Patents by Inventor Kenneth A. Dust

Kenneth A. Dust has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and arrangement for active make-up in an overrunning actuator
    Patent number: 8966890
    Abstract: A hydraulic system having an actuator having a piston and associated rod forming head and rod chambers and being adapted to move between retracted and extended positions within a cylinder, and first and second sources of fluid. A first pump provides fluid from the first source to the head chamber at a first pressure. At least one valve provides fluid from the second source at a second pressure to supplement fluid provided to the head chamber from the first pump when the second pressure is greater than the first pressure.
    Type: Grant
    Filed: July 29, 2011
    Date of Patent: March 3, 2015
    Assignee: Caterpillar Inc.
    Inventors: Daniel T. Mather, Troy A. Shawgo, Daniel H. Killion, Vishnu Irigireddy, Deepak Amaravadi, Dayao Chen, Matthew Hempel, Kenneth A. Dust, Ryan M. Ludwig, Alfred J. Abraham, Michael E. Nesbitt
  • Method and arrangement for active make-up in an overrunning actuator
    Publication number: 20130025271
    Abstract: A hydraulic system having an actuator having a piston and associated rod forming head and rod chambers and being adapted to move between retracted and extended positions within a cylinder, and first and second sources of fluid. A first pump provides fluid from the first source to the head chamber at a first pressure. At least one valve provides fluid from the second source at a second pressure to supplement fluid provided to the head chamber from the first pump when the second pressure is greater than the first pressure.
    Type: Application
    Filed: July 29, 2011
    Publication date: January 31, 2013
    Applicant: CATERPILLAR INC.
    Inventors: Daniel T. Mather, Troy A. Shawgo, Daniel H. Killion, Vishnu Irigireddy, Deepak Amaravadi, Dayao Chen, Matthew Hempel, Kenneth A. Dust, Ryan M. Ludwig, Alfred J. Abraham