Abstract: Disclosed are a light emitting device and a manufacturing method thereof. A trench portion is formed on a substrate of a light emitting device, and a buffer layer, an n-contact layer, and an active layer are sequentially deposited on the trench portion thereby to increase a light emitting area of the active layer. According to this, a light emitting efficiency is increased, and light of a high brightness can be obtained with a substrate of the same size thereby to reduce a production cost.

Abstract: Disclosed are an optical pickup module and a manufacturing method thereof. The manufacturing method of an optical pickup module comprises the steps of: forming a wet-etching mask layer at an outer portion of an upper surface of a silicon substrate to be used as a sub mount; etching a middle portion of the silicon substrate by using the wet-etching mask layer thereby forming a cavity, forming an inclination surface at the etched portion, and then removing the wet-etching mask layer; forming an insulating layer on an entire upper surface of the silicon substrate; forming an electrode layer on an upper surface of the insulating layer; forming adhesive layers at a part of an upper surface of the electrode layer; and arranging a light emitting device at an upper surface of one adhesive layer and arranging an MPD at an upper surface of another adhesive layer by a fixation thereby completing an optical pickup module.

Abstract: An optical receiver and an optical transmitter and a producing method thereof using a variable optical attenuator includes a base member formed in a predetermined shape; an input optical fiber emitting an optical signal toward the base member; an optical receiving means provided at one side of the base member, and receiving an optical signal; and a variable optical attenuator actuated by an electrostatic force, changing a path of laser emitted from the input optical fiber, and thus adjusting optical power made to be incident to the optical receiving means. Positions of the input optical fiber and the optical receiving means can be changed, and the variable optical attenuator can be produced by a MEMS technology so that the variable optical attenuator can be produced with a low unit price, actuated with small electric power, and can transmit an accurate optical signal.

Abstract: Etching method applicable to a semiconductor device fabrication and an MEMS(Micro-Electro-Mechanical System) process, including the steps of forming an etching mask on a substrate, forming a plurality of patterns in the etching mask corresponding to depths of the plurality of trenches; and etching the substrate using the etching mask having the plurality of patterns formed therein, whereby eliminating an alignment error in respective photolithography, that permits to form a precise structure, simplify a fabrication process, and reduce a production cost.

Abstract: Light source module with two wavelengths including a first and a second laser diodes each for emitting a laser beam with a wavelength different from each other, and a submount formed between the first and second laser diodes having a vertical mirror surface vertical to bonding surfaces of the first and second laser diodes for reflecting laser beams from the first and second laser diodes in a same direction.

Abstract: Etching method applicable to a semiconductor device fabrication and an MEMS(Micro-Electro-Mechanical System) process, including the steps of forming an etching mask on a substrate, forming a plurality of patterns in the etching mask corresponding to depths of the plurality of trenches; and etching the substrate using the etching mask having the plurality of patterns formed therein, whereby eliminating an alignment error in respective photolithography, that permits to form a precise structure, simplify a fabrication process, and reduce a production cost.

Abstract: Disclosed are X-ray masks exhibiting improved stability and reliability of the X-ray masks, and methods of making these masks. The X-ray masks include a membrane, an X-ray absorber pattern on the membrane, which is formed on a top side of a substrate, or an oxide layer between the membrane and the X-ray absorber pattern.

Abstract: X-ray absorber in an X-ray mask and a method for manufacturing the same which includes a first layer of crystalline phase formed on a predetermined portion of the surface of a membrane and a second layer of amorphous phase formed on the first layer.

Abstract: A method of fabricating an X-ray mask includes the steps of forming a membrane on a substrate, forming a first material on the membrane, implanting predetermined ions into the first material, planarizing the membrane by removing a part of the first material and membrane, forming an absorber on the membrane planarized and depositing a second material on the absorber, implanting predetermined ions into the second material, planarizing the absorber by removing a part of the second material and membrane, and patterning the absorber planarized to have a predetermined shape.