Patents by Inventor Kenta Sasa

Kenta Sasa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optical sheet, backlight unit, liquid crystal display apparatus, and information device
    Patent number: 11966117
    Abstract: An optical sheet 5 is an optical sheet, at least a first surface of the optical sheet has unevenness. A sparkle contrast of the first surface measured in conformity with JIS C 1006: 2019 is 4% or less. An arithmetic average roughness Ra of the first surface measured in conformity with JIS B 0601: 2001 (with an assessment length set to 290 ?m) may be 0.6 ?m or less. A peak count RPc of the first surface measured in conformity with JIS B 0601: 2001 (with an assessment length set to 290 ?m) may be 16 or more.
    Type: Grant
    Filed: November 1, 2022
    Date of Patent: April 23, 2024
    Assignee: KEIWA INC.
    Inventor: Kenta Sasa
  • OPTICAL SHEET, BACKLIGHT UNIT, LIQUID CRYSTAL DISPLAY APPARATUS, AND INFORMATION DEVICE
    Publication number: 20230052606
    Abstract: An optical sheet 5 is an optical sheet, at least a first surface of the optical sheet has unevenness. A sparkle contrast of the first surface measured in conformity with JIS C 1006: 2019 is 4% or less. An arithmetic average roughness Ra of the first surface measured in conformity with JIS B 0601: 2001 (with an assessment length set to 290 µm) may be 0.6 µm or less. A peak count RPc of the first surface measured in conformity with JIS B 0601: 2001 (with an assessment length set to 290 µm) may be 16 or more.
    Type: Application
    Filed: November 1, 2022
    Publication date: February 16, 2023
    Inventor: Kenta SASA
  • Adjusting method for imprint apparatus, imprinting method, and article manufacturing method
    Patent number: 11188058
    Abstract: An adjusting method for adjusting an imprint apparatus includes a preparation step of preparing a sample for evaluating a state in which a contact region of a test mold is in contact with an imprint material supplied on a substrate; an evaluation step of evaluating the sample; and an adjustment step of adjusting the imprint apparatus based on a result of evaluation obtained in the evaluation step. The contact region includes a flat region which does not include a pattern, the evaluation in the evaluation step includes a first evaluation, which is an evaluation of a state of the imprint material in the flat region, and the imprint apparatus is adjusted based on a result of the first evaluation in the adjustment step.
    Type: Grant
    Filed: December 20, 2016
    Date of Patent: November 30, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Kunihiko Asada, Shingo Ishida, Kenta Sasa
  • ADJUSTING METHOD FOR IMPRINT APPARATUS, IMPRINTING METHOD, AND ARTICLE MANUFACTURING METHOD
    Publication number: 20170185074
    Abstract: An adjusting method for adjusting an imprint apparatus includes a preparation step of preparing a sample for evaluating a state in which a contact region of a test mold is in contact with an imprint material supplied on a substrate; an evaluation step of evaluating the sample; and an adjustment step of adjusting the imprint apparatus based on a result of evaluation obtained in the evaluation step. The contact region includes a flat region which does not include a pattern, the evaluation in the evaluation step includes a first evaluation, which is an evaluation of a state of the imprint material in the flat region, and the imprint apparatus is adjusted based on a result of the first evaluation in the adjustment step.
    Type: Application
    Filed: December 20, 2016
    Publication date: June 29, 2017
    Inventors: Kunihiko Asada, Shingo Ishida, Kenta Sasa