Patents by Inventor Kenneth D. Van Antwerp, Jr.

Kenneth D. Van Antwerp, Jr. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9322738
    Abstract: A gas analyzer for a vacuum chamber includes processing electronics configured to receive mass spectral data, receive input of total pressure in the vacuum chamber, receive external input from at least one sensor, and employ the mass spectral data, the total pressure in the vacuum chamber, and the external input from the at least one sensor to calculate a vacuum quality index based on at least one criteria of quality.
    Type: Grant
    Filed: November 8, 2010
    Date of Patent: April 26, 2016
    Assignee: MKS Instruments, Inc.
    Inventors: Gerardo A. Brucker, Kenneth D. Van Antwerp, Jr.
  • Patent number: 8947098
    Abstract: An ionization gauge that measures pressure has an electron source that emits electrons, and an anode that defines an ionization space. The gauge also includes a collector electrode to collect ions formed by an impact between the electrons and a gas and to measure pressure based on the collected ions. The electron source is dynamically varied in emission current between a plurality of emission levels dependent on pressure and a second parameter other than pressure. The ionization gauge may also vary various operating parameters of the gauge components according to parameters stored in a non-volatile memory and selected by a user.
    Type: Grant
    Filed: March 18, 2011
    Date of Patent: February 3, 2015
    Assignee: MKS Instruments, Inc.
    Inventors: Larry K. Carmichael, Jesse A. Weber, John H. Henry, Michael N. Schott, Gerardo A. Brucker, Kenneth D. Van Antwerp, Jr.
  • Publication number: 20120227465
    Abstract: A gas analyzer for a vacuum chamber includes processing electronics configured to receive mass spectral data, receive input of total pressure in the vacuum chamber, receive external input from at least one sensor, and employ the mass spectral data, the total pressure in the vacuum chamber, and the external input from the at least one sensor to calculate a vacuum quality index based on at least one criteria of quality.
    Type: Application
    Filed: November 8, 2010
    Publication date: September 13, 2012
    Inventors: Gerardo A. Brucker, Kenneth D. Van Antwerp, JR.
  • Publication number: 20110163754
    Abstract: An ionization gauge that measures pressure has an electron source that emits electrons, and an anode that defines an ionization space. The gauge also includes a collector electrode to collect ions formed by an impact between the electrons and a gas and to measure pressure based on the collected ions. The electron source is dynamically varied in emission current between a plurality of emission levels dependent on pressure and a second parameter other than pressure. The ionization gauge may also vary various operating parameters of the gauge components according to parameters stored in a non-volatile memory and selected by a user.
    Type: Application
    Filed: March 18, 2011
    Publication date: July 7, 2011
    Applicant: Brooks Automation, Inc.
    Inventors: Larry K. Carmichael, Jesse A. Weber, John H. Henry, Michael N. Schott, Gerardo A. Brucker, Kenneth D. Van Antwerp, JR.
  • Patent number: 6138058
    Abstract: An apparatus for tracking items in a factory is disclosed. The apparatus is partially well suited for manufacturing environments wherein there are a plurality of items to be kept together in groups. The invention is particularly useful in semiconductor processing facilities wherein batches of semiconductor wafers to be processed are placed in wafer carriers which are, in turn, placed in work-in-progress boxes. Applying identification tags to one item that can be read and processed by a microterminal attached to the other item provides an effective way to prevent improper grouping of the items which can lead to misprocessing or handling of the batches of wafers.
    Type: Grant
    Filed: January 6, 1998
    Date of Patent: October 24, 2000
    Assignee: Jenoptik Infab, Inc.
    Inventors: Kenneth D. Van Antwerp, Jr., Bedford E. Hardee, Dennis L. Myers