Patents by Inventor Kim Joseph Blackwell

Kim Joseph Blackwell has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6337004
    Abstract: The adhesion of chromium-copper layer to polyimide has been greatly improved by a method which provides controlled reduction, rather than total elimination, of water content in the polyimide. The electronic packaging device which incorporates the flexible circuit prepared by the method exhibits greatly improved reliability. It is believed that the invention can be used to improve the adhesion between other organic materials having moisture affinity and materials comprising in-organics or between two organic materials.
    Type: Grant
    Filed: April 28, 1995
    Date of Patent: January 8, 2002
    Assignee: International Business Machines Corporation
    Inventors: Kim Joseph Blackwell, Pei Cheh Chen, Frank Daniel Egitto, Allan Robert Knoll, George Joseph Matarese, Luis Jesus Matienzo
  • Patent number: 6235411
    Abstract: A metallic layer is coated onto a polyimide substrate by sputtering a layer of chromium followed by a layer of copper whereby the rate of deposition of the chromium is about 4 angstroms/second or less.
    Type: Grant
    Filed: June 28, 1994
    Date of Patent: May 22, 2001
    Assignee: International Business Machines Corporation
    Inventors: Kim Joseph Blackwell, Pei Cheh Chen, Allan Robert Knoll, Luis Jesus Matienzo, Richard Dean Weale
  • Patent number: 5766499
    Abstract: A method of making a circuitized substrate wherein a dielectric layer is provided having a first layer of metallic material thereon. A first metallic member is formed on the dielectric's metallic layer, following which a pair of openings are precisely provided within a second dielectric material located on the dielectric. These openings in turn define a selected area on the first metallic member and, significantly, a precisely oriented pattern of the first metallic layer at a spaced distance from the metallic member. This metallic pattern serves as a mask to permit formation of an opening through the dielectric, which opening in turn may be engaged by tooling or the like such as may be used to position an electronic component, e.g., semiconductor device, on the underlying substrate.
    Type: Grant
    Filed: April 26, 1996
    Date of Patent: June 16, 1998
    Assignee: International Business Machines Corporation
    Inventors: Kim Joseph Blackwell, Daniel Peter Labzentis, Jonathan David Reid