Abstract: A substrate developing method and apparatus for improving uniformity of a developing process by adjusting a temperature gradient of a developer spread over the surface of a substrate. The developer is delivered to a central region of the substrate surface and spread over the surface. The developer in this state has activity diminishing, and thereby lowering the developing rate, gradually from center to edge of the substrate. With a gas flowing down around the edge of the substrate during the developing process, the developer vaporizes from peripheral regions of the substrate at an increased rate, thereby lowering the developer temperature in the peripheral regions. This increases the developing rate gradually from edge to center of the substrate. The uniformity of the developing process is improved by balancing the gradient of developing rate due to the temperature variation of the developer against the gradient of developing rate due to the lowering of developer activity.

Abstract: The substrate processing apparatus comprises at least one chemical liquid bath for processing the substrate with a chemical liquid, and a multi-function processing bath for performing at least two of chemical liquid processing, cleaning with water and drying on the substrate which is processed with a chemical liquid within the chemical liquid bath.

Abstract: A method for washing a hollow fiber membrane used for blood dialysis, comprising washing the inner wall of the hollow fiber with a clearing solvent comprising, as a main component, a specific aliphatic hydrocarbon having a boiling point of 110-240.degree. C. and a flash point of not less than 21.degree. C. According to the present invention, the lipophilic liquid contained in the core part of the hollow fiber can be removed selectively without removing the glycerol filled in the pores of the hollow fiber membrane. In addition, the method of the present invention is free of the problems of flammability and pollution of global environment.

Abstract: An indexing device comprising a base table (10), a turret (11) which indexes about a given rotary center relative to the base table (10), a pair of positioning engaging members (27) provided between the base table (10) and the turret (11), wherein at least one of the positioning engaging members (27) has an inclined tooth profile, and the positioning engaging members (27) are engageable with and disengageable from each other relative to the tooth profiles when they move in axial directions thereof relative to each other. The meshing of the tooth profiles are maintained by applying a pressing force to at least one of the positioning engaging members (27). When the turret (11) receives a load, a positioning displacement which occurs between the pair of positioning engaging members (27) is detected, and the pressing force applied to the positioning engaging members (27) is adjusted based on the result of detection.

Abstract: There are provided a pair of positioning engaging members (27) which are engageable with or disengageable from each other between a base table (10) and a turret (11), and the turret (11) is prevented from rotating when the positioning engaging members (27) engage with each other. The turning of a ball screw (21) or a nut (25) is changed to a linear motion of the turret (11) by a screw feed mechanism comprising the ball screw (21) and nut (25) for performing engagement and disengagement between the positioning engaging members (27). The screw feed mechanism is driven by a first motor (24), and the turret (11) is indexing by a second motor (32).

Abstract: A velocity adjusting plate is provided above a substrate processing part in the interior of a substrate processing apparatus which is isolated from the external air. Thus, a downflow which is formed by conditioned air in the interior of the apparatus is separated into downflows having high and low velocities to be supplied to the substrate processing part and the periphery of the substrate processing part respectively. Consequently, the former downflow has a velocity which is suitable for controlling the temperature-humidity on the substrate surface and preventing the substrate from adhesion of particles and fine grains of a processing solution scattered from the substrate, while the latter downflow is suppressed to the minimum velocity which is necessary for preventing dusts and particles from creeping up by dispersion. Thus, it is possible to reduce consumption of air which is adjusted in temperature-humidity while isolating the interior of the apparatus from the external air.

Abstract: A baffle is placed in a position opposed to discharge openings of a treating solution supply nozzle and between the discharge openings and the surface of a substrate. The baffle intercepts a treating solution discharged from the discharge openings, whereby the treating solution is supplied evenly to the surface of the substrate by flowing over a surface of the baffle and falling from an edge of the baffle to the substrate, instead of falling from the discharge openings directly to the substrate. No microbubbles are formed in the treating solution on the substrate, which would cause an unevenness of treatment. The discharge openings may be defined by a plurality of circular bores formed in the supply nozzle. Each circular bore may have a diameter at least equal to a spacing between an adjacent pair of circular bores.

Abstract: A substrate spin coating apparatus for forming a coating film on the upper surface of a spinning substrate includes a spin chuck for supporting and spinning the substrate while holding same substantially in horizontal posture. A scatter preventive cup surrounds lateral and lower regions of the spin chuck, and defines an opening in an upper central region thereof for allowing entry of air flows. An exhaust vent is provided for downwardly exhausting the air flows, and a nozzle is provided for supplying a coating solution through the opening of the scatter preventive cup to the upper surface of the substrate. The scatter preventive cup includes an air passage formed in a bottom region thereof and opening toward a lower surface of the substrate. An air flow adjusting unit is connected to the air passage for adjusting an air flow to a predetermined temperature and supplying the adjusted air flow to the air passage.

Abstract: A substrate spin treating method and apparatus having a cup cleaner device for cleaning a scatter preventive cup, which cleaner device does not require attaching and/or detaching of a cleaning jig. The cleaner device is driven through engagement with a spin chuck which operates at a low torque that is provided for normal substrate spin treating operation. During the normal spin treating operation, only the spin chuck is driven by a rotary shaft, with the cup cleaner device being disengaged from the spin chuck and its driving rotary shaft. For a cup cleaning operation, the spin chuck and scatter preventive cup are vertically moved relative to each other to place the cup cleaner device at a cup cleaning height and to drivingly connect the cup cleaner device to the rotary shaft through a torque transmitter.

Abstract: A method of processing a substrate includes the steps of developing a substrate having a photo-sensitive resin film formed on its surface; washing the substrate by supplying washing liquid to the surface of the substrate, and rotating the substrate on a perpendicular axis in a horizontal plane and thereby drying the surface of the substrate, and atmosphere in which the substrate is placed is adjusted to be at a pressure lower than the atmospheric pressure in the step of drying the surface of the substrate. Instead of or in addition to this, washing liquid in which prescribed gas is dissolved may be used in the step of washing the substrate. In this case, in the step of drying the surface of the substrate, washing liquid supplied to the surface of the substrate is preferably supersaturated with gas. A substrate processing apparatus including a controller for implementing such a method is also disclosed.

Abstract: For processing semiconductor substrates in a processing fluid, the substrates are introduced into a processing bath in which the processing fluid is filled. For holding the substrates in the process of introducing them into the processing bath, a holder having a pair of holding rods end a pair of aiding rods is prepared. A periodical linear array of grooves is formed on each rod. The rims of substrates are inserted into respective corresponding grooves on the rods so that the substrates do not touch respective side walls of the grooves in the aiding rod.

Abstract: A plurality of brush support arms, each having a distal end unit brush attached thereto, stand by in juxtaposition in a standby position. The brush support arm having a desired brush attached thereto is selected from the plurality of brush support arms. Then, the selected brush support arm is connected at its proximal end to a distal end of a swing arm. The brush support arm engaged with the swing arm is swung with the swing arm about a pivotal point at a proximal end of the swing arm. As a result, the brush attached to the distal end of the selected brush support arm is moved between the standby position and the center of a substrate, to clean the substrate with this brush. Upon completion of this substrate cleaning, the brush support arm is returned to the standby position. A different brush support arm is selected in the standby position for use in a subsequent cleaning operation, and the substrate is cleaned with the brush connected to this different brush support arm.

Abstract: An apparatus including a structure which separates a first transport robot (high temperature robot), which accesses a first processing part group including the thermal processing parts, from a second transport robot (low temperature robot) which accesses the only non-thermal processing parts. During circulating transportation of substrates to be processed, heat created at thermal processing parts is prevented from flowing into non-thermal processing parts. Semiconductor wafers are circulated one by one between the first processing part group which includes a hot plate and a second processing part group which does not include a hot plate and processed one at a time at each processing part. The high temperature robot accesses the first processing part group while the low temperature robot accesses the second processing part group. Transfer of a semiconductor wafer between the two robots is performed at a transfer part which is formed using a cool plate.

Abstract: A method of separating a liquid by pervaporation, which includes purifying a liquid to be treated by at least one pervaporation membrane module unit providing a supply line connected to the pervaporation membrane module unit and supplying the liquid to be treated to the membrane module unit, utilizing a withdrawing line for withdrawing the permeated fluid from the membrane module unit and a withdrawing line for withdrawing the non-permeated liquid, wherein the supply line is provided with a pressure pump for transporting the liquid and a heater, and providing the final withdrawing line for the non-permeated liquid with a pressure regulating valve.

Abstract: An apparatus for separating a liquid by pervaporation, which comprises at least one pervaporation membrane module unit for purifying a liquid to be treated, a supply line connected to said pervaporation membrane module unit for supplying the liquid to be treated to the membrane module unit, a withdrawing line for withdrawing the permeated fluid from the membrane module unit and a withdrawing line for withdrawing the non-permeated liquid, wherein said supply line is provided with a pressure pump for transporting the liquid and a heater, and the final withdrawing line for the non-permeated liquid is provided with a pressure regulating valve.

Abstract: An apparatus for separating a liquid by pervaporation, which comprises at least one pervaporation membrane module unit for purifying a liquid to be treated, a supply line connected to said pervaporation membrane module unit for supplying the liquid to be treated to the membrane module unit, a withdrawing line for withdrawing the permeated fluid from the membrane module unit and a withdrawing line for withdrawing the non-permeated liquid, wherein said supply line is provided with a pressure pump for transporting the liquid and a heater, and the final withdrawing line for the non-permeated liquid is provided with a pressure regulating valve.

Abstract: A desired pattern is exposed to a substrate surface having a photosensitive resin film formed thereon, and thereafter a prewetting liquid and a developer are successively supplied to the substrate surface. A diaphragm mounted in a prewetting liquid supply nozzle applies ultrasonic vibration to the prewetting liquid to be supplied to the substrate surface. The ultrasonic vibration applied vibrates minute bubbles of several micrometers in size which are generated when the prewetting liquid is supplied to the substrate surface, thereby causing the bubbles to float to the surface of the prewetting liquid and disappear therefrom. As a result, the substrate surface is modified to be hydrophilic and becomes free of the bubbles. The developer subsequently supplied through a developer supply nozzle uniformly spreads over the entire substrate surface without being obstructed by the bubbles, to avoid non-uniform development.

Abstract: A floor panel having a rectangular floor base integrally with a convex prop in each corner portion and a concave portion on the upper surface of each prop. There is a height adjusting screw with a plate embedded in the concave portion of each prop, variably for adjusting the height of the support position in a predetermined range between a position lower than the upper surface of the prop and a position higher than the upper surface of the prop. A floor panel is supported by each prop of the floor base and has through holes for accessing the height adjusting screw for adjusting the support height at each corner according to the prop. In the method of manufacturing the floor base, a convex portion, which integrally projects to the upper surface side on four corners of a skin, is formed, a concave portion is formed on the lower surface of said convex portion, concrete is packed in the concave portion, thereby forming which is integral to said skin.

Abstract: The present invention provides polypeptides composing epitopes of human centromere protein B, genes encoding therefor, plasmids or phages containing the genes, transformants obtained by introducing the plasmids or phages containing the genes, a method for producing the human centromere antigen polypeptide using the transformant, and a method for detecting anti-centromere antibody using the human centromere antigen polypeptide. Analysis of the above-mentioned epitope was accomplished using CENP-B gene obtained from a cDNA library prepared using mRNAs isolated from Jurkat cells. The present invention allows the production of the human centromere protein B epitope region in a large quantity, which in turn allows the detection of human anti-centromere antibody readily and precisely using the peptide obtained. Furthermore, it becomes possible to make a precise classification of the disease type of a patient having human anti-centromere antibody by determinations using each of the epitopes.

Abstract: Using a packaging material containing a fibrous substance such as pulp and a carboxyl-containing polymer a substance such as an acid type carboxymethyl cellulose, a cement mixing material such as a superplasticizer is packaged and the package is thrown into a cement formulation such as concrete, mortar or a cement paste in a truck agitator.