Patents by Inventor Kevin Barry Ray
Kevin Barry Ray has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6764807Abstract: A planographic printing member precursor comprises a first component, for example a hydroxy group containing polymer, and a second component which may be a siloxane or a compound of general formula (I), wherein M represents a silicon or a titanium atom and each of R1, R2, R3 and R4 is independently selected from hydrogen or halogen atoms; a hydroxy group; an optionally substituted alkyl, alkenyl or alkynyl group; an optionally substituted alkoxy group; or an optionally substituted saturated or unsaturated cyclic or heterocyclic group. On exposure, the second component reacts with the first component to define an oleophobic/hydrophilic material in exposed areas and in non-exposed areas the second component is removed, on processing of the precursor.Type: GrantFiled: September 5, 2001Date of Patent: July 20, 2004Assignee: Kodak Polychrome Graphics LLCInventors: Kevin Barry Ray, Mark John Spowage, Christopher David McCullough
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Patent number: 6673514Abstract: A thermally imagable article comprises a substrate on which is coated a positive working heat-sensitive composition comprising a hydroxyl group-containing polymer and a heat-labile moiety which decreases the developer solubility of the composition as compared to the developer solubility of the composition without the heat-labile moiety, wherein the heat-sensitive composition does not comprise an acid generating moiety. The invention also provides novel positive working compositions comprising heat-labile moieties, and imagable articles comprising said compositions.Type: GrantFiled: September 7, 2001Date of Patent: January 6, 2004Assignee: Kodak Polychrome Graphics LLCInventors: Anthony Paul Kitson, Diane Cook, Kevin Barry Ray, Colin Adrian Wright
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Publication number: 20030203187Abstract: A precursor that may be imaged by heat is made up of a substrate, for example a copper board, and a composite layer structure composed of two layers. Preferably, the first layer is composed of an aqueous developable polymer mixture containing a photothermal conversion material, which is contiguous to the substrate. The second layer of the composite is composed of one or more non-aqueous soluble polymers, which are soluble or dispersible in a solvent which does not dissolve the first layer. The precursor is exposed with an infrared laser or a thermal print head, and upon aqueous development, the exposed regions are removed, revealing regions of the substrate surface able to be etched or otherwise treated. The second layer may also contain a photothermal conversion material. Alternatively, the composite layer may be free of photothermal conversion material when thermal imaging is carried out using a thermal print head. The precursor may be used, for example, as a mask precursor or electronic part precursor.Type: ApplicationFiled: April 2, 2003Publication date: October 30, 2003Applicant: Kodak Polychrome Graphics,LLCInventors: Kevin Barry Ray, Anthony Paul Kitson
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Publication number: 20030190533Abstract: Imageable precursors for masks and for electronic parts comprise a polymeric layer applied to a substrate. The layer comprises at least one polymer having infra-red absorbing groups carried as pendent groups on the polymer backbone. Certain infrared absorbing groups may also act to insolubilize the polymer in a developer, until it is imagewise exposed to infra-red radiation. Imagewise application of heat, resulting from imagewise exposure of the precursor to infra-red radiation, renders the polymer layer more soluble in the developer than prior to exposure to the infra-red radiation.Type: ApplicationFiled: January 30, 2003Publication date: October 9, 2003Applicant: Kodak Polychrome Graphics, LLCInventors: Kevin Barry Ray, Anthony Paul Kitson, Eduard Kottmair, Hans-Horst Glatt, Stefan Hilgart
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Patent number: 6623905Abstract: A precursor for preparing a resist pattern comprises an imageable layer which includes a relatively volatile compound that can be volatilized by application of heat, wherein imaging radiation can be applied to the precursor to heat areas thereof and volatilizes said compound so that properties, for example, the ink accepting abilities of heated and non heated areas, are different.Type: GrantFiled: January 11, 2000Date of Patent: September 23, 2003Assignee: Kodak Polychrome Graphics LLCInventors: Kevin Barry Ray, Mark John Spowage
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Patent number: 6596469Abstract: A method of making a mask or an electronic part, for example a printed circuit, comprises the steps of delivering heat in a desired pattern to a precursor of the mask or electronic part, the precursor comprising a surface coated with a coating, the coating comprising a heat-sensitive composition itself comprising an aqueous developer soluble polymeric substance and a compound which reduces the aqueous developer solubility of the polymeric substance, wherein the aqueous developer solubility of the composition is not increased by incident UV radiation but is increased by the delivery of heat; then developing the precursor to remove the heat-sensitive composition in regions to which the heat was delivered. In the case of a printed circuit precursor the surface may be then etched in conventional manner to yield the required printed circuit.Type: GrantFiled: February 11, 2000Date of Patent: July 22, 2003Assignee: Kodak Polychrome Graphics, LLCInventors: Christopher David McCullough, Kevin Barry Ray, Alan Stanley Victor Monk, John David Riches, Anthony Paul Kitson, Gareth Rhodri Parsons, David Stephen Riley, Peter Andrew Reath Bennett, Richard David Hoare
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Publication number: 20030129528Abstract: A positive working printing form precursor comprises a thermally imagable composition which includes a hydroxyl group-containing polymer, for example a novolak resin. The composition has a weight of less than 1.1 gm−2. It has been found that using a low weight of the composition on the precursor improves the properties of the precursor, in particular by rendering the sensitivity of the precursor to imaging radiation less variable over time.Type: ApplicationFiled: November 7, 2002Publication date: July 10, 2003Applicant: Kodak Polychrome GraphicsInventors: Kevin Barry Ray, Peter Andrew Reath Bennett, Martyn Lott
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Publication number: 20030118949Abstract: A negative-working image forming process which comprises the steps of:Type: ApplicationFiled: December 13, 2001Publication date: June 26, 2003Applicant: Kodak Polychrome Graphics LLC, a corporation of the State of Connecticut.Inventors: Kevin Barry Ray, Anthony Paul Kitson
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Patent number: 6562527Abstract: A method of manufacturing a selectively relief-treated image member that comprises: (a) providing a precursor of the image member, the precursor comprising a surface having an image-forming layer comprising a photosensitive resist composition comprising: (i) a polymerizable material, and (ii) a binder; (b) delivering radiation image-wise to the precursor; (c) developing the precursor in a developer in order to selectively remove the image-forming layer in regions to which said radiation was not delivered image-wise in step (b); and (d) contacting the image-wise exposed precursor with a relief-treatment material, in order to selectively relief-treat regions of the surface of the precursor in which the image-forming layer was removed on development in step (c).Type: GrantFiled: August 17, 2001Date of Patent: May 13, 2003Assignee: Kodak Polychrome Graphics LLCInventors: Kevin Barry Ray, Hans-Horst Glatt, Ali Cam
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Patent number: 6558872Abstract: Imagable precursors for masks and for electronic parts comprise a polymeric layer applied to a substrate. The layer comprises at least one polymer having infra-red absorbing groups carried as pendent groups on the polymer backbone. Certain infra-red absorbing groups may also act to insolubilize the polymer in a developer, until it is imagewise exposed to infra-red radiation. Imagewise application of heat, resulting from imagewise exposure of the precursor to infra-red radiation, renders the polymer layer more soluble in the developer than prior to exposure to the infra-red radiation.Type: GrantFiled: September 9, 2000Date of Patent: May 6, 2003Assignee: Kodak Polychrome Graphics LLCInventors: Kevin Barry Ray, Anthony Paul Kitson, Eduard Kottmair, Hans-Horst Glatt, Stefan Hilgart
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Patent number: 6558787Abstract: A precursor which may be imaged by heat is made up of a substrate, for example a copper board, and a composite layer structure composed of two layers. Preferably, the first layer is composed of an aqueous developable polymer mixture containing a photothermal conversion material which is contiguous to the substrate. The second layer of the composite is composed of one or more non-aqueous soluble polymers which are soluble or dispersible in a solvent which does not dissolve the first layer. The precursor is exposed with an infrared laser or a thermal print head, and upon aqueous development, the exposed regions are removed, revealing regions of the substrate surface able to be etched or otherwise treated. The second layer may also contain a photothermal conversion material. Alternatively, the composite layer may be free of photothermal conversion material when thermal imaging is carried out using a thermal print head. The precursor may be used, for example, as a mask precursor or electronic part precursor.Type: GrantFiled: December 27, 1999Date of Patent: May 6, 2003Assignee: Kodak Polychrome Graphics LLCInventors: Kevin Barry Ray, Anthony Paul Kitson
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Patent number: 6558869Abstract: This invention is directed to a precursor for preparing a resist pattern by heat mode imaging, the precursor comprising a heat sensitive composition, the solubility of which in an aqueous alkaline developer is arranged to increase in heated areas, and a means for increasing the resistance of non-heated areas of the heat sensitive composition to dissolution in an aqueous alkaline developer (the “developer resistance means”), wherein said developer resistance means comprises one or more compounds selected from the group consisting of: (A) compounds which include a poly(alkylene oxide) unit; (B) siloxanes; and (C) esters, ethers and amides of polyhydric alcohols, wherein said heat-sensitive composition comprises an aqueous alkaline developer soluble polymeric substance (i.e. the “active polymer”) and a compound which reduces the aqueous alkaline developer solubility of the polymeric substance (i.e.Type: GrantFiled: April 25, 2000Date of Patent: May 6, 2003Assignee: Kodak Polychrome Graphics LLCInventors: Christopher David McCullough, Kevin Barry Ray, Alan Stanley Monk, John David Riches, Anthony Paul Kitson, Gareth Rhodri Parsons, David Stephen Riley, Peter Andrew Reath Bennett, Richard David Hoare, James Laurence Mulligan, John Andrew Hearson, Carole-Anne Smith, Stuart Bayes, Mark John Spowage
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Publication number: 20030077538Abstract: A thermally imagable article comprises a substrate on which is coated a positive working heat-sensitive composition comprising a hydroxyl group-containing polymer and a heat-labile moiety which decreases the developer solubility of the composition as compared to the developer solubility of the composition without the heat-labile moiety, wherein the heat-sensitive composition does not comprise an acid generating moiety. The invention also provides novel positive working compositions comprising heat-labile moieties, and imagable articles comprising said compositions.Type: ApplicationFiled: September 7, 2001Publication date: April 24, 2003Inventors: Anthony Paul Kitson, Diane Cook, Kevin Barry Ray, Colin Adrian Wright
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Patent number: 6551763Abstract: A composition used as a resist in the manufacture of electronic parts, for example printed circuits, and which is rendered soluble in a developer by pattemwise delivery of heat, comprises a polymer and optionally an infrared absorbing compound. However in contrast to conventional compositions no compound is present which alters the solubility of the polymer in an aqueous developer.Type: GrantFiled: June 2, 2000Date of Patent: April 22, 2003Assignee: Kodak Polychrome Graphics LLCInventors: Anthony Paul Kitson, Peter Andrew Reath Bennett, Christopher David McCullough, Stuart Bayes, Kevin Barry Ray
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Publication number: 20030073011Abstract: A method of manufacturing a selectively relief-treated image member comprises:Type: ApplicationFiled: August 17, 2001Publication date: April 17, 2003Inventors: Kevin Barry Ray, Hans-Horst Glatt, Ali Cam
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Patent number: 6537735Abstract: The invention is directed to a method for producing a predetermined resist pattern on a substrate. The method includes the patternwise application of infrared radiation to a precursor which contains the substrate, having a coating thereon, wherein the coating contains a positive working composition; and the development of the pattern using a developer. The composition contains a polymeric substance having functional groups Q thereon, such that the functionalized polymeric substance has the property that it is developer insoluble prior to delivery of infrared radiation and developer soluble thereafter.Type: GrantFiled: January 5, 2000Date of Patent: March 25, 2003Assignee: Kodak Polychrome Graphics LLCInventors: Christopher David McCullough, Kevin Barry Ray, Alan Stanley Victor Monk, Stuart Bayes, Mark John Spowage
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Patent number: 6524767Abstract: An imagable article comprises a thermally imagable coating on a substrate, the coating comprising a radiation absorbing compound and a metal compound which is thermally decomposable, to form a metal. The imagable article is imagewise exposed to electromagnetic radiation, which is converted to heat by the radiation absorbing compound. The imaged article is then subjected to a developer, and in regions that have been exposed the thermally decomposable metal compound is decomposed to elemental metal, and regions that have not been exposed dissolve in the developer leaving behind the regions of elemental metal.Type: GrantFiled: October 26, 2000Date of Patent: February 25, 2003Assignee: Kodak Polychrome Graphics LLCInventors: Kevin Barry Ray, Anthony Paul Kitson, Alan Stanley Victor Monk
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Publication number: 20020172874Abstract: The invention provides a lithographic printing for precursor having an imagable coating on an aluminum support, wherein the imagable coating comprises a polymeric substance comprising colorant groups, and wherein the aluminum support on which the coating is provided is anodized but not subsequently modified by means of a post-anodic treatment compound, and the coating does not comprise a colorant dye. The polymeric substance may also comprise pendent infra-red or developer dissolution inhibiting groups, and these groups may also be the colorant groups themselves.Type: ApplicationFiled: April 6, 2001Publication date: November 21, 2002Applicant: KODAK POLYCHROME GRAPHICS LLCInventors: Geoffrey Horne, Kevin Barry Ray, Alan Stanley Victor Monk, Stuart Bayes
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Patent number: 6461795Abstract: Phenolic resin compositions formulated for use in lithographic exposure processes are given a heat treatment at 40-90° C. for at least 4 hours shortly after their coating onto lithographic substrates, to produce lithographic printing forms. It is found that such a heat treatment improves later exposure processes, in particular by rendering the sensitivity of the compositions less variable, over time.Type: GrantFiled: April 25, 2000Date of Patent: October 8, 2002Assignee: Kodak Polychrome Graphics LLCInventors: Christopher David McCullough, Kevin Barry Ray, Alan Stanley Monk, John David Riches, Anthony Paul Kitson, Gareth Rhodri Parsons, David Stephen Riley
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Publication number: 20020136961Abstract: A method of making a mask or an electronic part, for example a printed circuit, comprises the steps of delivering heat in a desired pattern to a precursor of the mask or electronic part, the precursor comprising a surface coated with a coating, the coating comprising a heat-sensitive composition itself comprising an aqueous developer soluble polymeric substance and a compound which reduces the aqueous developer solubility of the polymeric substance, wherein the aqueous developer solubility of the composition is not increased by incident UV radiation but is increased by the said delivery of heat; then developing the precursor to remove heat-sensitive composition in regions to which the heat was delivered. In the case of a printed circuit precursor the surface may then be etched in conventional manner to yield the required printed circuit.Type: ApplicationFiled: February 11, 2000Publication date: September 26, 2002Inventors: Christopher David McCullough, Kevin Barry Ray, Alan Stanley, Victor Monk, John David Riches, Anthony Paul Kitson, Gareth Rhodri Parsons, David Stephen Riley, Peter Andrew, Reath Bennett