Patents by Inventor Kevin J. Dempsey

Kevin J. Dempsey has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SYSTEM AND METHOD FOR MOLDING SOFT FLUID-FILLED IMPLANT SHELLS
    Publication number: 20140203478
    Abstract: Systems and methods for molding shells for fluid-filled prosthetic implants, including spinning and rotating dip- or spray-mandrels during a devolatilization step to ensure an even covering. The mandrels may be spun during the dipping or spraying step, and/or afterward while a solvent evaporates until a gum state is formed. The techniques are particularly useful for forming hollow shells from silicone dispersions for soft implants, such as breast implants.
    Type: Application
    Filed: March 24, 2014
    Publication date: July 24, 2014
    Applicant: Allergan, Inc.
    Inventors: Feargal Judge, Kevin J. Dempsey
  • System and method for molding soft fluid-filled implant shells
    Patent number: 8703230
    Abstract: Systems and methods for molding shells for fluid-filled prosthetic implants, including spinning and rotating dip- or spray-mandrels during a devolatilization step to ensure an even covering. The mandrels may be spun during the dipping or spraying step, and/or afterward while a solvent evaporates until a gum state is formed. The techniques are particularly useful for forming hollow shells from silicone dispersions for soft implants, such as breast implants.
    Type: Grant
    Filed: April 22, 2013
    Date of Patent: April 22, 2014
    Assignee: Allergan, Inc.
    Inventors: Feargal Judge, Kevin J. Dempsey
  • SYSTEM AND METHOD FOR MOLDING SOFT FLUID-FILLED IMPLANT SHELLS
    Publication number: 20130234365
    Abstract: Systems and methods for molding shells for fluid-filled prosthetic implants, including spinning and rotating dip- or spray-mandrels during a devolatilization step to ensure an even covering. The mandrels may be spun during the dipping or spraying step, and/or afterward while a solvent evaporates until a gum state is formed. The techniques are particularly useful for forming hollow shells from silicone dispersions for soft implants, such as breast implants.
    Type: Application
    Filed: April 22, 2013
    Publication date: September 12, 2013
    Applicant: ALLERGAN, INC.
    Inventors: Feargal Judge, Kevin J. Dempsey
  • System and method for molding soft fluid-filled implant shells
    Patent number: 8431179
    Abstract: Systems and methods for molding shells for fluid-filled prosthetic implants, including spinning and rotating dip- or spray-mandrels during a devolatilization step to ensure an even covering. The mandrels may be spun during the dipping or spraying step, and/or afterward while a solvent evaporates until a gum state is formed. The techniques are particularly useful for forming hollow shells from silicone dispersions for soft implants, such as breast implants.
    Type: Grant
    Filed: November 19, 2009
    Date of Patent: April 30, 2013
    Assignee: Allergan, Inc.
    Inventors: Feargal D. Judge, Kevin J. Dempsey
  • SYSTEM AND METHOD FOR MOLDING SOFT FLUID-FILLED IMPLANT SHELLS
    Publication number: 20100178414
    Abstract: Systems and methods for molding shells for fluid-filled prosthetic implants, including spinning and rotating dip- or spray-mandrels during a devolatilization step to ensure an even covering. The mandrels may be spun during the dipping or spraying step, and/or afterward while a solvent evaporates until a gum state is formed. The techniques are particularly useful for forming hollow shells from silicone dispersions for soft implants, such as breast implants.
    Type: Application
    Filed: November 19, 2009
    Publication date: July 15, 2010
    Applicant: ALLERGAN, INC.
    Inventors: Feargal D. Judge, Kevin J. Dempsey
  • Internal gettering in SIMOX SOI silicon substrates
    Patent number: 7294561
    Abstract: The present invention provides methods for forming SOI wafers having internal gettering layers for sequestering metallic impurities. More particularly, in one embodiment of the invention, a plurality of sites for sequestering metallic impurities are formed in a silicon substrate by implanting a selected dose of oxygen ions therein. In one embodiment, an epitaxial layer of crystalline silicon is formed over the substrate, and a buried continuous oxide layer is generated in the epitaxial layer, for example, by employing a SIMOX process.
    Type: Grant
    Filed: August 14, 2003
    Date of Patent: November 13, 2007
    Assignee: Ibis Technology Corporation
    Inventors: Yuri Erokhin, Kevin J. Dempsey