing device that fixes the optical fiber to at least one of a first position located more on an upstream side and a second position located more on a downstream side in a conveyance direction of the optical fiber than a laser light irradiating position of the optical fiber in a case of writing the grating; and a feeder having a structure capable of linearly reciprocating in the conveyance direction and adapted to feed a predetermined length of the optical fiber in the conveyance direction in a case where a fixed state of the optical fiber by the fixing device is released.

Abstract: Provided is an optical coupler configured to cause an NA of light, which exits a taper fiber, to be smaller as compared with a conventional optical coupler. A taper fiber has a high refractive index part which is provided inside a core of the taper fiber and which has a refractive index smaller than a refractive index ncore of the core. An exit end surface of each GI fiber is bonded to an entrance end surface of the taper fiber so that at least a part of the exit end surface of the each GI fiber overlaps with a section of the high refractive index part. A relative refractive index difference of the taper fiber is smaller than 0.076%.