Patents by Inventor Kevin Wenzel
Kevin Wenzel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11917944Abstract: An outdoor power equipment includes a frame, a cutting deck supported by the frame, a first ground-engaging element coupled to a first portion of the frame, a second ground-engaging element coupled to a second portion of the frame, a suspension system having a first end coupled to the frame and a second end opposite the first end, and an operator platform movable with the suspension system with respect to the frame. The operator platform includes a seat coupled to the second end of the suspension system and a footrest pivotably coupled to the second end of the suspension system.Type: GrantFiled: July 15, 2022Date of Patent: March 5, 2024Assignee: Ariens CompanyInventors: Chris T. Forrest, Kevin A. Spatchek, Courtney Wenzel, Brent P. Berglund
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Publication number: 20230140789Abstract: The present disclosure describes providing robust network connectivity by creating a virtual overlay network over a plurality of communication network channels, such that if there is a failover on a first network, a failover overlay tunnel may be used to prevent an interruption in service when the first network drops. An SD-WAN remote may be deployed at an edge location of a network and an SD-WAN base may be installed at a client premises. A first overlay tunnel using a first communication transport may be utilized as a default route and a second overlay tunnel using a second communication transport may be used as a failover route.Type: ApplicationFiled: September 1, 2022Publication date: May 4, 2023Applicant: Level 3 Communications, LLCInventor: Kevin WENZEL
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Patent number: 11367598Abstract: A vacuum pumping line plasma source is provided. The plasma source includes a body defining a generally cylindrical interior volume extending along a central longitudinal axis. The body has an input port for coupling to an input pumping line, an output port for coupling to an output pumping line, and an interior surface disposed about the generally cylindrical interior volume. The plasma source also includes a supply electrode disposed adjacent to a return electrode, and a barrier dielectric member, a least a portion of which is positioned between the supply electrode and the return electrode. The plasma source further includes a dielectric barrier discharge structure formed from the supply electrode, the return electrode, and the barrier dielectric member. The dielectric barrier discharge structure is adapted to generate a plasma in the generally cylindrical interior volume.Type: GrantFiled: November 30, 2020Date of Patent: June 21, 2022Assignee: MKS Instruments, Inc.Inventors: Gordon Hill, Scott Benedict, Kevin Wenzel
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Patent number: 11222770Abstract: A microwave system has a solid-state generator which generates microwave energy and includes at least one control input for receiving a control signal to vary electrically a parameter of the microwave energy. A microwave load receives the microwave energy and produces an effect in response to the microwave energy. A microwave conducting element couples the microwave energy to the microwave load. An impedance match adjusting device is coupled to the microwave conducting element to vary at least one of the parameters of the microwave energy. The effect produced in response to the microwave energy is altered by both electrical variation of the parameter of the microwave energy via the control signal and adjustment of the impedance match adjusting device to vary the parameter of the microwave energy.Type: GrantFiled: August 14, 2020Date of Patent: January 11, 2022Assignee: MKS INSTRUMENTS, INC.Inventors: Mohammad Kamarehi, Ken Trenholm, Colin Sanford, Kevin Wenzel, Olivia Keller
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Patent number: 11024489Abstract: A method is provided for cleaning a pumping line having a plurality of inline plasma sources coupled thereto. The method includes supplying a cleaning gas to the pumping line from a wafer processing chamber connected to the pumping line. The method also includes generating a localized plasma at one or more of the plurality of inline plasma sources using the cleaning gas flowing in the pumping line. Each localized plasma is adapted to clean at least a portion of the pumping line. The method further includes determining one or more impedances of the localized plasma at the one or more inline plasma sources and monitoring the one or more impendences to detect an endpoint of the cleaning.Type: GrantFiled: November 11, 2019Date of Patent: June 1, 2021Assignee: MKS Instruments, Inc.Inventors: Gordon Hill, Scott Benedict, Kevin Wenzel
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Publication number: 20210082672Abstract: A vacuum pumping line plasma source is provided. The plasma source includes a body defining a generally cylindrical interior volume extending along a central longitudinal axis. The body has an input port for coupling to an input pumping line, an output port for coupling to an output pumping line, and an interior surface disposed about the generally cylindrical interior volume. The plasma source also includes a supply electrode disposed adjacent to a return electrode, and a barrier dielectric member, a least a portion of which is positioned between the supply electrode and the return electrode. The plasma source further includes a dielectric barrier discharge structure formed from the supply electrode, the return electrode, and the barrier dielectric member. The dielectric barrier discharge structure is adapted to generate a plasma in the generally cylindrical interior volume.Type: ApplicationFiled: November 30, 2020Publication date: March 18, 2021Inventors: Gordon Hill, Scott Benedict, Kevin Wenzel
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Patent number: 10910798Abstract: An apparatus and method for determining the health of a plasma system by igniting a plasma within a plasma confining volume generate an ignition signal with an ignition circuit and apply the ignition signal between a biased region and a grounded region in the vicinity of the plasma confining volume. A parameter in the ignition circuit is sensed, and the sensed parameter is compared to a first parameter threshold. A condition associated with the plasma confining volume is determined if the sensed parameter differs from the first voltage threshold, and a corrective action can be taken.Type: GrantFiled: November 13, 2019Date of Patent: February 2, 2021Assignee: MKS Instruments, Inc.Inventors: Atul Gupta, Colin Sanford, Joshua Lamontagne, Kevin Wenzel
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Publication number: 20210005430Abstract: A microwave system has a solid-state generator which generates microwave energy and includes at least one control input for receiving a control signal to vary electrically a parameter of the microwave energy. A microwave load receives the microwave energy and produces an effect in response to the microwave energy. A microwave conducting element couples the microwave energy to the microwave load. An impedance match adjusting device is coupled to the microwave conducting element to vary at least one of the parameters of the microwave energy. The effect produced in response to the microwave energy is altered by both electrical variation of the parameter of the microwave energy via the control signal and adjustment of the impedance match adjusting device to vary the parameter of the microwave energy.Type: ApplicationFiled: August 14, 2020Publication date: January 7, 2021Applicant: MKS Instruments, Inc.Inventors: Mohammad Kamarehi, Ken Trenholm, Colin Sanford, Kevin Wenzel, Olivia Keller
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Patent number: 10790118Abstract: A microwave system has a solid-state generator which generates microwave energy and includes at least one control input for receiving a control signal to vary electrically a parameter of the microwave energy. A microwave load receives the microwave energy and produces an effect in response to the microwave energy. A microwave conducting element couples the microwave energy to the microwave load. An impedance match adjusting device is coupled to the microwave conducting element to vary at least one of the parameters of the microwave energy. The effect produced in response to the microwave energy is altered by both electrical variation of the parameter of the microwave energy via the control signal and adjustment of the impedance match adjusting device to vary the parameter of the microwave energy.Type: GrantFiled: March 16, 2017Date of Patent: September 29, 2020Assignee: MKS Instruments, Inc.Inventors: Mohammad Kamarehi, Ken Trenholm, Colin Sanford, Kevin Wenzel, Olivia Keller
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Publication number: 20200099199Abstract: An apparatus and method for determining the health of a plasma system by igniting a plasma within a plasma confining volume generate an ignition signal with an ignition circuit and apply the ignition signal between a biased region and a grounded region in the vicinity of the plasma confining volume. A parameter in the ignition circuit is sensed, and the sensed parameter is compared to a first parameter threshold. A condition associated with the plasma confining volume is determined if the sensed parameter differs from the first voltage threshold, and a corrective action can be taken.Type: ApplicationFiled: November 13, 2019Publication date: March 26, 2020Applicant: MKS Instruments, Inc.Inventors: Atul Gupta, Colin Sanford, Joshua Lamontagne, Kevin Wenzel
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Publication number: 20200075298Abstract: A vacuum pumping line plasma source is provided. The plasma source includes a body defining a generally cylindrical interior volume extending along a central longitudinal axis. The body has an input port for coupling to an input pumping line, an output port for coupling to an output pumping line, and an interior surface disposed about the generally cylindrical interior volume. The plasma source also includes a supply electrode disposed adjacent to a return electrode, and a barrier dielectric member, a least a portion of which is positioned between the supply electrode and the return electrode. The plasma source further includes a dielectric barrier discharge structure formed from the supply electrode, the return electrode, and the barrier dielectric member. The dielectric barrier discharge structure is adapted to generate a plasma in the generally cylindrical interior volume.Type: ApplicationFiled: November 11, 2019Publication date: March 5, 2020Inventors: Gordon Hill, Scott Benedict, Kevin Wenzel
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Patent number: 10535506Abstract: A vacuum pumping line plasma source is provided. The plasma source includes a body defining a generally cylindrical interior volume extending along a central longitudinal axis. The body has an input port for coupling to an input pumping line, an output port for coupling to an output pumping line, and an interior surface disposed about the generally cylindrical interior volume. The plasma source also includes a supply electrode disposed adjacent to a return electrode, and a barrier dielectric member, a least a portion of which is positioned between the supply electrode and the return electrode. The plasma source further includes a dielectric barrier discharge structure formed from the supply electrode, the return electrode, and the barrier dielectric member. The dielectric barrier discharge structure is adapted to generate a plasma in the generally cylindrical interior volume.Type: GrantFiled: January 12, 2017Date of Patent: January 14, 2020Assignee: MKS Instruments, Inc.Inventors: Gordon Hill, Scott Benedict, Kevin Wenzel
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Patent number: 10505348Abstract: An apparatus and method for determining the health of a plasma system by igniting a plasma within a plasma confining volume generate an ignition signal with an ignition circuit and apply the ignition signal between a biased region and a grounded region in the vicinity of the plasma confining volume. A parameter in the ignition circuit is sensed, and the sensed parameter is compared to a first parameter threshold. A condition associated with the plasma confining volume is determined if the sensed parameter differs from the first voltage threshold, and a corrective action can be taken.Type: GrantFiled: September 15, 2017Date of Patent: December 10, 2019Assignee: MKS Instruments, Inc.Inventors: Atul Gupta, Colin Sanford, Joshua Lamontagne, Kevin Wenzel
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Publication number: 20190089135Abstract: An apparatus and method for determining the health of a plasma system by igniting a plasma within a plasma confining volume generate an ignition signal with an ignition circuit and apply the ignition signal between a biased region and a grounded region in the vicinity of the plasma confining volume. A parameter in the ignition circuit is sensed, and the sensed parameter is compared to a first parameter threshold. A condition associated with the plasma confining volume is determined if the sensed parameter differs from the first voltage threshold, and a corrective action can be taken.Type: ApplicationFiled: September 15, 2017Publication date: March 21, 2019Applicant: MKS Instruments, Inc.Inventors: Atul Gupta, Colin Sanford, Joshua Lamontagne, Kevin Wenzel
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Publication number: 20180269037Abstract: A microwave system has a solid-state generator which generates microwave energy and includes at least one control input for receiving a control signal to vary electrically a parameter of the microwave energy. A microwave load receives the microwave energy and produces an effect in response to the microwave energy. A microwave conducting element couples the microwave energy to the microwave load. An impedance match adjusting device is coupled to the microwave conducting element to vary at least one of the parameters of the microwave energy. The effect produced in response to the microwave energy is altered by both electrical variation of the parameter of the microwave energy via the control signal and adjustment of the impedance match adjusting device to vary the parameter of the microwave energy.Type: ApplicationFiled: March 16, 2017Publication date: September 20, 2018Applicant: MKS Instruments, Inc.Inventors: Mohammad Kamarehi, Ken Trenholm, Colin Sanford, Kevin Wenzel, Olivia Keller
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Publication number: 20180195196Abstract: A method is introduced for creating a protective oxide layer over a surface of a metallic structure for use in a semiconductor processing system. The method includes providing the metallic structure, anodizing the surface of the metallic structure to form an anodization layer on the surface, and converting, using a plasma electrolytic oxidation process, at least a portion of the anodization layer to form the protective oxide layer.Type: ApplicationFiled: January 6, 2017Publication date: July 12, 2018Inventors: Chiu-Ying Tai, Atul Gupta, Kevin Wenzel, Glenn Stanton
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Publication number: 20170200591Abstract: A vacuum pumping line plasma source is provided. The plasma source includes a body defining a generally cylindrical interior volume extending along a central longitudinal axis. The body has an input port for coupling to an input pumping line, an output port for coupling to an output pumping line, and an interior surface disposed about the generally cylindrical interior volume. The plasma source also includes a supply electrode disposed adjacent to a return electrode, and a barrier dielectric member, a least a portion of which is positioned between the supply electrode and the return electrode. The plasma source further includes a dielectric barrier discharge structure formed from the supply electrode, the return electrode, and the barrier dielectric member. The dielectric barrier discharge structure is adapted to generate a plasma in the generally cylindrical interior volume.Type: ApplicationFiled: January 12, 2017Publication date: July 13, 2017Inventors: Gordon Hill, Scott Benedict, Kevin Wenzel
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Publication number: 20060124867Abstract: An ion beam current density profiler includes a pair of counter-rotating cylindrical masks each featuring a helical slot. The intersection of the slots forms an aperture that scans the width of a ribbon ion beam to allow discrete portions of the beam to impact an inner, concentric current collecting cylinder.Type: ApplicationFiled: December 15, 2004Publication date: June 15, 2006Inventors: Bo Vanderberg, Michael Cristoforo, Kevin Wenzel
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Publication number: 20060017010Abstract: An ion beam implanter includes an ion beam source for generating an ion beam moving along a beam line and a vacuum or implantation chamber wherein a workpiece, such as a silicon wafer is positioned to intersect the ion beam for ion implantation of a surface of the workpiece by the ion beam. A scanning magnet is most preferably used to control a side to side scanning of the ion beam so that an entire implantation surface of the workpiece can be processed.Type: ApplicationFiled: July 22, 2004Publication date: January 26, 2006Inventors: Bo Vanderberg, Kevin Wenzel, Robert Rathmell, Joseph Ferrara, David Sabo
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Publication number: 20050023487Abstract: Ion implantation systems and beam containment apparatus therefor are provided in which a photoelectron source and a photon source are provided along a beam path. The photon source, such as a UV lamp, provides photons to a photoemissive material of the photoelectron source to generate photoelectrons for enhanced beam containment in the ion implantation system.Type: ApplicationFiled: July 31, 2003Publication date: February 3, 2005Inventors: Kevin Wenzel, Bo Vanderberg