Patents by Inventor Kenneth J. Bruza
Kenneth J. Bruza has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7723285Abstract: An improved fragrance delivery system capable of providing controlled release of fragrance molecules in various consumer products is composed of a polymer having covalently bound fragrance moieties that are releasable in the form of fragrance molecules. Certain embodiments comprise globular polymer particles in which unbound fragrance molecules are occluded, absorbed and/or adsorbed. Certain other embodiments incorporate fragrance monomer units, which achieve reduced residuals upon complete release of the fragrance.Type: GrantFiled: July 20, 2005Date of Patent: May 25, 2010Assignees: Michigan Molecular Institute, Quest International Flavors and Fragrances Inc.Inventors: Kenneth J. Bruza, Petar R. Dvornic, Addi R. Fadel, Jill M. Mattila, Robert M. Nowak
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Publication number: 20100104918Abstract: This invention concerns an improved PEM for fuel cell applications such that the membrane is more robust. Specifically, this invention provides PEM in MEA systems that have nano-particles carrying proton conducting groups, and improved dimensional stability relative to conductivity. This invention provides a composition of matter for a high proton conductance, solid polymer electrolyte membrane, said membrane comprising: A) a nano-additive carrying proton conducting groups having a size from about 1 nm to about 1,000 run; B) a carrier polymer for the nano-additive of Part A; and C) a proton exchange membrane (PEM) or membrane electrode assembly (MEA) formed by mixing the components of Part A and Part B above. These proton conducting groups are contributed by POSS-based nano-additives or cyclic phosphazene-based nano-additives or small molecules carrying sulfonic acid groups in fuel cells or batteries.Type: ApplicationFiled: April 11, 2008Publication date: April 29, 2010Applicant: Michigan Molecular InstituteInventors: Robert M. Nowak, Claire Hartmann-Thompson, Kenneth J. Bruza, Lowell S. Thomas, Dale J. Meier
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Patent number: 7109249Abstract: A suitable cross-linkable matrix precursor and a poragen can be treated to form a porous cross-linked matrix having a Tg of greater than 300° C. The porous matrix material has a lower dielectric constant than the corresponding non-porous matrix material, making the porous matrix material particularly attractive for a variety of electronic applications including integrated circuits, multichip modules, and flat panel display devices.Type: GrantFiled: July 16, 2004Date of Patent: September 19, 2006Assignee: Dow Global Technologies Inc.Inventors: Kenneth J. Bruza, James P. Godschalx, Edward O. Shaffer, II, Dennis W. Smith, Jr., Paul H. Townsend, III, Kevin J. Bouck, Qing Shan J. Niu
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Patent number: 6887910Abstract: A suitable cross-linkable matrix precursor and a poragen can be treated to form a porous cross-linked matrix having a Tg of greater than 300° C. The porous matrix material has a lower dielectric constant than the corresponding non-porous matrix material, making the porous matrix material particularly attractive for a variety of electronic applications including integrated circuits, multichip modules, and flat panel display devices.Type: GrantFiled: October 29, 2002Date of Patent: May 3, 2005Assignee: Dow Global Technologies Inc.Inventors: Kenneth J. Bruza, James P. Godschalx, Edward O. Shaffer, II, Dennis W. Smith, Jr., Paul H. Townsend, III, Kevin J. Bouck, Qing Shan J. Niu
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Patent number: 6653358Abstract: A suitable cross-linkable matrix precursor and a poragen can be treated to form a porous cross-linked matrix having a Tg of greater than 300° C. The porous matrix material has a lower dielectric constant than the corresponding non-porous matrix material, making the porous matrix material particularly attractive for a variety of electronic applications including integrated circuits, multichip modules, and flat panel display devices.Type: GrantFiled: October 29, 2002Date of Patent: November 25, 2003Assignee: Dow Global Technologies Inc.Inventors: Kenneth J. Bruza, James P. Godschalx, Edward O. Shaffer, II, Dennis W. Smith, Jr., Paul H. Townsend, III, Kevin J. Bouck, Qing Shan J. Niu
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Patent number: 6646081Abstract: This invention is a polyarylene composition in which resin does not undergo a significant drop in modulus at temperatures above 300° C. during cure. This feature enables one to form porous films by avoiding pore collapse and/or using a wider variety of poragen materials.Type: GrantFiled: January 11, 2002Date of Patent: November 11, 2003Assignee: Dow Global Technologies Inc.Inventors: James P. Godschalx, Qing Shan J. Niu, Kenneth J. Bruza, Clark H. Cummins, Paul H. Townsend, III
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Patent number: 6630520Abstract: A suitable cross-linkable matrix precursor and a poragen can be treated to form a porous cross-linked matrix having a Tg of greater than 300° C. The porous matrix material has a lower dielectric constant than the corresponding non-porous matrix material, making the porous matrix material particularly attractive for a variety of electronic applications including integrated circuits, multichip modules, and flat panel display devices.Type: GrantFiled: November 22, 1999Date of Patent: October 7, 2003Assignee: Dow Global Technologies Inc.Inventors: Kenneth J. Bruza, James P. Godschalx, Edward O. Shaffer, II, Dennis W. Smith, Jr., Paul H. Townsend, III, Kevin J. Bouck, Qing Shan J. Niu
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Publication number: 20030092785Abstract: A suitable cross-linkable matrix precursor and a poragen can be treated to form a porous cross-linked matrix having a Tg of greater than 300° C. The porous matrix material has a lower dielectric constant than the corresponding non-porous matrix material, making the porous matrix material particularly attractive for a variety of electronic applications including integrated circuits, multichip modules, and flat panel display devices.Type: ApplicationFiled: October 29, 2002Publication date: May 15, 2003Inventors: Kenneth J. Bruza, James P. Godschalx, Edward O. Shaffer, Dennis W. Smith, Paul H. Townsend, Kevin J. Bouck, Qing Shan J. Niu
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Publication number: 20030083392Abstract: A suitable cross-linkable matrix precursor and a poragen can be treated to form a porous cross-linked matrix having a Tg of greater than 300° C. The porous matrix material has a lower dielectric constant than the corresponding non-porous matrix material, making the porous matrix material particularly attractive for a variety of electronic applications including integrated circuits, multichip modules, and flat panel display devices.Type: ApplicationFiled: October 29, 2002Publication date: May 1, 2003Inventors: Kenneth J. Bruza, James P. Godschalx, Edward O. Shaffer, Dennis W. Smith, Paul H. Townsend, Kevin J. Bouck, Qing Shan J. Niu
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Publication number: 20020099158Abstract: This invention is a polyarylene composition in which resin does not undergo a significant drop in modulus at temperatures above 300° C. during cure. This feature enables one to form porous films by avoiding pore collapse and/or using a wider variety of poragen materials.Type: ApplicationFiled: January 11, 2002Publication date: July 25, 2002Inventors: James P. Godschalx, Qing Shan J. Niu, Kenneth J. Bruza, Clark H. Cummins, Paul H. Townsend
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Patent number: 6359091Abstract: This invention is a polyarylene composition in which resin does not undergo a significant drop in modulus at temperatures above 300° C. during cure. This feature enables one to form porous films by avoiding pore collapse and/or using a wider variety of poragen materials.Type: GrantFiled: November 22, 1999Date of Patent: March 19, 2002Assignee: The Dow Chemical CompanyInventors: James P. Godschalx, Kenneth J. Bruza, Qing Shan J. Niu, Clark H. Cummins, Paul H. Townsend, III
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Patent number: 5276228Abstract: This invention is directed to a class of arylcyclobutene monomers having the general formula: ##STR1## wherein Ar is aromatic, with the proviso that the carbons of the cyclobutene rings are bonded to adjacent carbon atoms on the same aromatic ring of Ar;and R.sup.1 is a divalent alkyl, cycloaliphatic, aromatic, heteroaromatic, or heterocyclic moiety;polymeric compositions containing these monomers; and articles containing said polymeric compositions.Type: GrantFiled: January 25, 1993Date of Patent: January 4, 1994Assignee: The Dow Chemical CompanyInventors: Kenneth J. Bruza, Robert A. Kirchhoff
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Patent number: 5274135Abstract: A process for preparing a 3- or 4-aminobenzocyclobutene comprises aminating a 3- or 4-halo- or sulfonyloxybenzocyclobutene reactant with an aminating agent by heating at a temperature from about 80.degree. C. to a temperature at which dimerization or oligomerization of a benzocyclobutene reactant or product is a significant side reaction, in the presence of a metal-containing catalyst, for a time sufficient to aminate the halo- or sulfonyloxybenzocyclobutene reactant. In another aspect, this invention relates to a process for making a 3- or 4-phthalimido- or maleimidobenzocyclobutene, comprising reacting a 3- or 4-halobenzocyclobutene reactant with a phthalimide or maleimide compound in the presence of a metal-containing catalyst. The resulting phthalimido- or maleimidobenzocyclobutene can be hydrolyzed to a 3- or 4-aminobenzocyclobutene.Type: GrantFiled: September 20, 1991Date of Patent: December 28, 1993Assignee: The Dow Chemical CompanyInventors: Kenneth J. Bruza, Arnold E. Young, Kurt A. Bell
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Patent number: 5247037Abstract: Copolymers of a mono(cyclobutarene) comonomer and a polymaleimide comonomer are described. These copolymers have higher thermal stability and lower water absorption than polymaleimide homopolymers. They are useful in applications such as electronics, membranes, composities, coatings, and adhesives. Examples of such copolymers are those formed from the comonomers 1,1'-(methylenedi-4,1-phenylene)bismaleimide, and 3-(1-(4-methylphenyl)ethenyl)-bicyclo(4.2.0)octa-1,3,5-triene or 3-(2-(4-methylphenyl)ethenyl)-bicyclo(4.2.0)octa-1,3,5-triene.Type: GrantFiled: September 30, 1991Date of Patent: September 21, 1993Assignee: The Dow Chemical CompanyInventors: Robert A. Kirchhoff, Lana S. Spencer, Kenneth J. Bruza
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Patent number: 5134214Abstract: Copolymers comprising, in polymerized form, a 1,1-substituted arylethylene comonomer and at least one polymaleimide comonomer, are prepared using a system that provides a reduced onset of polymerization temperature thereby allowing removal of the copolymer from the mold after a preliminary curing period followed by transfer to an oven, a less expensive piece of equipment, for additional curing; thus making the mold, a more expensive piece of equipment, available for the next polymerization run.Type: GrantFiled: May 15, 1991Date of Patent: July 28, 1992Assignee: The Dow Chemical CompanyInventors: Kenneth J. Bruza, Robert A. Kirchhoff
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Patent number: 5028712Abstract: The invention comprises cyclobutarene ketoanhydride monomers and the process for preparing them, and cyclobutarene ketocarboxy monomers. The monomers can be copolymerized with suitable difunctional monomers and subsequently processed to prepare highly crosslinked structures. The monomers can also be used to endcap oligomers with the cyclobutarene functionality. The endcapped oligomer can subsequently be processed to prepare a highly crosslinked network.Type: GrantFiled: May 24, 1990Date of Patent: July 2, 1991Assignee: The Dow Chemical CompanyInventor: Kenneth J. Bruza
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Patent number: 4996288Abstract: The invention comprises cyclobutarene ketoanhydride monomers and the process for preparing them, and cyclobutarene ketocarboxy monomers. The monomers can be copolymerized with suitable difunctional monomers and subsequently processed to prepared highly crosslinked structures. The monomers can also be used to endcap oligomers with the cyclobutarene functionality. The endcapped oligomer can subsequently be processed to prepare a highly crosslinked network.Type: GrantFiled: February 8, 1989Date of Patent: February 26, 1991Assignee: The Dow Chemical CompanyInventor: Kenneth J. Bruza
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Patent number: 4825001Abstract: The invention comprises cyclobutarene ketoaniline monomers and the process for preparing them. The monomers can be used to graft and/or endcap a monomer or polymer having at least 1 amino-reactive functionality. The grafted and/or endcapped monomer or polymer can subsequently be processed to prepare a highly crosslinked network. Said monomers have the formula: ##STR1## as a preferred embodiment.Type: GrantFiled: August 26, 1988Date of Patent: April 25, 1989Assignee: The Dow Chemical CompanyInventors: Kenneth J. Bruza, Robert A. Kirchhoff
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Patent number: 4795827Abstract: The invention comprises cyclobutarene ketoaniline monomers and the process for preparing them. The monomers can be used to graft and/or endcap a monomer or polymer having at least 1 amino-reactive functionality. The grafted and/or endcapped monomer or polymer can subsequently be processed to prepare a highly crosslinked network.Type: GrantFiled: October 16, 1987Date of Patent: January 3, 1989Assignee: The Dow Chemical CompanyInventors: Kenneth J. Bruza, Robert A. Kirchhoff
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Patent number: 4529556Abstract: The invention bis((aryl)vinyl)benzenes wherein the aryl and benzene moieties may be substituted, and the vinyl carbon alpha to the central benzene ring may be further substituted with an aliphatic group.Type: GrantFiled: August 19, 1983Date of Patent: July 16, 1985Assignee: The Dow Chemical CompanyInventor: Kenneth J. Bruza