Patents by Inventor Kesanao Kobayashi

Kesanao Kobayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5897981
    Abstract: A color filter for liquid crystal displays, has a red colored layer wherein a first red pigment where a 40%-transmittance wavelength at a short-wave end of a transmitted spectrum (short-wave 40%-transmittance wavelength) is in a range of 550 to 600 NM and a second red pigment where the short-wave 40%-transmittance wavelength is within 40 NM from the range of the first red pigment are mixed so that transmittance in a wavelength region of 450 to 500 NM is substantially 0%.
    Type: Grant
    Filed: June 6, 1997
    Date of Patent: April 27, 1999
    Assignee: International Business Machines Corporation
    Inventors: Kesanao Kobayashi, Takashi Fujita, Naoyuki Tsujimura, Naohisa Tohjoh
  • Patent number: 5756267
    Abstract: A developing solution for negative type photo-sensitive resin compositions which comprises an aqueous solution containing 0.01 to 1.5% by weight of at least one compound selected from quaternary ammonium bases represented by formula (I): ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are the same or different, and are groups selected from the class consisting of alkyl and hydroxyalkyl groups, each group having 1 to 6 carbon atoms, and containing a nonionic, cationic or amphoteric surface active agent. The developing solution allows for development of sharp image patterns within a short period without forming mottles.
    Type: Grant
    Filed: May 29, 1991
    Date of Patent: May 26, 1998
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Nobuaki Matsuda, Kesanao Kobayashi
  • Patent number: 5698374
    Abstract: A process for the preparation of an image is provided, which comprises exposing to light a layer of a composition which changes its stickiness when irradiated with active light, spraying a particulate image-forming material on to the layer, removing the particulate matter which has not been attached to the layer, and then heating the layer to fix the particulate image-forming to the substrate. This process is suitable for the patterning of not only a fluorescent substance for plasma display but also a light-impermeable or sparingly light-permeable material to which photolithography has heretofore been difficultly applied. Furthermore, the thickness of the image-forming material layer can be easily varied by properly selecting the grain diameter of the image-forming material.
    Type: Grant
    Filed: July 3, 1996
    Date of Patent: December 16, 1997
    Assignees: Fuji Photo Film Co., Ltd., Fuji-Hunt Electronics Technology Co., Ltd.
    Inventors: Kesanao Kobayashi, Masahide Yasui
  • Patent number: 5633111
    Abstract: A positive type or negative type photoresist composition for fine processing having excellent resolution, sensitivity, adhesive-ness and developability comprising:(a) an alkali soluble resin or a resin having anti-alkali dissolution groups in the molecules thereof,(b) a light-sensitive compound, and(c) at least one organic compound selected from the group consisting of organic phosphorus acid compounds and esters thereof in an amount of 0.001 to 10% by weight based on a weight of the resin. In addition, the present invention is directed to an etching method utilizing the positive type or negative type photoresist composition.
    Type: Grant
    Filed: October 30, 1992
    Date of Patent: May 27, 1997
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hiroshi Yoshimoto, Kesanao Kobayashi
  • Patent number: 5626796
    Abstract: A light-sensitive composition for forming a black matrix comprises (a) a photopolymerizable unsaturated compound, (b) a photopolymerization initiator, (c) a binder and (d) a pigment, wherein the amount of monovalent metallic cations present in the pigment as impurities is not more than 5 ppm; a black matrix is formed from the composition; a color filter substrate comprises a transparent substrate and a color filter formed thereon, wherein it further comprises the foregoing black matrix formed thereon; and a liquid crystal display device comprises an array substrate provided thereon with display electrodes and switching elements, a color filter substrate, common electrodes and a liquid crystal injected in the space between the array substrate and the color filter substrate, wherein it further comprises the foregoing black matrix formed on the switching elements or on the color filter substrate.
    Type: Grant
    Filed: February 9, 1995
    Date of Patent: May 6, 1997
    Assignees: Fuji Photo Film Co., Ltd., International Business Machines Corporation
    Inventors: Naoyuki Tsujimura, Toshihiro Ueki, Akira Ushimaru, Kesanao Kobayashi
  • Patent number: 5374493
    Abstract: The present invention is a color filter and method of making a color filter in which a reactive dye is added to a photosensitive composite, which contains pigment to form the color filter, and the reactive dye reacts with the binder polymer of the photosensitive composite to form a color filter having a high contrast color filter. The photosensitive composite, which has a primary color and which contains the product of the binder polymer and the reactive dye, is deposited on a glass substrate over a shielding layer. A layer of PVA is then deposited on the photosensitive composite layer. A masking layer then defines the area of the specific primary color for the photosensitive composite. This process is then repeated for the remaining primary colors of the color filter. The color filter produced by this process has a very high contrast ratio.
    Type: Grant
    Filed: July 22, 1992
    Date of Patent: December 20, 1994
    Assignee: International Business Machines Corporation
    Inventors: Tetsuya Fukunaga, Toshihiko Koseki, Toshihiro Ueki, Hidemine Yamanaka, Kesanao Kobayashi
  • Patent number: 5308743
    Abstract: A positive-type photoresist composition is disclosed, which comprises:(A) an o-quinonediazide compound;(B) an alkali-soluble phenol resin; and(C) at least one compound selected from a group consisting of urea compounds, thiourea compounds and arylamine compounds; A positive-type photoresist composition which comprises:(A) an o-quinonediazide compound;(B) an alkali-soluble phenol resin; and(C) at least one compound selected from a group consisting of urea compounds, thiourea compounds, and arylamine compounds represented by general formulae (I), (II) and (III), respectively, ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, and R.sub.4 each represents a hydrogen atom, an alkyl group, an aryl group, or any two of R.sub.1, R.sub.2, R.sub.3, and R.sub.4 form at least one ring together, ##STR2## wherein R.sub.5, R.sub.6, and R.sub.
    Type: Grant
    Filed: March 6, 1992
    Date of Patent: May 3, 1994
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kesanao Kobayashi, Nobuaki Matsuda
  • Patent number: 5085973
    Abstract: Herein is provided a color filter prepared by providing red, green and blue image elements, comprising as photosensitive resin and a pigment, and a black matrix on a transparent substrate and further providing thereon a transparent electrode layer, wherein said photosensitive resin is so formulated that it comprises a polyfunctional acrylate monomer, an organic polymer binder and a photopolymerization initiator comprising a 2-mercapto-5-substituted thiadiazole compound represented by general formulas (I) and/or general formulas (II), a phenyl ketone compound represented by general formulas (III) and 2,4,5-triphenylimidazolyl dimer composed of two lophine residues combined to each other through intermediation of a single covalent bond.A pattern having a high precision and a good surface smoothness can be obtained owing to the photosensitive resin, and a color filter having a good environmental resistance can be obtained owning to the pigment.
    Type: Grant
    Filed: June 13, 1991
    Date of Patent: February 4, 1992
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Tokihiko Shimizu, Kesanao Kobayashi
  • Patent number: 4934791
    Abstract: A color filter prepared by providing red, green and blue picture elements and a black matrix, all comprising a photosensitive resin and a pigment, on a transparent substrate and a transparent electrode layer on the surface, wherein said photosensitive resin comprises a polyfunctional acrylate monomer, an organic polymer binder and a photopolymerization initiator composed of at least one member selected from the group consisting of halomethyloxadiazole compounds and halomethyl-triazine compounds.The color filter provided herein gives a pattern having a high precision and a high surface smoothness owing to the photosensitive resin and exhibits a good environment resistance owing to the pigment.
    Type: Grant
    Filed: December 5, 1988
    Date of Patent: June 19, 1990
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Tokihiko Shimizu, Kesanao Kobayashi
  • Patent number: 4837131
    Abstract: This invention provides a developing method for photosensitive materials, in particlar for a positive photosensitive lithographic printing plate, which enables an efficient development with minimum consumption of the developing liquid. The developing method of the present invention comprises the steps of: conducting a preparatory development by applying a developing liquid to an exposed photosensitive layer of a photosensitive material, the developing liquid being supplied in an amount of necessary for each developing cycle; removing the developing liquid; discarding the developing liquid; and again applying a developing liquid to the photosensitive material to complete the development.
    Type: Grant
    Filed: June 18, 1986
    Date of Patent: June 6, 1989
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kesanao Kobayashi, Hisao Ohba, Tadao Toyama
  • Patent number: 4762772
    Abstract: A desensitizing gum comprising an aqueous solution of water-soluble and film-forming hydroxyalkylated starch, characterized in that the degree of etherification of the hydroxyalkylated starch is 0.03 to 0.08 and the gum further contains at least one member selected from the group consisting of anionic and nonionic surfactants.
    Type: Grant
    Filed: October 8, 1986
    Date of Patent: August 9, 1988
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kesanao Kobayashi, Hiroshi Matsumoto
  • Patent number: 4737810
    Abstract: A photosensitive material developing apparatus has a first area for supplying a developer to the exposed surface of an imagewise light-exposed photosensitive material, and a second area positioned on the downstream side of the first area in the direction in which the photosensitive material is transported, and adapted to develop the photosensitive material. The apparatus is provided with a wire bar having a wire wound on the outer peripheral portion thereof for the purpose of removing a part of the developer supplied to the exposed surface of the photosensitive material before development is practically commenced and of allowing only a predetermined amount of developer to remain on the exposed surface. The apparatus is further provided with a tray for collecting the removed developer, and a pump for delivering the collected developer to the first area so as to be reused.
    Type: Grant
    Filed: August 28, 1986
    Date of Patent: April 12, 1988
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kesanao Kobayashi, Hisao Ohba
  • Patent number: 4731119
    Abstract: A desensitizing gum containing water-soluble carboxy alkylated starch wherein the carboxy alkyl group number of said carboxy alkylated starch is from 0.03 to 0.5. The desensitizing gum has desensitizing ability comparable to gum arabic.
    Type: Grant
    Filed: July 2, 1986
    Date of Patent: March 15, 1988
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tadao Toyama, Kesanao Kobayashi
  • Patent number: 4687727
    Abstract: A light-sensitive planographic printing plate comprising a layer of a photo-polymerizable composition provided on at least one side of a base, wherein said photo-polymerizable composition comprises:(A) a polymer having at least one group represented by the general formula (I) ##STR1## wherein R.sub.1 to R.sub.5 each represent a member selected from the group consisting of a hydrogen atom, a halgen atom, a carboxyl group, a sulfo group, a nitro group, a cyano group, an amido group, an amino group and a substituted or unsubstituted alkyl group, aryl group, alkoxy gruop, aryloxy group, alkylamino group, arylamino group, alkylsulfonyl group and arylsulfonyl group and Z represents an oxygen atom, a sulfur atom, NH or NR, wherein R represents an alkyl group; and a carboxyl group on the side chain;(B) a monomer or oligomer having at least two polymerizable ethylenically unsaturated double bonds;(C) a photo-polymerization initiator, and(D) a diazo resin.
    Type: Grant
    Filed: September 9, 1985
    Date of Patent: August 18, 1987
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tadao Toyama, Kesanao Kobayashi, Mitsuru Koike, Koji Tamoto
  • Patent number: 4573782
    Abstract: A method for forming an image on a light-sensitive material with a light-sensitive layer composed of a photopolymerizable composition, and an apparatus for carrying out the method are described. This method comprises exposing imagewise, heating, and developing a number of light-sensitive materials while the time interval between the heating and developing steps is maintained at a definite level. Changes in sensitivity of the light sensitive material are prevented and images of high sensitivity are obtained.
    Type: Grant
    Filed: November 24, 1982
    Date of Patent: March 4, 1986
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kesanao Kobayashi, Tadao Toyama, Susumu Yoshida
  • Patent number: 4511645
    Abstract: A presensitized printing plate which has a photopolymerizing composition layer provided on at least one side of a support, with the photopolymerizing composition being constituted with (A) a polymer containing in its side chains groups represented by the following general formula (I) and carboxylic groups: ##STR1## (wherein R.sub.1 to R.sub.5 each represents a hydrogen atom, a halogeno group, a carboxyl group, a sulfo group, a nitro group, a cyano group, and amido group, an amino group, or an unsubstituted or a substituted alkyl, aryl, alkoxy, aryloxy, alkylamino, arylamino, alkylsulfonyl or arylsulfonyl group; and Z represents an oxygen atom, a sulfur atom, --NH-- or --NR-- (R=alkyl)), (B) a monomer or an olygomer having at least two polymerizable ethylenically unsaturated double bonds, and (C) a photopolymerization initiator.
    Type: Grant
    Filed: September 9, 1983
    Date of Patent: April 16, 1985
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Mitsuru Koike, Kesanao Kobayashi, Tadao Toyama, Hiroshi Misu, Koji Tamoto, Masayuki Iwasaki
  • Patent number: 4221858
    Abstract: In a process for preparing a planographic printing plate which comprises imagewise exposing a silver halide photosensitive material comprising a support having thereon a tanning-developable silver halide photosensitive layer; tanning developing the exposed photosensitive material and washing out the untanned areas of the photosensitive layer; the improvement comprising the silver halide photosensitive layer further contains finely divided particles of an oleophilic synthetic resin in which the particles are substantially insoluble in water, are non-permeable to an alkaline solution and are not dissolved during the tanning development.
    Type: Grant
    Filed: July 27, 1978
    Date of Patent: September 9, 1980
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Keisuke Shiba, Kesanao Kobayashi
  • Patent number: 4186006
    Abstract: A method for developing a light-sensitive lithographic printing plate having an image-forming layer containing a substantially water-insoluble diazo resin thereon using a developer composition which comprises (a) benzyl alcohol, .alpha.-methylbenzyl alcohol, ethylene glycol monophenyl ether and/or ethylene glycol monobenzyl ether, (b) an anionic surface active agent and (c) a water-soluble sulfite.
    Type: Grant
    Filed: October 3, 1977
    Date of Patent: January 29, 1980
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kesanao Kobayashi, Hiroshi Matumoto, Yasuhisa Naritomi
  • Patent number: 4172729
    Abstract: A photosensitive diazo composition for a pre-sensitized lithographic plate which exhibits an extended shelf life as well as improved printing performance, the composition comprising (a) a diazonium compound, (b) an organic high molecular weight binder, and (c) from about 0.1 to about 5% by weight of oxalic acid or a salt thereof.
    Type: Grant
    Filed: June 28, 1977
    Date of Patent: October 30, 1979
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yasuhisa Narutomi, Kesanao Kobayashi, Teruo Mori
  • Patent number: 4123279
    Abstract: A method for increasing the ink-receptivity of a light-sensitive planographic printing plate comprising a support having thereon a light-sensitive layer comprising an o-quinonediazide based light-sensitive material which is rendered alkali solution-soluble by irradiation of active light and a condensate of an aldehyde and a substituted phenol represented by the formula (I): ##STR1## wherein R.sub.1 and R.sub.2 each is a hydrogen atom, an alkyl group, or a halogen atom, and R.sub.3 is an alkyl group or a cycloalkyl group.
    Type: Grant
    Filed: January 4, 1977
    Date of Patent: October 31, 1978
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Kesanao Kobayashi