Abstract: A compound of Formula (5-1) or Formula (5-3): where R17 and R21 are each an ethyl group; R22 and R23 are each a methyl group; and R16 and R20 are each a methoxy group.

Abstract: Provided is, for example, a pattern-forming composition that contains a triazine ring-containing polymer having a predetermined repeating unit structure, represented by formula [4] below, a crosslinking agent, and an organic solvent.

Abstract: A radiation sensitive composition including a siloxane polymer exhibiting phenoplast crosslinking reactivity as a base resin, which is excellent in resolution and can be used as a radiation sensitive composition capable of allowing a pattern having a desired-shape to be formed with sufficient precision. A radiation sensitive composition including as a silane, a hydrolyzable silane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof; and a photoacid generator, in which the hydrolyzable silane includes hydrolyzable silanes of Formula (1) R1aR2bSi(R3)4-(a+b)??Formula (1) wherein R1 is an organic group of Formula (1-2) and is bonded to a silicon atom through a Si—C bond or a Si—O bond, and R3 is a hydrolyzable group; and Formula (2) R7cR8dSi(R9)4-(c+d)??Formula (2) wherein R7 is an organic group of Formula (2-1) and is bonded to a silicon atom through a Si—C bond or a Si—O bond, and R9 is a hydrolyzable group.

Abstract: A foldable display includes: a display layer having flexibility, the display layer including a first display region, a second display region, and a third display region located between the first display region and the second display region; a cover having flexibility and covering the display layer; a first support substrate having inflexibility and supporting the first display region; a second support substrate having inflexibility and supporting the second display region; a bending portion including the third display region and being bendable; and a shock absorption layer disposed between the display layer and the first support substrate as well as between the display layer and the second support substrate. The shock absorption layer has a slit disposed in a portion overlapping the bending portion.

Abstract: The present invention provides a resist underlayer film-forming composition for lithography for forming a resist underlayer film that can be used as a hard mask with use of hydrolysis-condensation product of a hydrolyzable silane which also absorbs KrF laser. A resist underlayer film-forming composition for lithography comprising, as a silane, a hydrolyzable silane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof, wherein the hydrolyzable silane includes a hydrolyzable silane of Formula (1): R1aR2bSi(R3)4?(a+b)??Formula (1) [where R1 is an organic group of Formula (2): and is bonded to a silicon atom through a Si—C bond; R3 is an alkoxy group, an acyloxy group, or a halogen group; a is an integer of 1; b is an integer of 0 to 2; and a+b is an integer of 1 to 3], and a ratio of sulfur atoms to silicon atoms is 7% by mole or more in the whole of the silane.

Abstract: A lighting device includes a first light source a first light guide plate having a first light entrance surface and a first light outgoing surface and including a first high luminance light outgoing region through which a large amount of light rays exit and a first low luminance light outgoing region through which a small amount of light rays exit, a first reflection member, a second light source, a second light guide plate overlapping the first light guide plate and having a second light entrance surface and a second light outgoing surface and including a second high luminance light outgoing region overlapping the first low luminance light outgoing region and through which a large amount of light rays exit and a second low luminance light outgoing region overlapping the first high luminance light outgoing region and through which a small amount of light rays exit, and a second reflection member.

Abstract: A resist underlayer film allows an excellent resist pattern shape to be formed when an upper resist layer is exposed to light and developed using an alkaline developing solution or organic solvent; and composition for forming the resist underlayer film. A resist underlayer film-forming composition for lithography, the composition including, as a silane, hydrolyzable silane, hydrolysis product thereof, hydrolysis-condensation product thereof, or combination, wherein the hydrolyzable silane includes hydrolyzable silane of Formula (1): R1aR2bSi(R3)4?(a+b)??Formula (1) [where R1 is an organic group of Formula (2): —R4—R5—R6??Formula (2) (where R4 is optionally substituted C1-10 alkylene group; R5 is a sulfonyl group or sulfonamide group; and R6 is a halogen-containing organic group)]. In Formula (2), R6 may be a fluorine-containing organic group like trifluoromethyl group.

Abstract: A lighting device includes a first light source a first light guide plate having a first light entrance surface and a first light outgoing surface and including a first high luminance light outgoing region through which a large amount of light rays exit and a first low luminance light outgoing region through which a small amount of light rays exit, a first reflection member, a second light source, a second light guide plate overlapping the first light guide plate and haying a second light entrance surface and a second light outgoing surface and including a second high luminance light outgoing region overlapping the first low luminance light outgoing region and through which a large amount of light rays exit and a second low luminance light outgoing region overlapping the first high luminance light outgoing region and through which a small amount of light rays exit, and a second reflection member.

Abstract: A liquid crystal display device (1) is equipped with a radiator fin (3) and cooling fans (4) on a back surface of the backlight unit (2). The radiator fin (3) includes a plurality of fins (311) arranged vertically along the backlight unit (2). The cooling fans (4), provided in a lower part of the backlight unit (2), are configured to draw air into the liquid crystal display device (1) from a side opposite to the backlight unit (2) and to create an airflow toward the radiator fin (3).

Abstract: A resist underlayer film-forming composition includes a resin; and a crosslinkable compound of Formula (1) or Formula (2): wherein the crosslinkable compound of Formula (1) or Formula (2) is a compound obtained by reacting a compound of Formula (3) or Formula (4): with an ether compound comprising a hydroxy group or a C2-10 alcohol.

Abstract: A film-forming composition having favorable effects such as curability and embeddability and resist underlayer film for use in lithography process for semiconductor devices. The film-forming composition including, as silane, hydrolyzable silane, hydrolysis product thereof, or hydrolysis-condensation product thereof, wherein hydrolyzable silane includes hydrolyzable silane of Formula (1): R1aR2bSi(R3)4?(a+b)??Formula (1) in Formula (1), R1 is organic group of Formula (2) and is bonded to silicon atom through Si—C bond: The film-forming composition, wherein the hydrolyzable silane is combination of hydrolyzable silane of Formula (1) with another hydrolyzable silane, wherein other hydrolyzable silane is at least one selected from group made of hydrolyzable silane of Formula (3): R7cSi(R8)4?c??Formula (3) and hydrolyzable silane of Formula (4): R9dSi(R10)3?d2Ye??Formula (4) Resist underlayer film, obtained by applying the resist underlayer film-forming composition on semiconductor substrate and baking.

Abstract: A resist underlayer film for use in lithography process which generates less sublimate, has excellent embeddability at the time of applying onto a substrate having a hole pattern, and has high dry etching resistance, wiggling resistance and heat resistance, etc. A resist underlayer film-forming composition including a resin and a crosslinkable compound of Formula (1) or Formula (2): in which Q1 is a single bond or an m1-valent organic group, R1 and R4 are each a C2-10 alkyl group or a C2-10 alkyl group having a C1-10 alkoxy group, R2 and R5 are each a hydrogen atom or a methyl group, R3 and R6 are each a C1-10 alkyl group or a C6-40 aryl group.

Abstract: A lighting device includes light sources, a light source board, and a light guide plate having a light entering edge surface and plate surfaces. The light sources configure light source rows in each of which the light sources are arranged such that the light emitting surfaces are opposite the light entering edge surface. The light source board includes a first mounting section having the mounting surface opposite one plate surface, a second mounting section having the mounting surface opposite another plate surface, and connection section connecting the first and second mounting sections to be opposite and away from the light entering edge surface. Among the light source rows, the light sources of a first light source row are mounted on the first mounting section and the light sources of a second light source row are mounted on the second mounting section.

Abstract: A composition for forming a resist underlayer film has excellent storage stability at normal temperature. A composition for forming a resist underlayer film for lithography including a nitrogen-containing compound having 2 to 6 substituents of the following Formula (1) which bond to nitrogen atoms in one molecule, a polymer, a compound that promotes a crosslinking reaction, and an organic solvent. The nitrogen-containing compound having 2 to 6 substituents of Formula (1) in one molecule is for example a glycoluril derivative of the following Formula (1A). In the formula, each R1 is a methyl group or an ethyl group, and R2 and R3 are independently a hydrogen atom, a C1-4 alkyl group, or phenyl group.

Abstract: The present invention provides a lighting device that is excellent in luminance uniformity and light use efficiency and allows for a narrower frame, and a display device including the lighting device. Provided is a lighting device including: a light guide plate; a light source disposed posterior to the light guide plate; a reflection member including a reflective surface facing a light emitting surface of the light source and a light incident surface of the light guide plate, disposed lateral to the light guide plate and the light source, the lighting device further including a reflective polarizing layer on the light incident surface of the light guide plate.

Abstract: The present invention provides a resist underlayer film-forming composition for lithography for forming a resist underlayer film that can be used as a hard mask with use of hydrolysis-condensation product of a hydrolyzable silane which also absorbs KrF laser. A resist underlayer film-forming composition for lithography comprising, as a silane, a hydrolyzable silane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof, wherein the hydrolyzable silane includes a hydrolyzable silane of Formula (1): R1aR2bSi(R3)4?(a+b)??Formula (1) [where R1 is an organic group of Formula (2): and is bonded to a silicon atom through a Si—C bond; R3 is an alkoxy group, an acyloxy group, or a halogen group; a is an integer of 1; b is an integer of 0 to 2; and a+b is an integer of 1 to 3], and a ratio of sulfur atoms to silicon atoms is 7% by mole or more in the whole of the silane.

Abstract: An illuminating device that can secure brightness, luminance uniformity, and durability (product life) without increasing a frame width is provided. A light guide plate included in the illuminating device (1) is supported by a support unit (5) that houses light sources (8), incident surfaces (4i and 4i?), and at least a part of a light guide area (4a).

Abstract: A liquid crystal display device (1) is equipped with a radiator fin (3) and cooling fans (4) on a back surface of the backlight unit (2). The radiator fin (3) includes a plurality of fins (311) arranged vertically along the backlight unit (2). The cooling fans (4), provided in a lower part of the backlight unit (2), are configured to draw air into the liquid crystal display device (1) from a side opposite to the backlight unit (2) and to create an airflow toward the radiator fin (3).

Abstract: A polymerizable composition suitable for producing a molded article that can maintain a high refractive index and a low Abbe's number and can be restrained from dimensional changes due to a high-temperature thermal history has (a) 100 parts by mass of a specific reactive silsesquioxane compound, (b) 10 to 500 parts by mass of a specific fluorene compound and (c) 1 to 100 parts by mass of a specific aromatic vinyl compound. A cured product can be obtained by curing the polymerizable composition.

Abstract: A polymerizable composition suitable for producing a molded article that can maintain a high refractive index and a low Abbe's number and can be restrained from dimensional changes due to a high-temperature thermal history has (a) 100 parts by mass of a specific reactive silsesquioxane compound, (b) 10 to 500 parts by mass of a specific fluorene compound and (c) 1 to 100 parts by mass of a specific aromatic vinyl compound. A cured product can be obtained by curing the polymerizable composition.