Abstract: A three-component mixing apparatus and a three-component mixing adhesive kit, which allow anyone to easily and uniformly mix three kinds of drugs in mixing a three-component adhesive used in, e.g., surgical procedure (or treatment) or dental procedure (or treatment), includes a syringe filled with a first drug; a plunger; and an infusion-needle connector having a connecting part for a second drug container and a connecting part for a third drug container and a confluent path formed on a base end part. The first drug, the second drug and the third drug are mixed in the syringe by removably attaching the infusion-needle connector to a discharge opening of the syringe, the second drug container to its connecting part and the third drug container to its connecting part and then pulling the plunger inserted into the syringe to introduce the second drug and the third drug into the syringe.

Abstract: A three-component mixing apparatus and a three-component mixing adhesive kit, which allow anyone to easily and uniformly mix three kinds of drugs in mixing a three-component adhesive used in, e.g., surgical procedure (or treatment) or dental procedure (or treatment), includes a syringe filled with a first drug; a plunger; and an infusion-needle connector having a connecting part for a second drug container and a connecting part for a third drug container and a confluent path formed on a base end part. The first drug, the second drug and the third drug are mixed in the syringe by removably attaching the infusion-needle connector to a discharge opening of the syringe, the second drug container to its connecting part and the third drug container to its connecting part and then pulling the plunger inserted into the syringe to introduce the second drug and the third drug into the syringe.

Abstract: The invention is to provide a process for effectively removing impurities contained in an amide compound-containing solution by making an amide compound-containing solution, particularly an amide compound-containing solution produced by a hydration reaction of a nitrile compound by using a microorganism fungus body containing nitrile hydratase or a processed product of the microorganism fungus body, in contact with activated carbon under acidic conditions.

Abstract: An amide composition containing an unsaturated amide, a sulfur-containing compound, and a weak acid salt. The composition can include an amide in crystalline form or the composition can be in form of aqueous solution. The composition can exhibit improved stability whereby polymerization of the amide is inhibited.

Abstract: The invention is a process for continuously producing an amide compound by reacting a microorganism fungus body containing nitrile hydratase or a processed product of the microorganism fungus body with a nitrile compound in an aqueous medium, characterized in that after contacting said fungus body or said processed product of said fungus body with said nitrile compound in said aqueous medium, a reaction solution thus obtained is further subjected to reaction under conditions having a plug flow region, and according to the invention, an amide compound aqueous solution of a high concentration a high purity can be easily obtained in an extremely high conversion rate of a nitrile compound without a condensation process.

Abstract: The invention is to provide a process for effectively removing impurities contained in an amide compound-containing solution by making an amide compound-containing solution, particularly an amide compound-containing solution produced by a hydration reaction of a nitrile compound by using a microorganism fungus body containing nitrile hydratase or a processed product of the microorganism fungus body, in contact with activated carbon under acidic conditions.

Abstract: An amide composition containing an unsaturated amide, a sulfur-containing compound, and a weak acid salt. The composition can include an amide in crystalline form or the composition can be in form of aqueous solution. The composition can exhibit improved stability whereby polymerization of the amide is inhibited.

Abstract: The invention is a process for continuously producing an amide compound by reacting a microorganism fungus body containing nitrile hydratase or a processed product of the microorganism fungus body with a nitrile compound in an aqueous medium, characterized in that after contacting said fungus body or said processed product of said fungus body with said nitrile compound in said aqueous medium, a reaction solution thus obtained is further subjected to reaction under conditions having a plug flow region, and according to the invention, an amide compound aqueous solution of a high concentration a high purity can be easily obtained in an extremely high conversion rate of a nitrile compound without a condensation process.

Abstract: Dry etching of a metal oxide film exposed without being coated with a photoresist is carried out with plasma of a gas obtained by mixing hydrogen iodide with at least one gas selected from the group consisting of a group consisting of fluorine gas and fluorine-based compound gases and a group consisting of nitrogen gas and nitrogen-based compound gases, and then after the exposing of the above mentioned photoresist film to plasma of oxygen gas, the remaining photoresist film is removed by etching with plasma of a gas obtained by mixing oxygen gas with at least one gas selected from the group consisting of a group consisting of fluorine gas and fluorine-based compound gases and a group consisting of nitrogen gas and nitrogen-based compound gases.

Abstract: A process for producing refined hydrogen iodide having organic components of 0.2 ppm by volume or less and water of 0.1 ppm by volume or less by contacting crude hydrogen iodide with a zeolite is disclosed. Crude hydrogen iodide is obtained by reducing iodine with a hydrogenated naphthalene, wherein all of the iodine is dissolved in advance in a portion of the hydrogenated naphthalene to prepare an iodine solution, and the reaction is carried out while adding continuously or intermittently the iodine solution to the balance of the hydrogenated naphthalene. The same operation may be repeated in succession using unreacted hydrogenated naphthalene and fresh iodide. The zeolite is contacted in advance with crude hydrogen iodide, the amount of which is at least 1/3 (weight ratio) relative to the amount of the zeolite, to convert impurities of sulfur components contained in the zeolite to hydrogen sulfide, thereby removing the sulfur components.