Abstract: An exposure method comprises a calculation step of calculating a correction amount of a correction unit which corrects a change in imaging characteristics of a projection optical system based on at least one of parameters including a numerical aperture and effective light source of an illumination optical system, a numerical aperture of the projection optical system, and a size and pitch of a pattern, and an amount of change in environment condition in the projection optical system; and a correction step of making the correction unit operate in accordance with the correction amount calculated in the calculation step.

Abstract: An apparatus includes original positioning mechanism which positions original stage, substrate positioning mechanism which positions substrate stage, measurement device mounted on the substrate stage, and controller. One of original and the original stage is provided with first measurement pattern including patterns, at least one of pitches and widths thereof being different from each other. The measurement device includes second measurement pattern, and sensor configured to detect light passed through the first and second measurement patterns, and a projection optical system. The controller determines illuminated region, within which the first measurement pattern is to be illuminated, using information related to the original, and obtains information related to an image of the first measurement pattern within the illuminated region based on an output from the sensor.

Abstract: An exposure method comprises a calculation step of calculating a correction amount of a correction unit which corrects a change in imaging characteristics of a projection optical system based on at least one of parameters including a numerical aperture and effective light source of an illumination optical system, a numerical aperture of the projection optical system, and a size and pitch of a pattern, and an amount of change in environment condition in the projection optical system; and a correction step of making the correction unit operate in accordance with the correction amount calculated in the calculation step.

Abstract: An exposure method comprises a calculation step of calculating a correction amount of a correction unit which corrects a change in imaging characteristics of a projection optical system based on at least one of parameters including a numerical aperture and effective light source of an illumination optical system, a numerical aperture of the projection optical system, and a size and pitch of a pattern, and an amount of change in environment condition in the projection optical system; and a correction step of making the correction unit operate in accordance with the correction amount calculated in the calculation step.

Abstract: An apparatus includes original positioning mechanism which positions original stage, substrate positioning mechanism which positions substrate stage, measurement device mounted on the substrate stage, and controller. One of original and the original stage is provided with first measurement pattern including patterns, at least one of pitches and widths thereof being different from each other. The measurement device includes second measurement pattern, and sensor configured to detect light passed through the first and second measurement patterns, and a projection optical system. The controller determines illuminated region, within which the first measurement pattern is to be illuminated, using information related to the original, and obtains information related to an image of the first measurement pattern within the illuminated region based on an output from the sensor.

Abstract: An exposure method comprises a calculation step of calculating a correction amount of a correction unit which corrects a change in imaging characteristics of a projection optical system based on at least one of parameters including a numerical aperture and effective light source of an illumination optical system, a numerical aperture of the projection optical system, and a size and pitch of a pattern, and an amount of change in environment condition in the projection optical system; and a correction step of making the correction unit operate in accordance with the correction amount calculated in the calculation step.

Abstract: This invention effectively limits light incidence on an adhesive material fixing an optical element. An optical device includes an optical element, a supporting member connected to the optical element through an adhesive material to support the optical element, and a light shielding film formed in an unirradiated region on the surface of the optical element to limit light incidence on the adhesive material.

Abstract: This invention effectively limits light incidence on an adhesive material fixing an optical element. An optical device includes an optical element, a supporting member connected to the optical element through an adhesive material to support the optical element, and a light shielding film formed in an unirradiated region on the surface of the optical element to limit light incidence on the adhesive material.