Patents by Inventor Kie Hyung Chung

Kie Hyung Chung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080313954
    Abstract: A method for producing biofuel using an electron beam is disclosed. The method for producing biofuel includes: irradiating an electron beam to the vegetable polymer to decompose and sterilize the vegetable polymer, thereby promoting conversion of the vegetable polymer to biomass compared to the traditional methods.
    Type: Application
    Filed: April 21, 2008
    Publication date: December 25, 2008
    Inventors: Kang Ok Lee, Kie Hyung Chung
  • Patent number: 6457778
    Abstract: An electro-power impact cell used in blasting works includes a first electrode to which a high voltage is applied, the first electrode having a plurality of conductive piece between which nonconductive pieces are disposed so that when the high voltage is applied to the first electrode, arc occur at the nonconductive piece; a second electrode spaced away from the first electrode; and a closed-cartridge enclosing the first and second electrodes while containing electrolyte.
    Type: Grant
    Filed: March 1, 2000
    Date of Patent: October 1, 2002
    Assignee: Korea Accelerator and Plasma Research Association
    Inventors: Kie Hyung Chung, Kang Ok Lee, Hyeok Jung Kwon, Chul Yeong Kim, Kyoung Jae Chung
  • Patent number: 6455808
    Abstract: A pulse power system includes an energy storing device for storing electric energy; a high power arc switch comprising: a cylindrical housing having a central axis and defining a predetermined discharging region; a first electrode disposed within the cylindrical housing to be movable in a direction of the central axis; a second electrode disposed within the cylindrical housing and spaced away from the first electrode at a predetermined distance, an arc generating between the first and second electrodes as the first electrode approaches the second electrode; an insulating member formed at a portion between the first and second electrodes except for the discharging region; and a solenoid coil for forming a magnetic field within the discharging region in a direction of the central axis, the arc formed between the first and second electrodes being spirally moved in a direction of the central axis by a magnetic field formed in a circular direction by the arc and the magnetic field formed by the solenoid coil in th
    Type: Grant
    Filed: March 1, 2000
    Date of Patent: September 24, 2002
    Assignee: Korea Accelerator and Plasma Research Association
    Inventors: Kie Hyung Chung, Kang Ok Lee, Hyeok Jung Kwon, Chul Yeong Kim, Kyoung Jae Chung
  • Patent number: 6327339
    Abstract: An industrial X-ray/electron beam source includes an accelerator having a) a coaxial cavity b) an electron gun for emitting an electron beam to be accelerated, c) at least one deflection magnet positioned outside of the cavity, and d) a radio frequency power supply means for supplying power of a radio frequency to the cavity to induce TM010 mode as an accelerating mode in the cavity; and a beam irradiator having a two-dimensional scanning magnet which deflects accelerated beam by the accelerator, an extracting window for extracting the deflected electron beam to be irradiated to an object, and means for guiding the deflected beam toward a center of the extracting window in a radial direction. The source is advantageous in that the electron beams do not intersect inside the cavity, which can reduce beam loss, and that beams or X-rays are irradiated to the object spatially uniformly.
    Type: Grant
    Filed: November 29, 1999
    Date of Patent: December 4, 2001
    Inventors: Kie Hyung Chung, Kang Ok Lee, Hyeok Jung Kwon, Sang Ho Kim
  • Patent number: 5853521
    Abstract: A multi-cathode electron beam plasma etcher is disclosed. The multi-cathode electron beam plasma etcher is comprised of: a vacuum chamber; several cathodes which are installed in the upper end of the upper part of the chamber and generates an electron beam in order to generate plasma in a large area; an acceleration electrode and a deceleration electrode which, form an acceleration and a deceleration tube structure in order to withdraw much of the electron beam, are arranged sequentially from the front of the cathode, and form an electrostatic lens when the differential voltage is applied respectively; first vacuum evacuation device to made the upper part of the chamber vacuum; an etching gas injection device which is installed in the side wall around the upper end of the lower part of the chamber; second vacuum evacuation device which is installed in the lower part of the chamber; and a holder of the etched body which is installed in the lower part of the chamber.
    Type: Grant
    Filed: January 16, 1996
    Date of Patent: December 29, 1998
    Assignees: Soosan Precision Co., Ltd., Korean Accelerator & Plasma Research Association
    Inventors: Kie-hyung Chung, Kil-ju Yun, Sang-young Kim, Tae-Young Kim