Abstract: The present disclosure relates to a cleaning agent composition for a substrate for a semiconductor device and a method for cleaning a substrate for a semiconductor device using the same. The cleaning agent composition contains a silicon-based compound represented by Formula 1 and an aprotic organic solvent with a dielectric constant of 10 or less, which can form a surface protective film capable of preventing collapse of the pattern even in a wet cleaning process of fine patterns with high aspect ratios, thereby providing a method for manufacturing a semiconductor device with an improved semiconductor manufacturing yield.

Abstract: A display device includes a display area and a non-display area disposed around the display area and including a pad area. The display device includes a resistance checker disposed in the non-display area, resistance test pads disposed in the pad area, resistance test lines connecting the resistance checker with the resistance test pad, and crack test lines disposed on the outer side of the resistance checker. The resistance test lines intersect the crack test lines in a plan view.

Abstract: A real time motion vector detection method for increasing a speed of motion detection by using a digital signal processor in an image processing system. It is possible to reduce an operation time by making most use of a feature of DSP chip in performing a motion detection with the three step detection method, i.e., a so-called coarse-fine search method to search roughly in a first step and search accurately in second and third steps on the assumption of the distortion measure between each block being smooth in a search area.