Patents by Inventor Kenta Tsubohara

Kenta Tsubohara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7449048
    Abstract: The invention provides a method of reusing an inert gas in a polymer production plant by removing impurities such as a polymerization solvent and polymerization monomers from an inert gas discharged from a polymer production plant. The method of reusing an inert gas comprises a step of adsorbing and removing a polymerization solvent and polymerization monomers contained in an inert gas by passing, through an adsorbent layer, an inert gas discharged from a polymer production plant, wherein an inert gas reaching a predetermined purity by removing the polymerization solvent and polymerization monomers in the step of adsorption and removal is reused in the polymer production plant.
    Type: Grant
    Filed: March 19, 2003
    Date of Patent: November 11, 2008
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Hiroto Nishida, Kenta Tsubohara, Etsurou Okamoto, Yoshiaki Deguchi
  • Patent number: 7446147
    Abstract: A propylene resin composition comprising (A) a crystalline propylene block copolymer in an amount of 89 to 30% by weight, which has a specific content of a 23° C. n-decane-soluble component, said soluble component having a specific intrinsic viscosity [?]a as measured in decalin at 135° C., has a specific melt flow rate (MFR, 230° C., load of 2160 g), and has a specific isotactic pentad fraction of a polypropylene homopolymer portion as measured by 13C-NMR, (B) a crystalline propylene block copolymer in an amount of 5 to 25% by weight, which has a specific content of a 23° C. n-decane-soluble component, said soluble component having a specific intrinsic viscosity [?]b as measured in decalin at 135° C., has a specific melt flow rate (MFR, 230° C., load of 2160 g), and has a specific isotactic pentad fraction of a polypropylene homopolymer portion as measured by 13C-NMR, (C) an elastomeric polymer in an amount of 1 to 20% by weight, which has a melt flow rate (MFR, 230C, load of 2160 g) of 0.
    Type: Grant
    Filed: November 11, 2003
    Date of Patent: November 4, 2008
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Masamichi Naito, Ikunori Sakai, Yoshio Sugimoto, Kenta Tsubohara
  • Publication number: 20070010622
    Abstract: A propylene resin composition comprising (A) a crystalline propylene block copolymer in an amount of 89 to 30% by weight, which has a specific content of a 23° C. n-decane-soluble component, said soluble component having a specific intrinsic viscosity [?]a as measured in decalin at 135° C., has a specific melt flow rate (MFR, 230° C., load of 2160 g), and has a specific isotactic pentad fraction of a polypropylene homopolymer portion as measured by 13C-NMR, (B) a crystalline propylene block copolymer in an amount of 5 to 25% by weight, which has a specific content of a 23° C. n-decane-soluble component, said soluble component having a specific intrinsic viscosity [?]b as measured in decalin at 135° C., has a specific melt flow rate (MFR, 230° C., load of 2160 g), and has a specific isotactic pentad fraction of a polypropylene homopolymer portion as measured by 13C-NMR, (C) an elastomeric polymer in an amount of 1 to 20% by weight, which has a melt flow rate (MFR, 230C, load of 2160 g) of 0.
    Type: Application
    Filed: November 11, 2003
    Publication date: January 11, 2007
    Inventors: Masamichi Naito, Ikunori Sakai, Yoshio Sugimoto, Kenta Tsubohara
  • Publication number: 20060180024
    Abstract: The invention provides a method of reusing an inert gas in a polymer production plant by removing impurities such as a polymerization solvent and polymerization monomers from an inert gas discharged from a polymer production plant. The method of reusing an inert gas comprises a step of adsorbing and removing a polymerization solvent and polymerization monomers contained in an inert gas by passing, through an adsorbent layer, an inert gas discharged from a polymer production plant, wherein an inert gas reaching a predetermined purity by removing the polymerization solvent and polymerization monomers in the step of adsorption and removal is reused in the polymer production plant.
    Type: Application
    Filed: March 19, 2003
    Publication date: August 17, 2006
    Inventors: Hiroto Nishida, Kenta Tsubohara, Etsurou Okamoto, Yoshiaki Deguchi