Patents by Inventor Kenichiro Satoh

Kenichiro Satoh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7189492
    Abstract: A photosensitive composition containing a compound capable of generating a specific acid having the plural number of sulfonic groups by irradiation with an actinic ray or a radiation and a pattern forming method using the same.
    Type: Grant
    Filed: September 10, 2004
    Date of Patent: March 13, 2007
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kunihiko Kodama, Kenji Wada, Kenichiro Satoh
  • Publication number: 20050095532
    Abstract: A photosensitive composition containing a compound capable of generating a specific acid having the plural number of sulfonic groups by irradiation with an actinic ray or a radiation and a pattern forming method using the same.
    Type: Application
    Filed: September 10, 2004
    Publication date: May 5, 2005
    Inventors: Kunihiko Kodama, Kenji Wada, Kenichiro Satoh
  • Patent number: 5554481
    Abstract: A positive working photoresist composition sensitive to radiation, having high resolving power, high sensitivity, and excellent storage stability, and further forming a pattern capable of accurately reproducing a mask size in a wide range of photomask line width. The present invention has been obtained by a composition containing at least one of a 1,2-napthoquinonediazido-5-sulfonic acid ester of a polyhydroxy compound and a 1,2-napthoquinonediazido-4-sulfonic acid ester of a polyhydroxy compound in combination with at least one alkali-soluble resin.
    Type: Grant
    Filed: December 22, 1994
    Date of Patent: September 10, 1996
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yasumasa Kawabe, Kenichiro Satoh, Toshiaki Aoai