Abstract: A disc picking device having an engaging member for engaging a disc includes: a contact portion having a contact face for contacting an upper face of the disc; an arm which movably supports the engaging member and has the contact portion; and a moving mechanism moving the arm in a contacting direction for contacting the upper face of the disc, wherein the moving mechanism supports the arm such that the contact portion can be moved in a direction opposite to the contacting direction.

Abstract: A disc gripping device is configured for gripping a disc by inserting at least three gripping members into a center hole of a disc and expanding at least one of the gripping members in a radial direction to push an inner circumferential face of the center hole. The at least three gripping members include a first gripping member having a disc contacting face for contacting the inner circumferential face of the center hole, a length of the disc contacting face being greater than a thickness of the inner circumferential face of the center hole; a second gripping member having a disc contacting face for contacting the inner circumferential face of the center hole, a length of the disc contacting face being equal to or smaller than the thickness of the inner circumferential face of the center hole, and a third gripping member having a disc contacting face for contacting the inner circumferential face of the center hole.

Abstract: Pure water dissolving nitrogen gas and containing microbubbles is supplied to a substrate. Since microbubbles are very minute in size and also have the electrostatic property, they can efficiently adsorb particles on the substrate surface or in the pure water. Further, since pure water dissolving nitrogen gas is unlikely to be charged, the pure water itself never carries new particles from each component of the apparatus. These functions allow efficient particle removal from the substrate surface or the liquid.

Abstract: In a substrate processing apparatus of the present invention, a buffer bath is provided at any point in a supplying passage of a processing solution supplying part, and a micro bubble generator is provided in the buffer bath. When a substrate is processed, large quantities of micro bubbles can be generated and stored in the buffer bath, and the micro bubbles can be supplied from the buffer bath to a processing bath. This enables the large quantities of micro bubbles to be supplied to the surrounding of the substrate, while the use of the small micro bubble generator avoids an increase in the size of the substrate processing apparatus.

Abstract: A substrate treating apparatus for treating substrates as immersed in a treating solution includes a treating tank for storing the treating solution and accommodating the substrates, a holding mechanism for holding a plurality of substrates in upstanding posture in the treating tank, and a drive mechanism for revolving the holding mechanism about a virtual horizontal axis extending in a direction of alignment of the plurality of substrates. The plurality of substrates are treated, while the holding mechanism holding the plurality of substrates is immersed in the treating solution, and the drive mechanism is operated to revolve the plurality of substrates about the horizontal axis.

Abstract: On a hot plate, jigs and wafers are joined by bonding wax. A first transport mechanism, a posture change mechanism, a pusher and a second transport mechanism transport the jigs joined with the wafers from the hot plate to a treating transport mechanism. The treating transport mechanism immerses the jigs joined with the wafers in a treating solution stored in a treating tank. Thus, the wafers may be thinned, or otherwise treated, without a turn table directly contacting and damaging the wafers as in the prior art.

Abstract: Pure water dissolving nitrogen gas and containing microbubbles is supplied to a substrate. Since microbubbles are very minute in size and also have the electrostatic property, they can efficiently adsorb particles on the substrate surface or in the pure water. Further, since pure water dissolving nitrogen gas is unlikely to be charged, the pure water itself never carries new particles from each component of the apparatus. These functions allow efficient particle removal from the substrate surface or the liquid.

Abstract: A wafer treating apparatus includes a support for supporting a plate-like base, a heating mechanism for heating the base placed on the support, a first coating mechanism for coating a fixing composition on a surface of the base placed on the support, a loading mechanism for loading a wafer on the base coated with the fixing composition, and a second coating mechanism for coating an end surface protective material over an entire circumference at an edge of the wafer bonded to the base.

Abstract: A liquid within a processing tank is caused to overflow, and the overflowing liquid is circulated by a circulation system. In this process, bubbles are discharged into the liquid within the processing tank. Thus, particles within the processing tank are not only carried along by a flow of the liquid but also attach to the bubbles to be carried with the bubbles outwardly of the processing tank. A dip-type substrate processing apparatus removes the particles within the processing tank in a short time with efficiency.

Abstract: A substrate treating apparatus for performing a predetermined treatment of substrates, includes a treating tank for storing a treating solution, a holding mechanism for holding the substrates, and loading and unloading the substrates into/from the treating tank, a first lid member for opening and closing an upper opening of the treating tank, the first lid member having an insert opening for receiving a back plate of the holding mechanism, and a second lid member disposed on the first lid member for opening and closing the insert opening. When the holding mechanism is outside the treating tank and the first lid member is closed, the second lid member closes an area above the insert opening, and forms lateral openings.

Abstract: A substrate treating apparatus for treating substrates as immersed in a treating solution includes a treating tank for storing the treating solution and accommodating the substrates, a holding mechanism for holding a plurality of substrates in upstanding posture in the treating tank, and a drive mechanism for revolving the holding mechanism about a virtual horizontal axis extending in a direction of alignment of the plurality of substrates. The plurality of substrates are treated, while the holding mechanism holding the plurality of substrates is immersed in the treating solution, and the drive mechanism is operated to revolve the plurality of substrates about the horizontal axis.

Abstract: A head chip has a front face formed with nozzle orifices, and a rear face formed with at least one ink inlet. A damping chamber forming member is laminated on the rear face of the head chip. The damping chamber forming member has at least one damping chamber for dampening pressure fluctuation occurred therein, and an ink supply port for supplying ink from the damping chamber to the head chip.

Abstract: In a pump driver for selectively driving a plurality of pumps, a sun gear is rotated by a single drive source. A planetary gear is meshed with the sun gear. A planetary carrier rotatably supports the planetary gear revolvably around the sun gear. A plurality of driving gears are arranged in a one-by-one manner with respect to the pumps such that the planetary gear meshes with one of the driving gears to selectively drive one of the pumps. A revolution limiter allows a revolution of the planetary gear in a first direction and restricts a revolution of the planetary gear in a second direction opposite to the first direction at a position where the planetary gear meshes with one of the driving gears.

Abstract: A maintenance apparatus wipes the nozzle surface of a print head using a wiper having no ink adhering thereto. The maintenance apparatus has a wiper that moves in a direction towards and away from the plane of the nozzle surface of a print head that travels bidirectionally widthwise to the printing paper. A remover removes foreign matter on the wiper when the wiper is moved while in contact with the rake part of the remover.

Abstract: A maintenance apparatus simplifies the cam mechanism for moving a capping mechanism and wiper mechanism, thereby making the printer smaller. A maintenance apparatus 30 has a capping mechanism 40 for covering or sealing the nozzle surface 15 of a print head 12 having nozzles for discharging ink droplets, a wiper mechanism 50 for wiping the nozzle surface 15 of the print head 12, and a cam 60. The cam 60 is rotatably disposed solid of revolution having on the side thereof a first cam channel 61 for moving the capping mechanism 40 and a cam channel 62 for moving the wiper mechanism 50.

Abstract: An ink jet printer including an optical detector attached to a carriage on which a head chip is mounted, and one or more detected parts that can be detected by the detector formed on sides of ink cartridges placed in an ink cartridge holder. Each of the detected parts may be implemented as a right-angle prism. The one or more detected parts are operable to detect the presence or absence of ink and the corresponding ink cartridge being placed, among other features. Since the common optical detector and the one or more detected parts can detect a plurality of pieces of information, the ink jet printer is extremely advantageous for cost reduction and miniaturization as compared with the case where dedicated detection mechanisms are provided in a one-to-one correspondence with pieces of information to be detected as in a related art.

Abstract: In a pump driver for selectively driving a plurality of pumps, a sun gear is rotated by a single drive source. A planetary gear is meshed with the sun gear. A planetary carrier rotatably supports the planetary gear revolvably around the sun gear. A plurality of driving gears are arranged in a one-by-one manner with respect to the pumps such that the planetary gear meshes with one of the driving gears to selectively drive one of the pumps. A revolution limiter allows a revolution of the planetary gear in a first direction and restricts a revolution of the planetary gear in a second direction opposite to the first direction at a position where the planetary gear meshes with one of the driving gears.

Abstract: A head chip has a front face formed with nozzle orifices, and a rear face formed with at least one ink inlet. A damping chamber forming member is laminated on the rear face of the head chip. The damping chamber forming member has at least one damping chamber for dampening pressure fluctuation occurred therein, and an ink supply port for supplying ink from the damping chamber to the head chip through the ink inlet.

Abstract: A maintenance apparatus wipes the nozzle surface of a print head using a wiper having no ink adhering thereto. The maintenance apparatus has a wiper that moves in a direction towards and away from the plane of the nozzle surface of a print head that travels bidirectionally widthwise to the printing paper. A remover removes foreign matter on the wiper when the wiper is moved while in contact with the rake part of the remover.

Abstract: A maintenance apparatus simplifies the cam mechanism for moving a capping mechanism and wiper mechanism, thereby making the printer smaller. A maintenance apparatus 30 has a capping mechanism 40 for covering or sealing the nozzle surface 15 of a print head 12 having nozzles for discharging ink droplets, a wiper mechanism 50 for wiping the nozzle surface 15 of the print head 12, and a cam 60. The cam 60 is rotatably disposed solid of revolution having on the side thereof a first cam channel 61 for moving the capping mechanism 40 and a cam channel 62 for moving the wiper mechanism 50.