Abstract: Systems and methods for providing illumination suitable for imaging devices such as laser projection systems, wherein the illumination pattern is adjustable by modifying one or more characteristics of a controlled angle diffuser. In one embodiment, a highly collimated (e.g., laser light) beam is passed through a holographic diffuser to create a well defined cone angle for the light emanating from each point on the diffuser. This light is focused into an illumination image that is controlled by the prescription of the diffuser. In one embodiment, the diffuser can be positioned to alternately place different regions having different prescriptions in the optical path corresponding to the illumination image. In one embodiment, the diffuser can be continually moved to eliminate speckling and “worminess” in the illumination image.

Abstract: Systems and methods for providing illumination suitable for imaging devices such as laser projection systems, wherein the illumination pattern is adjustable by modifying one or more characteristics of a controlled angle diffuser. In one embodiment, a highly collimated (e.g., laser light) beam is passed through a holographic diffuser to create a well defined cone angle for the light emanating from each point on the diffuser. This light is focused into an illumination image that is controlled by the prescription of the diffuser. In one embodiment, the diffuser can be positioned to alternately place different regions having different prescriptions in the optical path corresponding to the illumination image. In one embodiment, the diffuser can be continually moved to eliminate speckling and “worminess” in the illumination image.

Abstract: An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly of light energy sources for emitting light energy onto a wafer. In particular, the present invention is directed to a heating device that contains at least one heating cone. The heating cone of the present invention includes a circular reflector that can be conically-shaped. A plurality of light energy sources are contained within the reflector. The light energy sources can be vertically oriented or can be tilted slightly towards the central axis of the heating cone. In this arrangement, it has been discovered that the heating cone produces a uniform irradiance distribution over a wafer being heated.