Abstract: A compound oxide superconductor represented by the general formula:Bi.sub.4+d (Sr.sub.1-x, Ca.sub.x).sub.m Cu.sub.n O.sub.p+yin which,"d" is an amount of excess bismuth and satisfies a range of 0<d.ltoreq.1.2,"m" is a number which satisfies a range of 6.ltoreq.m.ltoreq.10,"n" is a number which satisfies a range of 4.ltoreq.n.ltoreq.8,"p"=6+m+n,"x" is a number which satisfies a range of 0<x<1, and"y" is a number which satisfies a range of -2.ltoreq.<y.ltoreq.+2.A preferred example is a compound oxide system having the following general formula:Bi.sub.4+d Sr.sub.4 Ca.sub.4 Cu.sub.6 O.sub.20+yin which "d" is a number which satisfies the range 0.4.ltoreq.d.ltoreq.1.2 and "y" is a number which satisfies a range of -2.ltoreq.y.ltoreq.+2. The critical current density (J.sub.c) is improved by increasing the amount of bismuth with respect to the stoichiometric amount. A superconducting thin film is deposited on a substrate by physical vapor deposition such as sputtering.

Abstract: Improvement in a superconducting thin film of compound oxide represented by the formula: LnBa.sub.2 Cu.sub.3 O.sub.7- .delta. (Ln is lanthanide) or (La.sub.1-x .alpha..sub.x).sub.2 CuO.sub.4 (.alpha. is Ba or Sr) deposited on a substrate or core made of MgO, SrTiO.sub.3 or ZrO.sub.2 by physical vapor deposition technique, the surface roughness R.sub.max (datum length=1,000 .mu.m) of the superconducting thin film being less than 0.2 .mu.m.

Abstract: A process for preparing a single crystal thin film made of oxide superconductor of Bi, Sr, Ca, and Cu on a substrate by a sputtering method using a target made of a sintered oxide of Bi, Sr, Ca, and Cu and having its c-axis oriented in parallel with the surface of the substrate.The sputtering is effected by 90.degree. off-axis magnetron sputtering at a substrate temperature between 500.degree. C. and 750.degree. C. at a gas pressure between 0.001 Torr and 1 Torr.

Abstract: A process for depositing a superconducting thin film composed mainly of compound oxide such as LnBa.sub.2 Cu.sub.3 O.sub.7-.delta. (Ln is lanthanide) or (La.sub.1-x .alpha..sub.x).sub.2 CuO.sub.4 (.alpha. is Ba or Sr) on a substrate such as MgO, SrTiO.sub.3 or silicon by sputtering technique, characterized in that a negative bias is applied to the substrate during the sputtering stage without heating the substrate.

Abstract: A superconducting material composed mainly of compound oxide having a composition represented by the general formula:Tl.sub.x Ca.sub.y BaCu.sub.z O.sub.pin which "x", "y" and "z" are numbers each satisfies 0.5.ltoreq.x.ltoreq.3.0, 0.5.ltoreq.y.ltoreq.3.0, and 0.9.ltoreq.z.ltoreq.4.0 respectively.

Abstract: A microwave resonator includes a ground conductor formed on an under surface of a dielectric layer and a signal conductor formed on an upper surface of the dielectric layer separately so that the signal and ground conductors cooperate to form a microstrip line. The signal conductor has a launching pad portion for receiving a signal, and a resonating conductor portion forming an inductor. The resonating conductor portion is formed separated from the launching pad portion so that a gap between the launching pad portion and the resonating conductor portion forms a capacitor. Thus, the inductor formed by the resonating conductor portion of the signal conductor and the capacitor formed by the gap between the launching pad portion and the resonating conductor portion form a resonator circuit.

Abstract: A process for preparing a thin film of high-temperature compound oxide superconductor by a magnetron sputtering method. A substrate and a target are arranged in parallel with each other in a vacuum chamber and one of the substrate and the target is moved relative to and in parallel with the other while the thin film is formed by sputtering.

Abstract: Improvement in a superconducting thin film of a superconducting compound oxide containing thallium (Tl) deposited on a substrate, characterized in that the superconducting thin film is deposited by PVD on {110} plane of a single crystal of magnesium oxide (MgO).

Abstract: In a process for depositing a superconducting thin film of bismuth-containing compound oxide on a substrate by physical vapor deposition, the improvement wherein the substrate is heated at a temperature between 670.degree. and 750.degree. C. during the deposition.

Abstract: Improvement in a superconducting thin film of compound oxide represented by the formula: LnBa.sub.2 Cu.sub.3 O.sub.7- .delta. (Ln is lanthanide) or (La.sub.1-x .alpha..sub.x).sub.2 CuO.sub.4 (.alpha. is Ba or Sr) deposited on a substrate or core made of MgO, SrTiO.sub.3 or ZrO.sub.2 by physical vapor deposition technique, the surface roughness R.sub.max (datum length=1,000 .mu.m) of the superconducting thin film being less than 0.2 .mu.m.

Abstract: Improvement in a superconducting thin film of a superconducting compound oxide containing thallium (T1) deposited on a substrate, characterized in that the superconducting thin film is deposited on {110} plane of a single crystal of magnesium oxide (MgO).

Abstract: Improvement in a superconducting thin film of a superconducting compound oxide containing bismuth (Bi) deposited on a substrate, characterized in that the superconducting thin film is deposited on {110} plane of a single crystal of magnesium oxide (MgO).