Abstract: Example embodiments of the inventive concepts provide a polishing pad-measuring apparatus and a chemical mechanical polishing facility using the same. The polishing pad-measuring apparatus includes a foreign material-removing part for removing a foreign material disposed in grooves extending from one surface of a polishing pad toward another surface, opposite to the one surface, of the polishing pad, and a distance measuring part for measuring depths of the grooves from which the foreign material is removed.

Abstract: Disclosed are a method of predicting mature microRNA regions using a bidirectional hidden Markov model and a medium recording a computer program to implement the method. The method includes representing each base pair comprising the microRNA precursor by state information of match, mismatch and bulge states; representing the base pair by a basepair emission symbol; computing a Viterbi probability (P) for microRNA using a probability (Es(q)) that state s emits symbol q and a transition probability (Tab) from state a to state b; computing a Viterbi probability (Pt(i)) that the i-th base pair is true and another Viterbi probability (Pf(i)) that the i-th base pair is false; and computing a position probability (S(i)) for mature microRNA using the Viterbi probability, wherein, if the position probability (S(i)) for mature microRNA is greater than a predetermined value, the position at which the base pair is present is taken as the mature microRNA region.