Patents by Inventor Kenneth J. Ponder

Kenneth J. Ponder has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for planarizing a semiconductor topography using a spin-on glass material with a variable chemical-mechanical polish rate
    Patent number: 5516729
    Abstract: A method is provided for forming a planarization structure of dielectrical materials upon a substrate topography. The dielectric materials are deposited as first and second insulating layers. The second, and then the first insulating layers are partially removed by chemical-mechanical polish (CMP). Prior to CMP, the second insulating layer of variable chemical and mechanical properties can be fixed at a preferred chemical or mechanical characteristic which makes it more or less susceptible to subsequent CMP. Accordingly, the present invention utilizes a second insulating layer of adjustable properties necessary to more adequately planarize during application of CMP.
    Type: Grant
    Filed: June 3, 1994
    Date of Patent: May 14, 1996
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Robert Dawson, Kenneth J. Ponder