Patents by Inventor Kien Yew Liang

Kien Yew Liang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8771430
    Abstract: A method for drying a workpiece using an apparatus comprising a liquid bath for immersing said workpiece, a deionized water supply for supplying deionized water to said bath, a partially enclosed volume of heated inert gas located above said liquid bath and a heated inert gas supply for supplying heated inert gas. A first holder is used for holding said workpiece in said liquid bath with a vertical orientation between the first holder and said liquid bath and a second holder, comprising a horizontal member, that is able to hold said at least one workpiece in such a way as to substantially prevent said workpiece from sliding along said horizontal member.
    Type: Grant
    Filed: September 17, 2013
    Date of Patent: July 8, 2014
    Assignee: Invenpro (M) SDN. BHD.
    Inventors: Kae Jeng Ng, Kien Hui Liang, Kien Yew Liang
  • Publication number: 20140014135
    Abstract: A method for drying a workpiece using an apparatus comprising a liquid bath for immersing said workpiece, a deionized water supply for supplying deionized water to said bath, a partially enclosed volume of heated inert gas located above said liquid bath and a heated inert gas supply for supplying heated inert gas. A first holder is used for holding said workpiece in said liquid bath with a vertical orientation between the first holder and said liquid bath and a second holder, comprising a horizontal member, that is able to hold said at least one workpiece in such a way as to substantially prevent said workpiece from sliding along said horizontal member.
    Type: Application
    Filed: September 17, 2013
    Publication date: January 16, 2014
    Applicant: INVENPRO (M) SDN. BHD.
    Inventors: Kae Jeng Ng, Kien Hui Liang, Kien Yew Liang
  • Patent number: 8544482
    Abstract: An apparatus for drying a workpiece comprising a liquid bath for immersing said workpiece, a deionized water supply for supplying deionized water to said bath, a partially enclosed volume of heated inert gas located above said liquid bath and a heated inert gas supply for supplying heated inert gas. A first holder is used for holding said workpiece in said liquid bath with a vertical orientation between the first holder and said liquid bath and a second holder, comprising a horizontal member, that is able to hold said at least one workpiece in such a way as to substantially prevent said workpiece from sliding along said horizontal member.
    Type: Grant
    Filed: May 4, 2012
    Date of Patent: October 1, 2013
    Assignee: Invenpro (M) SDN. BHD.
    Inventors: Kae Jeng Ng, Kien Hui Liang, Kien Yew Liang
  • Patent number: 8465595
    Abstract: An apparatus and method for cleaning workpieces (5) using two pairs of substantially vertical rotating roller brushes (15) at each brush station whereby rotation of said brushes (15) propel workpieces (5) from one brush station to the next. Workpieces (5) are held for a predetermined period of time at each station by edgewheels (30, 31) which also rotate the workpieces (5). Cleaning fluid is sprayed onto workpieces (5) as they rotate to assist in removing particulate contamination. Method involves inserting a single workpiece (5) in between two pairs of rotating roller brushes (15) which scrub said workpiece as it is rotated by a pair of edgewheels (30, 31). There may be a divider shield (9) in between each brush station to prevent a large proportion of particulate matter and use cleaning fluid from traveling between the brush stations.
    Type: Grant
    Filed: June 27, 2012
    Date of Patent: June 18, 2013
    Assignee: Invenpro (M) SDN. BHD.
    Inventors: Kae Jeng Ng, Kien Hui Liang, Kien Yew Liang
  • Publication number: 20120324757
    Abstract: A method for drying workpieces includes immersing the workpieces in a liquid bath, raising the workpieces with a first holder until a central opening of the workpieces is visible above liquid surface, then using a dry second holder rod inserted through said central opening to continue raising process. Due to this, a drying portion of the workpiece is not held by a wet holding mechanism.
    Type: Application
    Filed: September 4, 2012
    Publication date: December 27, 2012
    Applicant: INVENPRO (M) SDN. BHD.
    Inventors: Kae Jeng NG, Kien Hui LIANG, Kien Yew LIANG
  • Patent number: 8302242
    Abstract: An apparatus and method for cleaning workpieces (5) using two pairs of substantially vertical rotating roller brushes (15) at each brush station whereby rotation of said brushes (15) propel workpieces (5) from one brush station to the next. Workpieces (5) are held for a predetermined period of time at each station by edgewheels (30, 31) which also rotate the workpieces (5). Cleaning fluid is sprayed onto workpieces (5) as they rotate to assist in removing particulate contamination. Method involves inserting a single workpiece (5) in between two pairs of rotating roller brushes (15) which scrub said workpiece as it is rotated by a pair of edgewheels (30, 31). There may be a divider shield (9) in between each brush station to prevent a large proportion of particulate matter and used cleaning fluid from traveling between the brush stations.
    Type: Grant
    Filed: April 18, 2008
    Date of Patent: November 6, 2012
    Assignee: Invenpro (M) SDN. BHD.
    Inventors: Kae Jeng Ng, Kien Hui Liang, Kien Yew Liang
  • Publication number: 20120260940
    Abstract: An apparatus and method for cleaning workpieces (5) using two pairs of substantially vertical rotating roller brushes (15) at each brush station whereby rotation of said brushes (15) propel workpieces (5) from one brush station to the next. Workpieces (5) are held for a predetermined period of time at each station by edgewheels (30, 31) which also rotate the workpieces (5). Cleaning fluid is sprayed onto workpieces (5) as they rotate to assist in removing particulate contamination. Method involves inserting a single workpiece (5) in between two pairs of rotating roller brushes (15) which scrub said workpiece as it is rotated by a pair of edgewheels (30, 31). There may be a divider shield (9) in between each brush station to prevent a large proportion of particulate matter and use cleaning fluid from traveling between the brush stations.
    Type: Application
    Filed: June 27, 2012
    Publication date: October 18, 2012
    Applicant: INVENPRO (M) SDN. BHD.
    Inventors: Kae Jeng NG, Kien Hui LIANG, Kien Yew LIANG
  • Publication number: 20120255191
    Abstract: A method for drying workpieces includes immersing the workpieces in a liquid bath, raising the workpieces with a first holder until a central opening of the workpieces is visible above liquid surface, then using a dry second holder rod inserted through said central opening to continue raising process. Due to this, a drying portion of the workpieces is not held by a wet holding mechanism.
    Type: Application
    Filed: May 4, 2012
    Publication date: October 11, 2012
    Applicant: INVENPRO (M) SDN. BHD.
    Inventors: Kae Jeng NG, Kien Hui LIANG, Kien Yew LIANG
  • Patent number: 8257507
    Abstract: A method for drying workpieces includes immersing the workpieces in a liquid bath, raising the workpieces with a first holder until a central opening of the workpieces is visible above liquid surface, then using a dry second holder rod inserted through said central opening to continue raising process. Due to this, a drying portion of the workpiece is not held by a wet holding mechanism.
    Type: Grant
    Filed: November 7, 2007
    Date of Patent: September 4, 2012
    Assignee: Invenpro (M) SDN. BHD.
    Inventors: Kae Jeng Ng, Kien Hui Liang, Kien Yew Liang
  • Publication number: 20110197931
    Abstract: The present invention relates to an apparatus (100) for washing a workpiece such as wafers, PC boards, hybrid circuits, precision mechanical or electromechanical components, optical instruments, medical devices or the like. Preferably, the apparatus (100) of the present invention can be used for washing disk drive components that have a substantially flat disc shape. The simple and easy to maintain structure of the present apparatus provides an uni-directional flow of washing liquid within the apparatus to remove contaminants from the surface of a workpiece in a submerged condition under streams of the washing liquid. The uni-directional flow of the washing liquid is achieved via a means which pumping a flow of washing liquid into the inlet and simultaneously extracting a flow of washing liquid out of the outlet of the apparatus (100). The uni-directional flow of the washing liquid is capable of preventing the removed contaminants from re-depositing onto the surface of the workpiece that has been cleaned.
    Type: Application
    Filed: July 31, 2009
    Publication date: August 18, 2011
    Applicant: INVENPRO (M) SDN. BHD.
    Inventors: Kae Jeng Ng, Kien Hui Liang, Kien Yew Liang
  • Publication number: 20100083984
    Abstract: An apparatus and method for cleaning workpieces (5) using two pairs of substantially vertical rotating roller brushes (15) at each brush station whereby rotation of said brushes (15) propel workpieces (5) from one brush station to the next. Workpieces (5) are held for a predetermined period of time at each station by edgewheels (30, 31) which also rotate the workpieces (5). Cleaning fluid is sprayed onto workpieces (5) as they rotate to assist in removing particulate contamination. Method involves inserting a single workpiece (5) in between two pairs of rotating roller brushes (15) which scrub said workpiece as it is rotated by a pair of edgewheels (30, 31). There may be a divider shield (9) in between each brush station to prevent a large proportion of particulate matter and used cleaning fluid from traveling between the brush stations.
    Type: Application
    Filed: April 18, 2008
    Publication date: April 8, 2010
    Applicant: Invenpro (M) Sdn. BGhd
    Inventors: Kae Jeng Ng, Kien Hui Liang, Kien Yew Liang
  • Publication number: 20100031975
    Abstract: A method for drying workpieces includes immersing the workpieces in a liquid bath, raising the workpieces with a first holder until a central opening of the workpieces is visible above liquid surface, then using a dry second holder rod inserted through said central opening to continue raising process. Due to this, a drying portion of the workpiece is not held by a wet holding mechanism.
    Type: Application
    Filed: November 7, 2007
    Publication date: February 11, 2010
    Applicant: Invenpro (M) Sdn. Bhd.
    Inventors: Kae Jeng Ng, Kien Hui Liang, Kien Yew Liang