Patents by Inventor Kenji Hoshiko

Kenji Hoshiko has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10272426
    Abstract: The present disclosure relates to a method of producing a microfluidic device, a microfluidic device, and a photosensitive resin composition, the method including the steps of: forming a resin layer on a support from a photosensitive resin composition that includes a compound having at least two radical-polymerizable groups, a photoradical generator, a compound having at least two cationically reactive groups, a photocation generator, and at least one compound selected from a protective group-containing amine, a photodegradable base, an imide structure-containing compound, an amide structure-containing compound and an urea structure-containing compound; partially UV-exposing and developing the resin layer; preparing a laminate by placing a cover material on the thus developed resin layer; and UV-exposing the thus obtained laminate.
    Type: Grant
    Filed: April 19, 2016
    Date of Patent: April 30, 2019
    Assignee: JSR CORPORATION
    Inventors: Isao Nishimura, Kenji Hoshiko, Masahiro Kaneko
  • Publication number: 20160310944
    Abstract: The present disclosure relates to a method of producing a microfluidic device, a microfluidic device, and a photosensitive resin composition, the method including the steps of: forming a resin layer on a support from a photosensitive resin composition that includes a compound having at least two radical-polymerizable groups, a photoradical generator, a compound having at least two cationically reactive groups, a photocation generator, and at least one compound selected from a protective group-containing amine, a photodegradable base, an imide structure-containing compound, an amide structure-containing compound and an urea structure-containing compound; partially UV-exposing and developing the resin layer; preparing a laminate by placing a cover material on the thus developed resin layer; and UV-exposing the thus obtained laminate.
    Type: Application
    Filed: April 19, 2016
    Publication date: October 27, 2016
    Applicant: JSR CORPORATION
    Inventors: Isao NISHIMURA, Kenji HOSHIKO, Masahiro KANEKO
  • Publication number: 20110223537
    Abstract: A radiation-sensitive resin composition includes a polymer, a photoacid generator, and an acid diffusion controller. The polymer includes a first repeating unit shown by a following formula (a-1). The acid diffusion controller includes at least one of a base shown by a following formula (C-1) and a photodegradable base, wherein each R1 represents a hydrogen atom or the like, R represents a monovalent group shown by an above formula (a?), each R19 represents a chain hydrocarbon group having 1 to 5 carbon atoms or the like, A represents a divalent chain hydrocarbon group having 1 to 30 carbon atoms or the like, and m and n are integers from 0 to 3 (m+n=1 to 3), wherein each of R2 and R3 represents a monovalent chain hydrocarbon group having 1 to 20 carbon atoms or the like.
    Type: Application
    Filed: March 10, 2011
    Publication date: September 15, 2011
    Applicant: JSR Corporation
    Inventors: Takuma Ebata, Hiroki Nakagawa, Yasuhiko Matsuda, Kazuki Kasahara, Kenji Hoshiko, Hiromitsu Nakashima, Norihiko Ikeda, Kaori Sakai, Saki Harada