Abstract: Describes a multifocal optical article, e.g., an ophthalmic article such as a lens, in which the article includes (1) a rigid optical substrate, e.g., a transparent polymeric substrate, such as a thermoset or thermoplastic substrate, adapted to possess at least one light influencing property on at least a portion of at least one surface of the substrate, e.g., a photochromic and/or polarizing layer, and (2) a multifocal layer of an optical quality material on said substrate having the light influencing property. Describes also the aforedescribed optical article having an abrasion-resistant coating on the multifocal layer, e.g., an abrasion-resistant coating comprising an organo silane. A method for preparing the multifocal optical article comprising curing optical quality material between a multifocal mold and a preform comprising an optical substrate possessing the light influencing property is also described.

Abstract: Described is a polymerizable composition of a photochromic amount of at least one photochromic compound, at least one material having at least one carbonate group and at least one hydroxyl group, and at least one monoisocyanate containing material having at least one unsaturated group. The polymerizable composition optionally contains copolymerizable monomers. Also described are photochromic polymerizates, e.g., photochromic optical elements such as ophthalmic lenses, prepared from the polymerizable composition of the present invention.

Abstract: Described is a photochromic article that includes a substrate and at least a partial coating of an at least partially cured polymerizable composition of a photochromic amount of at least one photochromic compound, at least one material having at least one carbonate group and at least one hydroxyl group, and at least one monoisocyanate containing material having at least one unsaturated group. Also described are photochromic optical elements such as ophthalmic lenses, prepared from an optical element substrate coated with the photochromic polymerizable composition.

Abstract: Describes a photochromic article, e.g., a plastic ophthalmic photochromic article, such as a lens, in which the article includes (1) a rigid substrate, such as a thermoset or thermoplastic polymeric substrate, (2) a photochromic polymeric coating appended to at least one surface of the substrate, the photochromic polymeric coating containing a photochromic amount of at least one photochromic material, e.g., spirooxazine, naphthopyran and/or fulgide, and (3) an acrylate-based film coherently appended to the photochromic coating, the acrylate-based film containing an adhesion promoting amount of an adhesion promoter, e.g., an aminoorganosilane, silane coupling agent, organic titanate coupling agent or organic zirconate coupling agent. Describes also the aforedescribed photochromic article having an abrasion-resistant coating affixed to the acrylate-based film, e.g.

Abstract: Described is a photochromic polymer composition including the reaction product of at least one polymerizable photochromic material and at least one other copolymerizable material having a glass transition temperature of less than 23° C. upon polymerization. The photochromic polymer composition is adapted to provide an increased Fade Half Life in the Photochromic Polymer Performance Test as compared to the same photochromic compound used in the reaction product, but free of polymerizable groups. Also described are photochromic articles including the photochromic polymer composition.

Abstract: Described is a photochromic article that includes a substrate and at least a partial coating of an at least partially cured polymerizable composition of a photochromic amount of at least one photochromic compound, at least one material having at least one carbonate group and at least one hydroxyl group, and at least one monoisocyanate containing material having at least one unsaturated group. Also described are photochromic optical elements such as ophthalmic lenses, prepared from an optical element substrate coated with the photochromic polymerizable composition.

Abstract: Described is a polymerizable composition of a photochromic amount of at least one photochromic compound, at least one material having at least one carbonate group and at least one hydroxyl group, and at least one monoisocyanate containing material having at least one unsaturated group. The polymerizable composition optionally contains copolymerizable monomers. Also described are photochromic polymerizates, e.g., photochromic optical elements such as ophthalmic lenses, prepared from the polymerizable composition of the present invention.

Abstract: Described are articles having an aminoplast resin photochromic coating prepared from an aminoplast resin, components(s) having hydroxyl functional groups and photochromic substances. The coatings exhibit a Fischer microhardness of from 45 to 180 Newtons per mm2 and desirable photochromic properties, i.e., the formation of darker activated colors and faster rates of photochromic activation and fade when irradiated with ultraviolet light. Also described are photochromic aminoplast resin articles.

Abstract: Described are articles having an aminoplast resin photochromic coating prepared from an aminoplast resin, component(s) having at least two different functional groups and photochromic substances. The coatings exhibit a Fischer microhardness of from 45 to 180 Newtons per mm2 and desirable photochromic properties, i.e., the formation of darker activated colors and faster rates of photochromic activation and fade when irradiated with ultraviolet light. Also described are photochromic aminoplast resin articles.

Abstract: Described is a process for producing an adherent organic polymeric layer on organic polymeric substrates following the steps of (a) treating the surface of the polymeric substrate to provide reactive groups; (b) applying to the treated surface a polymerizable composition of a surface modifying amount of an organofunctional silane, a catalyzing amount of material which generates acid upon exposure to actinic radiation, and a solvating amount of solvent; (c) exposing the coated surface to an adhesion improving amount of actinic radiation; and (d) applying and curing a photochromic or non-photochromic polymer-forming composition on the coated surface. Also described are articles produced by the process.

Abstract: Described is a process for producing adherent layer(s) on organic polymeric substrates following the steps of (a) treating the surface of the polymeric substrate to provide reactive groups; (b) applying to the surface a polymerizable composition of organic anhydrides, isocyanates and/or a mixture thereof that is substantially free of organosiloxanes; and (c) curing the polymerizable coating. Further steps include applying an additional layer which is substantially free of organosiloxanes and that may or may not contain the polymerizable composition of the present invention. Also described are products produced by the process that may be transparent, tinted, tinted and polarized or photochromic.

Abstract: Described are novel photochromic polyalkoxylated naphthopyran compounds, examples of which are certain 2H-naphtho?1,2-b!pyrans, 3H-naphtho?2,1-b!pyrans and indeno?2,1-f!naphtho?1,2-b!pyrans, each having at least one polyalkoxylated substituent of from 2 to 50 alkoxy units per substituent. Specific substituents may also be present on the naphtho, indeno and pyrano portions of the compounds.

Abstract: A trench capacitor with a buried plate is formed with a single etching process by the expedient of filling the trench so formed and lined with diffusion source material with resist by baking and reflowing the resist which also serves to adjust exposure sensitivity of the resist such that exposure and development of the resist removes the resist to a repeatable and uniform depth. Remaining resist allows etching of the diffusion source layer to a very accurate dimension. Thus only a readily formed oxide or TECS layer is needed to confine impurities during diffusion to form the buried plate. An isolation collar can be formed after recess of the fill to avoid formation of step corners and erosion of the isolation collar by repeated fill and etch back processes while permitting maximum capacitance to be achieved for a given trench "footprint".

Abstract: An ultraviolet light sensitive photoinitiator composition that includes at least one anthracene derivative represented by the formula: ##STR1## wherein X is CH.dbd.CH.sub.2 or --(--CH.sub.2 --)--.sub.n O--(--R) with R being H or ##STR2## wherein each R.sup.I, R.sup.II and R.sup.III individually is selected from the group of alkyl, alkenyl, aryl, ##STR3## wherein each R.sup.IV, R.sup.V and R.sup.VI individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and is n being 1 to 2; and onium salt; and an organic solvent. The composition is used for cationic polymerization of cationic polymerizable materials including in the formation of a pattern of a photoresist. Also certain novel epoxy-functionalized organosilicons are provided that are sensitive to radiation including E-beam radiation and exhibit resistance to oxygen reactive ion etching.

Abstract: An ultraviolet light sensitive photoinitiator composition that includes at least one anthracene derivative represented by the formula: ##STR1## wherein X is CH.dbd.CH.sub.2 or --(--CH.sub.2 --)--.sub.n O--(--R) with R being H or ##STR2## wherein each R.sup.I, R.sup.II and R.sup.III individually is selected from the group of alkyl, alkenyl, aryl, ##STR3## wherein each R.sup.IV, R.sup.V and R.sup.VI individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and is n being 1 to 2; and onium salt; and an organic solvent. The composition is used for cationic polymerization of cationic polymerizable materials including in the formation of a pattern of a photoresist. Also certain novel epoxy-functionalized organosilicons are provided that are sensitive to radiation including E-beam radiation and exhibit resistance to oxygen reactive ion etching.

Abstract: An ultraviolet light sensitive photoinitiator composition that includes at least one anthracene derivative represented by the formula: ##STR1## wherein X is CH.dbd.CH.sub.2 or --(--CH.sub.2 --)--.sub.n O--(--R) with R being H or ##STR2## wherein each R.sup.I, R.sup.II and R.sup.III individually is selected from the group of alkyl, alkenyl, aryl, ##STR3## wherein each R.sup.IV, R.sup.V and R.sup.VI individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and is n being 1 to 2; and onium salt; and an organic solvent. The composition is used for cationic polymerization of cationic polymerizable materials including in the formation of a pattern of a photoresist. Also certain novel epoxy-functionalized organosilicons are provided that are sensitive to radiation including E-beam radiation and exhibit resistance to oxygen reactive ion etching.

Abstract: An ultraviolet light sensitive photoinitiator composition that includes at least one anthracene derivative represented by the formula: ##STR1## wherein X is CH.dbd.CH.sub.2 or --(--CH.sub.2 --)--.sub.n O--(--R) with R being H or ##STR2## wherein each R.sup.I, R.sup.II and R.sup.III individually is selected from the group of alkyl, alkenyl, aryl, ##STR3## wherein each R.sup.IV, R.sup.V and R.sup.VI individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and is n being 1 to 2; and onium salt; and an organic solvent. The composition is used for cationic polymerization of cationic polymerizable materials including in the formation of a pattern of a photoresist. Also certain novel epoxy-functionalized organosilicons are provided that are sensitive to radiation including E-beam radiation and exhibit resistance to oxygen reactive ion etching.

Abstract: A composition containing a polymeric material obtained by interreacting an epoxy-novolak polymer with an organosilicon compound, a radiation sensitive onium salt, and a near U.V. sensitizer.