Abstract: An evaporating apparatus 10 includes a vapor deposition source 210, a transport path 110e21, a blowing vessel 110 and a first processing chamber 100. The transport path 110e21 is connected with the vapor deposition source 210 via a connection path 220e and transports a film forming material vaporized from the vapor deposition source 210. A blowing port 110e11 is formed of a metal porous member and blows out the film forming material which has passed through a buffer space S via the transport path 110e21. The first processing chamber 100 performs the film formation on a target object G with the blown-out film forming material. A gap between the target object G and the blowing port 110e1 can be shortened by blowing out gas molecules having a high uniformity from the metal porous member.