Patents by Inventor Kenneth E. Hrdina

Kenneth E. Hrdina has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20030159465
    Abstract: The present invention relates to a method for forming an optical blank. The method includes providing a green body that has a non-porous exterior portion and a porous interior portion. The interior portion is evacuated to create a vacuum in the interior portion. The green body is then pressed using a hot isostatic pressing technique to densify the green body into a solid glass optical blank. This method produces homogeneous optical blanks having substantially no striae. The method also produces dense, inclusion free glass. As a result, scattering is substantially reduced when EUV light is reflected from a component produced from optical blank employing the method of the present invention.
    Type: Application
    Filed: February 27, 2002
    Publication date: August 28, 2003
    Inventors: Bradley F. Bowden, Kenneth E. Hrdina
  • Patent number: 6606883
    Abstract: A method for forming a fused silica glass includes delivering a silica precursor to a burner and passing the silica precursor through the flame of the burner to form silica particles, depositing the silica particles on a planar surface to form a flat, porous preform, dehydrating the porous preform, and consolidating the porous preform into a flat, dense glass.
    Type: Grant
    Filed: April 27, 2001
    Date of Patent: August 19, 2003
    Assignee: Corning Incorporated
    Inventors: Kenneth E. Hrdina, Nikki J. Russo, Michael H. Wasilewski
  • Patent number: 6576380
    Abstract: The present invention relates to reflective masks and their use for reflecting extreme ultraviolet soft x-ray photons to enable the use of extreme ultraviolet soft x-ray radiation projection lithographic methods and systems for producing integrated circuits and forming patterns with extremely small feature dimensions. The projection lithographic method includes providing an illumination sub-system for producing and directing an extreme ultraviolet soft x-ray radiation &lgr; from an extreme ultraviolet soft x-ray source; providing a mask sub-system illuminated by the extreme ultraviolet soft x-ray radiation &lgr; produced by the illumination sub-system and providing the mask sub-system includes providing a patterned reflective mask for forming a projected mask pattern when illuminated by radiation &lgr;.
    Type: Grant
    Filed: September 13, 2002
    Date of Patent: June 10, 2003
    Assignee: Corning Incorporated
    Inventors: Claude L. Davis, Jr., Kenneth E. Hrdina, Robert Sabia, Harrie J. Stevens
  • Patent number: 6548142
    Abstract: The present invention describes a glass honeycomb structure having a variety of shapes and sizes depending on its ultimate application. Unlike prior art honeycomb structures made from ceramics, the inventive glass honeycomb can be readily bent and/or redrawn. Furthermore, the inventive honeycomb structure is lightweight, yet able to support heavy loads on its end faces. Therefore, the inventive honeycomb can be used as a light-weight support for such objects as mirrors. Other useful properties of the extruded glass honeycomb are its high softening temperature, its transparency to ultraviolet and visible light, and its ability to be redrawn. Embodiments that rely upon one or more of these properties include: a bio-reactor, a membrane reactor, a capillary flow controller, a high efficiency filtration system, in-situ water treatment, high temperature dielectric material, and photonic band gap material.
    Type: Grant
    Filed: February 17, 2000
    Date of Patent: April 15, 2003
    Assignee: Corning Incorporated
    Inventors: Gitimoy Kar, Kenneth E. Hrdina, John F. Wight, Jr., C. Charles Yu
  • Patent number: 6542224
    Abstract: A lithographic stage includes a platen having a top face and a bottom face and a holder for holding an optical component on the top face of the platen. The platen is made of a light-weight material such as high purity fused silica or ultra low expansion glass. The bottom face of the platen may further include means for connecting to a positioning device in an extreme ultraviolet lithography system.
    Type: Grant
    Filed: August 30, 2001
    Date of Patent: April 1, 2003
    Assignee: Corning Incorporated
    Inventors: Bradford G. Ackerman, Bradley F. Bowden, Claude L. Davis, Jr., Kenneth E. Hrdina
  • Publication number: 20030017402
    Abstract: The present invention relates to reflective masks and their use for reflecting extreme ultraviolet soft x-ray photons to enable the use of extreme ultraviolet soft x-ray radiation projection lithographic methods and systems for producing integrated circuits and forming patterns with extremely small feature dimensions. The projection lithographic method includes providing an illumination sub-system for producing and directing an extreme ultraviolet soft. x-ray radiation &lgr; from an extreme ultraviolet soft x-ray source; providing a mask sub-system illuminated by the extreme ultraviolet soft x-ray radiation &lgr; produced by the illumination sub-system and providing the mask sub-system includes providing a patterned reflective mask for forming a projected mask pattern when illuminated by radiation &lgr;.
    Type: Application
    Filed: September 13, 2002
    Publication date: January 23, 2003
    Inventors: Claude L. Davis, Kenneth E. Hrdina, Robert Sabia, Harrie J. Stevens
  • Patent number: 6479129
    Abstract: The present invention describes an extrusion process for manufacturing a titanium-containing silicate glass honeycomb structure, having a variety of shapes and sizes depending on its ultimate application. The titanium-containing glass honeycomb has a very low coefficient of thermal expansion (CTE) and the CTE can be varied by adjusting the titanium level to match the CTE of members that are bonded to the honeycomb. Furthermore, the inventive honeycomb structure is lightweight, yet able to support heavy loads on its end faces. Therefore, the inventive honeycomb can be advantageously used as a light-weight support for such objects as mirrors. Especially contemplated is using these inventive honeycomb supports for mirrors used in extraterresial environments where temperature extremes are present. These honeycombs can be used singularly or in aggregates to provide such support.
    Type: Grant
    Filed: February 17, 2000
    Date of Patent: November 12, 2002
    Assignee: Corning Incorporated
    Inventors: Gitimoy Kar, Kenneth E. Hrdina, John F. Wight, Jr., C. Charles Yu
  • Publication number: 20020157420
    Abstract: A method for forming a fused silica glass includes delivering a silica precursor to a burner and passing the silica precursor through the flame of the burner to form silica particles, depositing the silica particles on a planar surface to form a flat, porous preform, dehydrating the porous preform, and consolidating the porous preform into a flat, dense glass.
    Type: Application
    Filed: April 27, 2001
    Publication date: October 31, 2002
    Inventors: Kenneth E. Hrdina, Nikki J. Russo, Michael H. Wasilewski
  • Publication number: 20020157421
    Abstract: A method for producing a fused silica glass containing titania includes synthesizing particles of silica and titania by delivering a mixture of a silica precursor and a titania precursor to a burner, growing a porous preform by successively depositing the particles on a deposition surface while rotating and translating the deposition surface relative to the burner, and consolidating the porous preform into a dense glass.
    Type: Application
    Filed: April 27, 2001
    Publication date: October 31, 2002
    Inventors: Bradford G. Ackerman, Kenneth E. Hrdina, Lisa A. Moore, Nikki J. Russo, C. Charles Yu
  • Publication number: 20020154280
    Abstract: The invention provides a method of making an EUV lithography stage structure for use in a semiconductor microlithography with EUV (extreme ultraviolet) radiation, where the stage is utilized to hold and support a substrate such as a mask or wafer.
    Type: Application
    Filed: October 31, 2001
    Publication date: October 24, 2002
    Inventors: James J. Bernas, Bradley F. Bowden, Kenneth E. Hrdina, John F. Wight
  • Patent number: 6468374
    Abstract: The present invention describes an extrusion process for manufacturing a glass honeycomb structure having a variety of shapes and sizes depending on its ultimate application. Unlike prior art honeycomb structures made from ceramics, the inventive glass honeycomb can be readily viscously bent and/or redrawn. Furthermore, the inventive honeycomb structure is lightweight, yet able to support heavy loads on its end faces. Therefore, the inventive honeycomb can be used as a light-weight support for such objects as mirrors. These honeycombs can be used singularly or in aggregates to provide such support. Embodiments are described wherein the mass of the honeycomb is further reduced by removing select portions of the honeycomb without deleteriously impacting its ability for load bearing.
    Type: Grant
    Filed: February 17, 2000
    Date of Patent: October 22, 2002
    Assignee: Corning Incorporated
    Inventors: Gitimoy Kar, Kenneth E. Hrdina, John F. Wight, Jr., C. Charles Yu
  • Patent number: 6465272
    Abstract: The present invention relates to reflective masks and their use for reflecting extreme ultraviolet soft x-ray photons to enable the use of extreme ultraviolet soft x-ray radiation projection lithographic methods and systems for producing integrated circuits and forming patterns with extremely small feature dimensions. The projection lithographic method includes providing an illumination sub-system for producing and directing an extreme ultraviolet soft x-ray radiation &lgr; from an extreme ultraviolet soft x-ray source; providing a mask sub-system illuminated by the extreme ultraviolet soft x-ray radiation &lgr; produced by the illumination sub-system and providing the mask sub-system includes providing a patterned reflective mask for forming a projected mask pattern when illuminated by radiation &lgr;.
    Type: Grant
    Filed: July 13, 2000
    Date of Patent: October 15, 2002
    Assignee: Corning Incorporated
    Inventors: Claude L. Davis, Jr., Kenneth E. Hrdina, Robert Sabia, Harrie J. Stevens
  • Patent number: 6387511
    Abstract: These glass bodies are light weight porous structures such as a boules of high purity fused silica or ultra-low expansion glass. More specifically, the porous structures are supports for mirror blanks. Porous glass is made utilizing flame deposition of pure silica or doped silica in a manner similar to the production of high purity fused silica. Bubbles or seeds are formed in the glass during laydown. Several means of creating and controlling these seeds are available. The processes use incomplete combustion to create the bubbles. There are a number of different steps to create the incomplete combustion. One such step is a short distance between the hydrolysis flame and the glass precursor.
    Type: Grant
    Filed: July 27, 2000
    Date of Patent: May 14, 2002
    Assignee: Corning Incorporated
    Inventors: Kenneth E. Hrdina, Daniel R. Sempolinski, Michael H. Wasilewski, C. Charles Yu
  • Publication number: 20020044267
    Abstract: A lithographic stage includes a platen having a top face and a bottom face and a holder for holding an optical component on the top face of the platen. The platen is made of a light-weight material such as high purity fused silica or ultra low expansion glass. The bottom face of the platen may further include means for connecting to a positioning device in an extreme ultraviolet lithography system.
    Type: Application
    Filed: August 30, 2001
    Publication date: April 18, 2002
    Inventors: Bradford G. Ackerman, Bradley F. Bowden, Claude L. Davis, Kenneth E. Hrdina
  • Publication number: 20020043081
    Abstract: A method for manufacturing an extreme ultraviolet lithography mirror for use in includes machining a bottom face of a mirror blank, polishing a top face of the mirror blank to produce a polished mirror, and cutting a piece from the polished mirror. Another method for manufacturing an extreme ultraviolet lithography mirror for use in includes annealing a faceplate to a honeycomb core, polishing the faceplate to produce a polished mirror, and cutting a piece from the polished mirror.
    Type: Application
    Filed: August 30, 2001
    Publication date: April 18, 2002
    Inventors: Bradley F. Bowden, Claude L. Davis, Kenneth E. Hrdina, Gautam Meda
  • Patent number: 5316555
    Abstract: A porous matrix of lithium aluminate particles for molten alkali metal carbonates electrolytes having about 5 to about 50 volume percent, based upon the volume of the solids, of electrically non-conductive, active electrolyte compatible fibers having an average diameter of about 1 to about 50 microns and an average length greater than about 5 times the average diameter. Such matrices reduce matrix cracking upon loading with molten carbonates active electrolyte and provide high surface area over long term fuel cell operation.
    Type: Grant
    Filed: November 3, 1992
    Date of Patent: May 31, 1994
    Assignee: Institute of Gas Technology
    Inventors: Estela T. Ong, Kenneth E. Hrdina
  • Patent number: 5206095
    Abstract: A molten alkali metal carbonates fuel cell porous anode of lithium ferrite and a metal or metal alloy of nickel, cobalt, nickel/iron, cobalt/iron, nickel/iron/aluminum, cobalt/iron/aluminum and mixtures thereof wherein the total iron content including ferrite and iron of the composite is about 25 to about 80 percent, based upon the total anode, provided aluminum when present is less than about 5 weight percent of the anode. A process for production of the lithium ferrite containing anode by slipcasting.
    Type: Grant
    Filed: March 19, 1990
    Date of Patent: April 27, 1993
    Assignee: Institute of Gas Technology
    Inventors: Rafael A. Donado, Kenneth E. Hrdina, Robert J. Remick