Patents by Inventor Kenya ABIKO

Kenya ABIKO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8865314
    Abstract: A press molding glass material including: a core portion composed of optical glass; and a surface layer covering the core portion, wherein the surface layer includes an outermost layer contacting with a molding surface of a molding die in press molding and an intermediate layer adjacent to the outermost layer, the outermost layer is a silicon oxide film having a surface free energy measured by a three-solution method of equal to or less than 75 mJ/m2 and having a film thickness of less than 15 nm, and the intermediate layer is a film composed of a film material having a bond-radius difference from a silicon oxide based on a stoichiometric composition of more than 0.10 ?, wherein, in a case in which the bond-radius difference is more than 0.10 ? and equal to or less than 0.40 ?, a film thickness of the intermediate layer is equal to or less than 5 nm.
    Type: Grant
    Filed: June 26, 2012
    Date of Patent: October 21, 2014
    Assignee: Hoya Corporation
    Inventors: Takashi Igari, Kenya Abiko
  • Publication number: 20120324956
    Abstract: A press molding glass material including: a core portion composed of optical glass; and a surface layer covering the core portion, wherein the surface layer includes an outermost layer contacting with a molding surface of a molding die in press molding and an intermediate layer adjacent to the outermost layer, the outermost layer is a silicon oxide film having a surface free energy measured by a three-solution method of equal to or less than 75 mJ/m2 and having a film thickness of less than 15 nm, and the intermediate layer is a film composed of a film material having a bond-radius difference from a silicon oxide based on a stoichiometric composition of more than 0.10 ?, wherein, in a case in which the bond-radius difference is more than 0.10 ? and equal to or less than 0.40 ?, a film thickness of the intermediate layer is equal to or less than 5 nm.
    Type: Application
    Filed: June 26, 2012
    Publication date: December 27, 2012
    Applicant: HOYA CORPORATION
    Inventors: Takashi IGARI, Kenya ABIKO