Patents by Inventor Kenji Adachi

Kenji Adachi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9242911
    Abstract: An object of the present invention is to provide a method that enables the easy and efficient (high yield, high selectivity, low cost) preparation of a fluorine-containing olefin substituted with an organic group or groups from a fluorine-containing olefin. [Solution] The method for preparing a fluorine-containing olefin substituted with an organic group or groups, the method comprising a step of reacting a fluorine-containing olefin with an organic boron compound in the presence of an organic transition metal catalyst containing at least one transition metal selected from the group consisting of nickel, palladium, platinum, rhodium, ruthenium, and cobalt.
    Type: Grant
    Filed: March 8, 2012
    Date of Patent: January 26, 2016
    Assignees: OSAKA UNIVERSITY, DAIKIN INDUSTRIES, LTD.
    Inventors: Takabumi Nagai, Kenji Adachi, Takashi Shibanuma, Sensuke Ogoshi, Masato Ohashi
  • Patent number: 9245764
    Abstract: This semiconductor device manufacturing method is provided with: a film-forming step wherein a silicon nitride layer or a silicon oxide layer is formed such that a side wall portion of a silicon-containing layer, which is formed on a substrate and patterned, is covered with the silicon nitride layer or the silicon oxide layer; and a plasma etching step wherein the silicon-containing layer is selectively removed, and the silicon nitride layer or the silicon oxide layer formed on the side wall portion is left. In the plasma etching step, an etching gas containing SF6 gas is used.
    Type: Grant
    Filed: November 16, 2012
    Date of Patent: January 26, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Eiichi Nishimura, Tadashi Kotsugi, Fumiko Yamashita, Kenji Adachi
  • Publication number: 20150329701
    Abstract: A nonionic surfactant composition including: a nonionic surfactant that contains a molecule having a C10-C22 alkyl group and/or alkenyl group as a hydrophobic group, a polyoxyalkylene chain as a hydrophilic group, no aromatic ring, no C9-C14 alkyl group derived from an alcohol that is produced from a higher olefin derived from a mixture of propylene and butene through an oxo process, and no C13 alkyl group derived from an alcohol that is produced from a higher olefin derived from a propylene tetramer through an oxo process. The nonionic surfactant has a hydrodynamic radius of 5.0 to 8.0 nm at 40° C. in an aqueous solution in which a nonionic surfactant concentration is 0.1 kg/L in the nonionic surfactant composition, the radius being measured by a dynamic light scattering method.
    Type: Application
    Filed: March 27, 2013
    Publication date: November 19, 2015
    Applicants: DAIKIN INDUSTRIES, LTD., OSAKA UNIVERSITY, DAI-ICHI KOGYO SEIYAKU CO., LTD.
    Inventors: Nobuhiko TSUDA, Atsuko TANAKA, Kenji ADACHI, Nahoko IZAKI, Masayuki HASHIMOTO, Takahiro SATO
  • Publication number: 20150314266
    Abstract: The present invention is to provide a material that is capable of selectively adsorbing organic fluoro-compounds such as perfluorooctane sulfonic acid, allows the adsorbed organic fluoro-compounds to be recovered, and is reusable as an adsorbent, specifically to provide a polymer in which cyclodextrin is supported on the surface of a water-insoluble polymer, and an adsorbent containing the same, and a method of use of the same as a selective adsorbent of, in particular, an organic fluoro-compound.
    Type: Application
    Filed: November 19, 2013
    Publication date: November 5, 2015
    Applicants: OSAKA UNIVERSITY, DAIKIN INDUSTRIES, LTD.
    Inventors: Kenji ADACHI, Masaki KURAMITSU, Mitsuru AKASHI, Toshiyuki KIDA
  • Publication number: 20150153478
    Abstract: Provided is an infrared-shielding nanoparticle dispersion that has a property whereby visible light is adequately transmitted, and light in the near-infrared region is adequately shielded. The infrared-shielding nanoparticles include a plural aggregate of electroconductive particles composed of a tungsten oxide expressed by the general formula WyOz (where W is tungsten, O is oxygen, and 2.2?z/y?2.999), and/or a composite tungsten oxide expressed by the general formula MxWyOz (where M is one or more elements selected from H, alkali metals, alkaline-earth metals, rare earth elements, Mg, Zr, Cr, Mn, Fe, Ru, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd, Al, Ga, In, Tl, Si, Ge, Sn, Pb, Sb, B, F, P, S, Se, Br, Te, Ti, Nb, V, Mo, Ta, Re, Be, Hf, Os, Bi, and I; W is tungsten; O is oxygen; 0.001?x/y?1.1; and 2.2?z/y?3.0).
    Type: Application
    Filed: February 5, 2015
    Publication date: June 4, 2015
    Inventors: Hiromitsu TAKEDA, Kenji ADACHI
  • Publication number: 20150076619
    Abstract: Variations in the contact area between contact plugs are suppressed to suppress fluctuations in contact resistance. In three third interlayer insulating films, a contact hole is self-alignedly formed to extend through the portions thereof interposed between two wiring portions and the portions thereof interposed between two gate wiring portions and reach a first polysilicon plug. In the contact hole, a second polysilicon plug is formed to come in contact with the first polysilicon plug.
    Type: Application
    Filed: August 14, 2014
    Publication date: March 19, 2015
    Applicant: Renesas Electronics Corporation
    Inventors: Kenji ADACHI, Yukio MAKI
  • Publication number: 20150078414
    Abstract: According to one embodiment, in a method of testing a semiconductor device, the semiconductor device has a semiconductor element and a substrate which are bonded by bonding material including metal fine particles. Image data of a heat distribution in the semiconductor device are temporally acquired while heating the semiconductor device. A time change of a fractal dimension based on the image data is calculated. An inclination of the time change of the fractal dimension is calculated. The inclination and a reference inclination set in advance are compared. Whether or not the semiconductor device is good is determined.
    Type: Application
    Filed: March 3, 2014
    Publication date: March 19, 2015
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Yuuji Hisazato, Kazuya Kodani, Yo Sasaki, Daisuke Hiratsuka, Hitoshi Matsumura, Hideaki Kitazawa, Kenji Adachi
  • Publication number: 20150079790
    Abstract: This semiconductor device manufacturing method is provided with: a film-forming step wherein a silicon nitride layer or a silicon oxide layer is formed such that a side wall portion of a silicon-containing layer, which is formed on a substrate and patterned, is covered with the silicon nitride layer or the silicon oxide layer; and a plasma etching step wherein the silicon-containing layer is selectively removed, and the silicon nitride layer or the silicon oxide layer formed on the side wall portion is left. In the plasma etching step, an etching gas containing SF6 gas is used.
    Type: Application
    Filed: November 16, 2012
    Publication date: March 19, 2015
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Eiichi Nishimura, Tadashi Kotsugi, Fumiko Yamashita, Kenji Adachi
  • Patent number: 8980135
    Abstract: An object of the present invention is to provide an infrared-shielding nanoparticle dispersion that has a property whereby visible light is adequately transmitted, and light in the near-infrared region is adequately shielded; an infrared-shielding body manufactured using the infrared-shielding nanoparticle dispersion; a method for manufacturing infrared-shielding nanoparticles that are used in the infrared-shielding nanoparticle dispersion; and infrared-shielding nanoparticles manufactured using the method for manufacturing infrared-shielding nanoparticles.
    Type: Grant
    Filed: August 31, 2005
    Date of Patent: March 17, 2015
    Assignee: Sumitomo Metal Mining Co., Ltd.
    Inventors: Hiromitsu Takeda, Kenji Adachi
  • Patent number: 8945646
    Abstract: There is provided a method for manufacturing inexpensive, highly safe, highly stable, versatile polymethoxyflavones that can be used in food products and easily incorporated into a variety of pharmaceutical formulations, whereby in one pass, a large quantity of polymethoxyflavones can be isolated from other components in citrus peel oil, as well as a method for its use. The method for manufacturing polymethoxyflavones from citrus plant peel oil comprises a step of removing the volatile components in citrus plant peel oil by distillation to obtain a distillation residue, a step of distilling the residue with a thin-film vacuum distillation apparatus to obtain a fraction, a step of extracting the fraction with an aqueous ethanol solution to obtain an extract, and a step of contacting active carbon with the extract after removal of the insoluble oils in the extract for refining, as a method for manufacturing polymethoxyflavones that are highly stable over time and have reduced residual pesticide levels.
    Type: Grant
    Filed: January 29, 2010
    Date of Patent: February 3, 2015
    Assignee: Ogawa & Co., Ltd.
    Inventors: Kenji Adachi, Tsuyoshi Arima, Shuichi Muranishi
  • Publication number: 20140234198
    Abstract: Provided is an etching method including: (1) bringing a material containing at least one organic compound having an N—F bond into contact with the surface of a solid material; and (2) a step of heating the solid material; whereby etching can be performed safely and in a simple manner, at a higher etching rate, without the use of a high-environmental-load gas that causes global warming or highly reactive and toxic fluorine gas or hydrofluoric acid. The etching method may further include: (3) a step of exposing the solid material to light from the side of the material containing at least one organic compound having an N—F bond; and (4) a step of removing the material containing at least one organic compound having an N—F bond together with the residue remained between said material and the solid material.
    Type: Application
    Filed: August 10, 2012
    Publication date: August 21, 2014
    Applicants: DAIKIN INDUSTRIES, LTD., OSAKA UNIVERSITY
    Inventors: Mizuho Morita, Junichi Uchikoshi, Kentaro Tsukamoto, Takabumi Nagai, Kenji Adachi
  • Publication number: 20140113058
    Abstract: A flavor deterioration inhibitor which comprises an extract obtained by extracting Angelica keiskei, avocado, Cassia tora, Plantago asiatica L, hawthorn, fermented tea leaves or semi-fermented tea leaves with water, an organic polar solvent or a mixture thereof; and a deterioration smell inhibitor for citral or a citral-containing product. By adding the above flavor deterioration inhibitor to foods, drinks or oral care products, it is possible to inhibit the deterioration of a flavor which is easily affected by light, heat, oxygen and so on. In particular, a remarkable inhibitory effect can be achieved on deterioration due to light. By blending the above deterioration smell inhibitor with citral or a citral-containing product, the generation of the deterioration smell (caused by p-cresol and p-methylacetophenone) due to the passage of time or heating can be effectively inhibited.
    Type: Application
    Filed: December 23, 2013
    Publication date: April 24, 2014
    Applicant: Ogawa & Co., Ltd.
    Inventors: Kenji ADACHI, Shuichi Muranishi, Susumu KIYOHARA, Yuya SEKIGUCHI, Hideki MASUDA
  • Publication number: 20140034584
    Abstract: According to an embodiment of the present disclosure, a process liquid supply apparatus operating method is provided. The method includes filling a filter unit with a process liquid from an upstream side of the filter unit to a downstream side of the filter unit after newly mounting or replacing the filter unit and repeating a depressurization filtering process and a pressurization filtering process for a predetermined number of times. The depressurization filtering process depressurizes the process liquid in the downstream side of the filter unit and thereby allows the process liquid to permeate through the filter unit. The pressurization filtering process pressurizes the process liquid from the upstream side of the filter unit and thereby allows the process liquid to permeate through the filter unit.
    Type: Application
    Filed: August 1, 2013
    Publication date: February 6, 2014
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hiroshi MARUMOTO, Koji TAKAYANAGI, Kenji ADACHI
  • Publication number: 20140019025
    Abstract: A soot accumulation computing and displaying device, including: a first calculating part that is configured to calculate a first inferred value of a present accumulation amount of the soot, based on a main fuel injection amount and a post fuel injection amount; a second calculating part that is configured to calculate a second inferred value of a present accumulation amount of the soot, based on a driving time of the internal-combustion engine, which is estimated to a present time from a starting time of a latest regeneration processing of the filter among regeneration processings of the filter conducted in past; a determining part that is configured to determine a maximum inferred value among the first and second inferred values; and a displaying part that is configured to perform displaying with regards to the maximum inferred value determined by the determining part.
    Type: Application
    Filed: July 2, 2013
    Publication date: January 16, 2014
    Inventors: Toru SHINOMIYA, Kenji ADACHI, Naohiro FUKUYAMA, Shinji OKUBO
  • Publication number: 20130324757
    Abstract: An object of the present invention is to provide a method that enables the easy and efficient (high yield, high selectivity, low cost) preparation of a fluorine-containing olefin substituted with an organic group or groups from a fluorine-containing olefin. [Solution] The method for preparing a fluorine-containing olefin substituted with an organic group or groups, the method comprising a step of reacting a fluorine-containing olefin with an organic boron compound in the presence of an organic transition metal catalyst containing at least one transition metal selected from the group consisting of nickel, palladium, platinum, rhodium, ruthenium, and cobalt.
    Type: Application
    Filed: March 8, 2012
    Publication date: December 5, 2013
    Applicants: Daikin Industries, Osaka University
    Inventors: Takabumi Nagai, Kenji Adachi, Takashi Shibanuma, Sensuke Ogoshi, Masato Ohashi
  • Publication number: 20120301596
    Abstract: There is provided a method for manufacturing inexpensive, highly safe, highly stable, versatile polymethoxyflavones that can be used in food products and easily incorporated into a variety of pharmaceutical formulations, whereby in one pass, a large quantity of polymethoxyflavones can be isolated from other components in citrus peel oil, as well as a method for its use. The method for manufacturing polymethoxyflavones from citrus plant peel oil comprises a step of removing the volatile components in citrus plant peel oil by distillation to obtain a distillation residue, a step of distilling the residue with a thin-film vacuum distillation apparatus to obtain a fraction, a step of extracting the fraction with an aqueous ethanol solution to obtain an extract, and a step of contacting active carbon with the extract after removal of the insoluble oils in the extract for refining, as a method for manufacturing polymethoxyflavones that are highly stable over time and have reduced residual pesticide levels.
    Type: Application
    Filed: January 29, 2010
    Publication date: November 29, 2012
    Applicant: Ogawa & Co Ltd
    Inventors: Kenji Adachi, Tsuyoshi Arima, Shuichi Muranishi
  • Patent number: 8318051
    Abstract: The present invention provides a light-absorbent resin composition for laser welding whereby transparency can be maintained and stable laser welding is possible. The light-absorbent resin composition for laser welding includes a resin and laser-light-absorbent nanoparticles, wherein the laser-light-absorbent nanoparticles are nanoparticles of tungsten oxide indicated by the general formula WyOz, and/or nanoparticles of composite tungsten oxide indicated by the general formula MxWyOz.
    Type: Grant
    Filed: November 14, 2007
    Date of Patent: November 27, 2012
    Assignee: Sumitomo Metal Mining Co., Ltd.
    Inventor: Kenji Adachi
  • Patent number: 8083847
    Abstract: To provide an infrared-shielding body sufficiently transmitting visible rays, having no half-mirror shaped appearance, requiring no large-scale apparatus when forming a film on a substrate, efficiently shutting invisible near-infrared rays with wavelength range of 780 nm or more, while eliminating a heat treatment at high temperature after film formation, and having a spectral characteristic such as transparency with no change of color tone. The starting material, which is a mixture containing a predetermined amount of a tungsten compound, is heated at 550° C. in a reductive atmosphere for 1 hour, then cooled to room temperature once in an argon atmosphere, thus producing powder of W18O49. Then, the powder, the solvent, and the dispersant are mixed, then subjected to dispersion treatment to obtain a dispersion solution. The dispersion solution and a UV-curable hardcoat resin are mixed to obtain a solution of fine particle dispersion of infrared-shielding material.
    Type: Grant
    Filed: October 15, 2004
    Date of Patent: December 27, 2011
    Assignee: Sumitomo Metal Mining Co., Ltd.
    Inventors: Hiromitsu Takeda, Kenji Adachi
  • Patent number: 7943524
    Abstract: Silicon oxide film having, as a sublayer, a silicon nitride film layer serving as a protective film layer for 5 gate formed on silicon substrate is etched by introducing a processing gas including a gaseous mixture containing at least C4F6, Ar, O2 and N2 into an airtight processing chamber and carrying out a plasma treatment in a self-alignment contact process, thereby forming contact hole. For the 10 processing gas, e.g., the ratio of N2 gas flow rate to C4F6 gas flow rate ranges from 25/8 to 85/8, the ratio of O2 and N2 gas flow rate to C4F6 gas flow rate ranges from 15/4 to 45/4 and the ratio of N2 gas flow rate to O2 gas flow rate ranges from 5 to 17. Accordingly, stable contact holes of 15 high aspect ratio exhibiting desirable control characteristics is formed while minimizing etching the silicon nitride film, a protective film layer for gate.
    Type: Grant
    Filed: July 20, 2007
    Date of Patent: May 17, 2011
    Assignee: Tokyo Electrons Limited
    Inventors: Noriyuki Kobayashi, Kenji Adachi
  • Publication number: 20110091720
    Abstract: An object is to provide a fiber that absorbs heat with good efficiency, has excellent transparency and heat-retaining properties, and does not compromise the design characteristics of a textile product, and to provide a textile product in which the fiber is used. Hexaboride nanoparticles, a dispersion medium, and a dispersion agent for dispersing the nanoparticles are mixed together. The mixture is dispersed and dried to obtain a dispersion powder. The resulting dispersion powder is added to thermoplastic resin pellets, uniformly mixed, and thereafter melted and kneaded to obtain a master batch containing a heat-absorbing component. The master batch containing a heat-absorbing component is mixed with a similarly prepared master batch to which inorganic nanoparticles has not been added, and the mixture is melted, spun, and drawn to manufacture a multifilament yarn. The multifilament yarn is cut to fabricate staples, and the staples are used to manufacture a spun yarn having heat-absorbing effects.
    Type: Application
    Filed: December 17, 2010
    Publication date: April 21, 2011
    Applicant: SUMITOMO METAL MINING CO., LTD.
    Inventors: Kayo Yabuki, Kenichi Fujita, Hiromitsu Takeda, Kenji Adachi