Abstract: An exposure apparatus is capable of accurately performing an exposure process and a measurement process based on a liquid immersion method. The exposure apparatus, which forms a liquid immersion area of a liquid on an image surface side of a projection optical system, and exposes a substrate via the projection optical system and the liquid of the immersion area, includes a measuring device which measures at least one of a property and composition of the liquid for forming the liquid immersion area.

Abstract: A liquid immersion device that has an mixing mechanism that mixes and dissolves a predetermined substance for adjusting specific resistance of the liquid, which is supplied onto a liquid repellent film on the surface of an object (member) of a projection optical system placed on the light emitting side of projection optical system, and an liquid immersion area is formed by supplying the liquid in which the predetermined liquid is dissolved onto the liquid repellent film.

Abstract: A liquid immersion device that has an mixing mechanism that mixes and dissolves a predetermined substance for adjusting specific resistance of the liquid, which is supplied onto a liquid repellent film on the surface of an object (member) of a projection optical system placed on the light emitting side of projection optical system, and an liquid immersion area is formed by supplying the liquid in which the predetermined liquid is dissolved onto the liquid repellent film.

Abstract: A liquid immersion device that has an mixing mechanism that mixes and dissolves a predetermined substance for adjusting specific resistance of the liquid, which is supplied onto a liquid repellent film on the surface of an object (member) of a projection optical system placed on the light emitting side of projection optical system, and an liquid immersion area is formed by supplying the liquid in which the predetermined liquid is dissolved onto the liquid repellent film.

Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

Abstract: A charged particle emission and air-blowing device includes a communication port biased toward an end portion in a predetermined direction with respect to an air outlet, and a width expander configured to widen a flow path between an air directing plate of the end portion and a second blowing duct wider than a periphery. Emitted light from a light guide plate is reflected by the air directing plate in the delivery direction of an air flow. An air flow passes from a downward direction to an upward direction along a circuit board in an auxiliary suction path, and an opening portion faces the upper portion of the circuit board.

Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

Abstract: A charged particle emission and air-blowing device includes a communication port biased toward an end portion in a predetermined direction with respect to an air outlet, and a width expander configured to widen a flow path between an air directing plate of the end portion and a second blowing duct wider than a periphery. Emitted light from a light guide plate is reflected by the air directing plate in the delivery direction of an air flow. An air flow passes from a downward direction to an upward direction along a circuit board in an auxiliary suction path, and an opening portion faces the upper portion of the circuit board.

Abstract: An inlet port 4 and an outlet port 5 which are open in a body housing 2, an air-blowing pathway 20 disposed inside the body housing 2, making the inlet port 4 and the outlet port 5 communicate with each other, and also having a plurality of divisional pathways 22 obtained by division with partition plates 21, an air-blowing fan 7 disposed upstream from the divisional pathways 22 inside the air-blowing pathway 20, a removable inner cover 10 covering the divisional pathways 22 and having an inner surface which forms a side wall of the air-blowing pathway 20, and a removable exterior cover 9 covering the inner cover 10 to form an outer surface of the body housing 2 are provided, and the inner cover 10 has marking portions 11 formed on an outer surface along the partition plates 21.

Abstract: An exposure apparatus comprises a movable member that moves under a projection optical system while holding a substrate; and an immersion nozzle that has a supply port and forms a immersion region under the projection optical system by supplying a liquid to an image plane side of the projection optical system via the supply port. The supply port is provided to a lower surface of the immersion nozzle and the liquid is supplied downwardly from the supply port. A contact area of the immersion region with a surface of the substrate has a rhomboid shape.

Abstract: An exposure apparatus is provided with a nozzle member that has at least one of a supply outlet which supplies the liquid and a collection inlet which recovers the liquid. By immersing the nozzle member in cleaning liquid LK stored in container, the nozzle member is cleaned.

Abstract: A lithography apparatus includes a part having a photocatalytic coating. The lithography apparatus can be an extreme ultraviolet lithography apparatus or an immersion lithography apparatus.

Abstract: An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a flow passage in which exposure liquid flows, the flow passage being in fluidic communication with the space. The apparatus also includes a cleaning system which cleans the member.

Abstract: A cleaning of a liquid immersion exposure apparatus is performed at a different time than an exposure operation. A stage is placed under a liquid supply inlet during a cleaning operation. The cleaning operation is performed at the different time than the exposure operation in which an immersion liquid is supplied onto a substrate held on a holder of the stage. The immersion liquid is supplied from a liquid supply inlet during the cleaning operation. The immersion liquid is supplied to a portion of the stage different from a portion at which the substrate is held by the holder of the stage.

Abstract: An exposure apparatus includes an immersion space forming member (70) which fills an optical path space (K1) for exposure light (EL) with a first liquid (LQ) to form an immersion space, and a temperature regulating mechanism (60) which suppresses a change in the temperature of the immersion space forming member (70) accompanying deactivation of formation of the immersion space.

Abstract: There is provided an immersion type lithographic apparatus. The immersion type lithographic apparatus is provided with at least one immersion space and an immersion system configured to at least partially fill the immersion space with a liquid. The apparatus is configured to rinse at least part of the immersion space with a rinsing liquid before the apparatus is used to project a patterned beam of radiation onto a substrate, and the apparatus is configured to move a substrate holder with respect to a projection system during the rinsing, such that the position of the immersion space changes with respect to the substrate holder during the rinsing.

Abstract: An exposure apparatus EXS forms an immersion area AR2 of a liquid LQ on the side of the image plane of a projection optical system PL and performs exposure of a substrate P via the projection optical system PL and the liquid LQ of the immersion region AR2. The exposure apparatus EXS has an optical cleaning unit (80) which irradiates a predetermined irradiation light Lu, having an optical cleaning effect, onto, for example, the upper surface (31) of the substrate stage PST which makes contact with the liquid LQ for forming the immersion area AR2. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region.

Abstract: An exposure apparatus exposes a substrate with exposure light that passes through an exposure liquid. The exposure apparatus comprises: an optical member, which has an emergent surface wherefrom the exposure light emerges; a first supply port, which supplies the exposure liquid; a liquid immersion member, which is capable of forming an immersion space so that an optical path of the exposure light that emerges from the optical member is filled with the exposure liquid; a second supply port, which supplies a cleaning liquid so that it contacts the liquid immersion member; and a preventive apparatus, which prevents the cleaning liquid and the optical member from contacting one another.