Abstract: The present invention provides photoacid generators for use in chemically amplified resists and lithographic processes using the same.

Abstract: The present invention provides photoacid generators for use in chemically amplified resists and lithographic processes using the same.

Abstract: Compositions that include antimicrobial agents and biodegradable delivery vehicles adapted to enter a cell and release the antimicrobial agents in the cell as they biodegrades. Also provided are compositions that include first and second delivery vehicles including first and second antimicrobial agents, wherein the first delivery vehicles are adapted to release the first antimicrobial agents at a rate that differs from that at which the second delivery vehicles release the second antimicrobial agents, articles of manufacture that include one or more biodegradable delivery vehicles, and methods of making and using the compositions to treat intracellular and/or extracellular infections are disclosed.

Abstract: The present invention provides photoacid generators for use in chemically amplified resists and lithographic processes using the same.

Abstract: This invention relates to biomaterials, biocompatible photoresists, and electroactive photoresists, and methods to engineer the interactions between biomaterials and cells. In one aspect, this invention provides for modifying surface topography through micro-patterning techniques that require no organic solvent development to reveal the lithographic patterns. Cells can be cultured on these surfaces directly and exhibit strong cell alignment features.

Abstract: Compositions that include antimicrobial agents and biodegradable delivery-vehicles adapted to enter a cell and release the antimicrobial agents in the cell as they biodegrade. Also provided are compositions that include first and second delivery vehicles including first and second antimicrobial agents, wherein the first delivery vehicles are adapted to release the first antimicrobial agents at a rate that differs from that at which the second delivery vehicles release the second antimicrobial agents, articles of manufacture that include one or more biodegradable delivery vehicles, and methods of making and using the compositions to treat intracellular and/or extracellular infections are disclosed.

Abstract: The present invention provides photoacid generators for use in chemically amplified resists and lithographic processes using the same.

Abstract: The present invention relates to photoacid generating compounds, lithographic resists comprising photoacid generating compounds, and to various lithographic processes techniques, and applications.

Abstract: The present invention addresses many of the current limitations in sub-100 nm lithographic techniques by providing novel resists that achieve high sensitivity, high contrast, high resolution, and high dry-etch resistance for pattern transfer to a substrate. In one embodiment, the present invention provides a polymeric resist comprising an adamantyl component and a photoacid generating component.

Abstract: The present invention provides new high resolution resists applicable to next generation lithographies, methods of making these novel resists, and methods of using these new resists in lithographic processes to effect state-of-the-art lithographies. New nanocomposite resists comprising nanoparticles in a polymer matrix are provided in this invention. New chemically amplified resists that incorporate inorganic moieties as part of the polymer are presented herein, as are new chemically amplified resists that incorporate photoacid generating groups within the polymeric chain. Novel non-chemically amplified yet photosensitive resists, and new organic-inorganic hybrid resists are also provided herein. This invention and the embodiments described herein constitute fundamentally new architectures for high resolution resists.

Abstract: The present invention provides new high resolution resists applicable to next generation lithographies, methods of making these novel resists, and methods of using these new resists in lithographic processes to effect state-of-the-art lithographies. New nanocomposite resists comprising nanoparticles in a polymer matrix are provided in this invention. New chemically amplified resists that incorporate inorganic moieties as part of the polymer are presented herein, as are new chemically amplified resists that incorporate photoacid generating groups within the polymeric chain. Novel non-chemically amplified yet photosensitive resists, and new organic-inorganic hybrid resists are also provided herein. This invention and the embodiments described herein constitute fundamentally new architectures for high resolution resists.

Abstract: Methods for the manufacture of nanostructured metals, metal carbides, and metal alloys are presented, such metals including nanostructured aluminum, chromium, iron, molybdenum, vanadium, and steel. Preferably, the nanostructured steel is of the M50 type, and comprises iron, molybdenum, chromium, vanadium and carbon. Synthesis of M50 steel further comprising nanostructured aluminum, aluminum oxide, or aluminum nitride is also described. In accordance with an important feature of this invention, the grain size of the metals and metal alloys is in the nanometer range. In accordance with the method of the present invention, the nanostructured metals, metal carbides, and metal alloys are prepared via chemical synthesis from aluminum, iron, molybdenum, chromium and vanadium starting materials. Decomposition of metal precursors or co-precipitation or precipitation of metal precursors is followed by consolidation of the resulting nanostructured powders.

Abstract: Methods for the manufacture of nanostructured metals, metal carbides, and metal alloys are presented, such metals including nanostructured aluminum, chromium, iron, molybdenum, vanadium, and steel. Preferably, the nanostructured steel is of the M50 type, and comprises iron, molybdenum, chromium, vanadium and carbon. Synthesis of M50 steel further comprising nanostructured aluminum, aluminum oxide, or aluminum nitride is also described. In accordance with an important feature of this invention, the grain size of the metals and metal alloys is in the nanometer range. In accordance with the method of the present invention, the nanostructured metals, metal carbides, and metal alloys are prepared via chemical synthesis from aluminum, iron, molybdenum, chromium and vanadium starting materials. Decomposition of metal precursors or co-precipitation or precipitation of metal precursors is followed by consolidation of the resulting nanostructured powders.

Abstract: A nanostructured steel alloy is presented. Preferably, the nanostructured steel is of the M50 type, and comprises iron, molybdenum, chromium, vanadium and carbon. In accordance with an important feature of this invention, the grain size of the steel is in the nanometer range. In accordance with the method of the present invention, the nanostructured steel is prepared via chemical synthesis from iron, molybdenum, chromium and vanadium starting materials. Decomposition of metal precursors or reduction of metal halides is followed by consolidation of the resulting nanostructured steel powders into bulk steel. The nanostructured steel of this invention finds particular utility in the manufacture of cutting tools and bearings.

Abstract: This invention is directed to the preparation of Iron-cobalt powders by reacting iron tricobalt hydrido dodecacarbonyl with iron pentacarbonyl and pyrolyzing the resulting metal-organic iron cobalt clusters.