Patents by Inventor Kentaro Sho

Kentaro Sho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Amorphous hard carbon film and mechanical parts coated therewith
    Patent number: 6001480
    Abstract: An amorphous hard carbon film deposited on a substrate wherein the film further contains silicon and nitrogen. A method for deposition of an amorphous hard carbon film containing silicon and nitrogen on a substrate wherein a carbon source, a silicon source and a nitrogen source are introduced in a deposition chamber in which the substrate are placed to deposit the film on said substrate. A mechanical part having a slidable member or slidable members wherein the slidable member(s) is coated with the above amorphous hard carbon film. A method for the use of the above amorphous hard carbon film wherein the film is coated on the surface of a slidable member of a mechanical part.
    Type: Grant
    Filed: October 23, 1997
    Date of Patent: December 14, 1999
    Assignee: Zexel Corporation
    Inventor: Kentaro Sho
  • Amorphous hard carbon film
    Patent number: 5843571
    Abstract: An amorphous hard carbon film deposited on a substrate wherein the film further contains silicon and nitrogen. A method for deposition of an amorphous hard carbon film containing silicon and nitrogen on a substrate wherein a carbon source, a silicon source and a nitrogen source are introduced in a deposition chamber in which the substrate are placed to deposit the film on said substrate. A mechanical part having a slidable member or slidable members wherein the slidable member(s) is coated with the above amorphous hard carbon film. A method for the use of the above amorphous hard carbon film wherein the film is coated on the surface of a slidable member of a mechanical part.
    Type: Grant
    Filed: December 20, 1996
    Date of Patent: December 1, 1998
    Assignee: Zexel Corporation
    Inventor: Kentaro Sho
  • Method for deposition of amorphous hard carbon films
    Patent number: 5616374
    Abstract: A method for deposition of an amorphous hard carbon film containing silicon and nitrogen on a substrate wherein a carbon source, a silicon source and a nitrogen source are introduced in a deposition chamber in which the substrate are placed to deposit the film on said substrate.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: April 1, 1997
    Assignee: Zexel Corporation
    Inventor: Kentaro Sho