Patents by Inventor Kenji Ishikura

Kenji Ishikura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11325199
    Abstract: The present invention provides a cutting work method comprising a cutting work step of forming a through-groove passing through from a surface to a back face of a workpiece material by cutting the workpiece material with a cutting tool while bringing a lubricant material for assisting cutting process into contact with the cutting tool and/or the to-be-processed portion of the workpiece material, wherein the workpiece material comprises one or more materials selected from the group consisting of a metal, a fiber reinforced plastic, ceramic, and a composite material thereof.
    Type: Grant
    Filed: February 16, 2017
    Date of Patent: May 10, 2022
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Yousuke Matsuyama, Shigeru Horie, Kazuhiro Nakamura, Kenji Ishikura
  • Patent number: 11225625
    Abstract: A lubricant material for assisting machining process comprising a polyethylene oxide-polypropylene oxide copolymer having a weight average molecular weight of 5.0×104 or more and 2.0×105 or less.
    Type: Grant
    Filed: May 24, 2018
    Date of Patent: January 18, 2022
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Shigeru Horie, Yousuke Matsuyama, Kazuhiro Nakamura, Kenji Ishikura
  • Patent number: 11214748
    Abstract: A lubricant material for assisting machining process comprising fullerene.
    Type: Grant
    Filed: April 20, 2018
    Date of Patent: January 4, 2022
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Shigeru Horie, Yousuke Matsuyama, Kazuhiro Nakamura, Kenji Ishikura
  • Publication number: 20210062103
    Abstract: A lubricant material for assisting machining process comprising a polyethylene oxide-polypropylene oxide copolymer having a weight average molecular weight of 5.0×104 or more and 2.0×105 or less.
    Type: Application
    Filed: May 24, 2018
    Publication date: March 4, 2021
    Inventors: Shigeru HORIE, Yousuke MATSUYAMA, Kazuhiro NAKAMURA, Kenji ISHIKURA
  • Publication number: 20210060673
    Abstract: The present invention provides a cutting work method comprising a cutting work step of forming a through-groove passing through from a surface to a back face of a workpiece material by cutting the workpiece material with a cutting tool while bringing a lubricant material for assisting cutting process into contact with the cutting tool and/or the to-be-processed portion of the workpiece material, wherein the workpiece material comprises one or more materials selected from the group consisting of a metal, a fiber reinforced plastic, ceramic, and a composite material thereof.
    Type: Application
    Filed: February 16, 2017
    Publication date: March 4, 2021
    Inventors: Yousuke MATSUYAMA, Shigeru HORIE, Kazuhiro NAKAMURA, Kenji ISHIKURA
  • Publication number: 20200299601
    Abstract: A lubricant material for assisting machining process comprising fullerene.
    Type: Application
    Filed: April 20, 2018
    Publication date: September 24, 2020
    Inventors: Shigeru HORIE, Yousuke MATSUYAMA, Kazuhiro NAKAMURA, Kenji ISHIKURA
  • Patent number: 10518341
    Abstract: The present invention provides a cutting method comprising a cutting step of cutting a workpiece material with a cutting tool to thereby form a through-groove in the workpiece material, wherein in the cutting step, the through-groove is formed in the workpiece material by cutting the workpiece material with the cutting tool while contacting a cut-assisting lubricant with the contact portion of the cutting tool with the workpiece material and/or the contact portion of the workpiece material with the cutting tool, and the workpiece material comprises a fiber reinforced composite material.
    Type: Grant
    Filed: November 25, 2016
    Date of Patent: December 31, 2019
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yousuke Matsuyama, Shigeru Horie, Kenji Ishikura, Yoshihiro Kato, Kazuhiro Nakamura
  • Publication number: 20180243846
    Abstract: The present invention provides a cutting method comprising a cutting step of cutting a workpiece material with a cutting tool to thereby form a through-groove in the workpiece material, wherein in the cutting step, the through-groove is formed in the workpiece material by cutting the workpiece material with the cutting tool while contacting a cut-assisting lubricant with the contact portion of the cutting tool with the workpiece material and/or the contact portion of the workpiece material with the cutting tool, and the workpiece material comprises a fiber reinforced composite material.
    Type: Application
    Filed: November 25, 2016
    Publication date: August 30, 2018
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yousuke MATSUYAMA, Shigeru HORIE, Kenji ISHIKURA, Yoshihiro KATO, Kazuhiro NAKAMURA
  • Patent number: 6059878
    Abstract: A method is used when manufacturing a bismuth-substituted rare-earth iron garnet single crystal (BIG) film by the LPE method. The BIG film is grown on one side of a non-magnetic garnet substrate using a melt that contains flux components and rare-earth oxides. An amount of calcium is added to the melt such that a difference between optical absorption coefficients of the film at a wavelength of 0.78 .mu.m before and after subjecting the film to hydrogen-reduction treatment ranges from 660 to 1430 dB/cm. The film is grown on a non-magnetic garnet substrate having a thickness in the range of 400-600 .mu.m, at a crystal growth temperature of the melt to form a film-substrate structure. The film-substrate structure has a curvature ranging from +0.3 to +0.7 m.sup.-1 at room temperature. The film-substrate structure is subjected to the hydrogen reduction at a temperature ranging from 320 to 400.degree. C.
    Type: Grant
    Filed: March 8, 1999
    Date of Patent: May 9, 2000
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Norio Takeda, Kiyonari Hiramatsu, Kenji Ishikura
  • Patent number: 5941661
    Abstract: Beds for wave dissipation having a lattice frame are arranged near a shore line of a shore and wave dissipating materials are stacked on the beds to make a wave dissipating structure, and sand is accumulated on the land side behind the wave dissipating structure. The wave dissipating structure (20) constructed by placing and stacking wave dissipating materials on a lattice frame (10) sinks in proportion to the amount of sand scoured away around the structure or at the bottom thereof, without scattering of the wave dissipating materials by ocean waves, the sinking stops when the effect of ocean waves is not exerted, ocean waves collide with the head part of the wave dissipating structure, crushed waves containing a lot of sand rushes up, and the carried sand is left in backwashing to be accumulated on the land side behind the wave dissipating structure (20). Thus, the sand ground surface (8) rises to a place (9).
    Type: Grant
    Filed: August 11, 1997
    Date of Patent: August 24, 1999
    Assignee: Soken Kogyo Co., Ltd.
    Inventor: Kenji Ishikura
  • Patent number: 5920420
    Abstract: A Faraday rotator is formed of a bismuth-substituted iron garnet single crystal film on which an antireflection film is formed. The antireflection film includes first, second, and third layers. The first layer is a layer of silicon dioxide. The second layer is a layer of tantalum pentoxide. The third layer is a layer of silicon dioxide. The first, second, and third layers are formed in this order from the atmosphere side on the bismuth-substituted iron garnet single crystal film. The antireflection film may be formed on both of opposing surfaces of the single crystal film.
    Type: Grant
    Filed: July 23, 1997
    Date of Patent: July 6, 1999
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Kenji Ishikura, Kiyonari Hiramatsu, Kazushi Shirai, Norio Takeda
  • Patent number: 5565131
    Abstract: A bismuth-substituted rare earth iron garnet single crystal film is represented by a general equation Tb.sub.x Lu.sub.y Bi.sub.3-x-y Fe.sub.5-z Al.sub.z O.sub.12 (where 0.09.ltoreq.y/x.ltoreq.0.23, 1.40.ltoreq.x+y.ltoreq.1.70, 0.20.ltoreq.z.ltoreq.0.38) grown on a non-magnetic garnet substrate (CaGd).sub.3 (MgZrGa).sub.5 O.sub.12 having a lattice constant of 12.490 .ANG.-12.500 .ANG. by a liquid phase epitaxial method. The bithmus-substituted rare earth iron garnet single crystal film satisfies three conditions that (1) the Faraday effect is large, i.e., the film thickness required for the Faraday rotator at a wavelength of 1.55 .mu.m is 450 .mu.m or less, (2) the saturated magnetic field is 800 (Oe) or less, and (3) the temperature coefficient .alpha. is 0.07 deg/.degree.C. or less.
    Type: Grant
    Filed: January 5, 1995
    Date of Patent: October 15, 1996
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Kazushi Shirai, Kenji Ishikura, Norio Takeda
  • Patent number: 5512193
    Abstract: A bismuth-substituted rare earth iron garnet single crystal grown on a non-magnetic substrate having a lattice constant of 12.490 .ANG.-12.510 .ANG. by the liquid phase epitaxial method, and represented by a general equation:Gd.sub.x R.sub.y Bi.sub.3-x-y Fe.sub.5-z-w Ga.sub.z Al.sub.w O.sub.12where R denotes at least one element selected from the group consisting of yttrium (Y), ytterbium (Yb) and lutetium (Lu), and x, y, z and w are numerical values in the ranges 0.50.ltoreq.y/x.ltoreq.1.35, 1.40.ltoreq.x+y.ltoreq.1.90, 0.0.ltoreq.w/z.ltoreq.0.3 and 0.7.ltoreq.z+w.ltoreq.1.25. The magneto-optic optical switch or Faraday rotator constituted by the bismuth-constituted rare iron garnet is stably operable in a temperature range of -20.degree. C. to 60.degree. C. Because of the saturated magnetic field is 160 (Oe) or less, a magnetic field application device necessary to invert the magnetic field can be miniaturized.
    Type: Grant
    Filed: May 23, 1995
    Date of Patent: April 30, 1996
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Kazushi Shirai, Kenji Ishikura, Norio Takeda