Patents by Inventor Kim Marie Long

Kim Marie Long has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods of polishing sapphire surfaces
    Patent number: 9896604
    Abstract: Described herein are compositions, kits and methods for polishing sapphire surfaces using compositions having colloidal aluminosilicate particles in an aqueous acidic solution. In some aspects, the methods for polishing a sapphire surface may include abrading a sapphire surface with a rotating polishing pad and a polishing composition. The polishing composition may include an amount of a colloidal aluminosilicate and may have a pH of about 2.0 to about 7.0.
    Type: Grant
    Filed: March 12, 2014
    Date of Patent: February 20, 2018
    Assignee: ECOLAB USA INC.
    Inventors: Kim Marie Long, Michael A. Kamrath, Sean McCue
  • Kit for polishing sapphire surfaces
    Patent number: 9446493
    Abstract: Kits for polishing sapphire surfaces are disclosed. The kits have compositions including colloidal silica and the colloidal silica has a broad particle size distribution. The kits also include a polishing pad. The polishing pad may include polyurethane impregnated with polyester and it may have a compressibility of about 1% to about 40% and a Shore D hardness of about 50 to about 60.
    Type: Grant
    Filed: February 3, 2016
    Date of Patent: September 20, 2016
    Assignee: ECOLAB USA Inc.
    Inventors: Kim Marie Long, Michael A. Kamrath, Sean P. McCue
  • METHODS OF POLISHING SAPPHIRE SURFACES
    Publication number: 20160151876
    Abstract: Described herein are methods for polishing sapphire surfaces and compositions for polishing sapphire surfaces. Kits for polishing sapphire surfaces are also disclosed. The kits have compositions including colloidal silica and the colloidal silica has a broad particle size distribution. The kits also include a polishing pad. The polishing pad may include polyurethane impregnated with polyester and it may have a compressibility of about 1% to about 40% and a Shore D hardness of about 50 to about 60.
    Type: Application
    Filed: February 3, 2016
    Publication date: June 2, 2016
    Applicant: ECOLAB USA INC.
    Inventors: Kim Marie Long, Michael A. Kamrath, Sean P. McCue
  • Methods of polishing sapphire surfaces
    Patent number: 9283648
    Abstract: Described herein are methods for polishing sapphire surfaces using compositions comprising colloidal silica, wherein the colloidal silica has a broad particle size distribution.
    Type: Grant
    Filed: August 23, 2013
    Date of Patent: March 15, 2016
    Assignee: ECOLAB USA Inc.
    Inventors: Kim Marie Long, Michael Kamrath, Sean McCue
  • METHODS OF POLISHING SAPPHIRE SURFACES
    Publication number: 20140263170
    Abstract: Described herein are compositions, kits and methods for polishing sapphire surfaces using compositions having colloidal aluminosilicate particles in an aqueous acidic solution. In some aspects, the methods for polishing a sapphire surface may include abrading a sapphire surface with a rotating polishing pad and a polishing composition. The polishing composition may include an amount of a colloidal aluminosilicate and may have a pH of about 2.0 to about 7.0.
    Type: Application
    Filed: March 12, 2014
    Publication date: September 18, 2014
    Applicant: ECOLAB USA INC.
    Inventors: Kim Marie Long, Michael A. Kamrath, Sean McCue
  • METHODS OF POLISHING SAPPHIRE SURFACES
    Publication number: 20140057532
    Abstract: Described herein are methods for polishing sapphire surfaces using compositions comprising colloidal silica, wherein the colloidal silica has a broad particle size distribution.
    Type: Application
    Filed: August 23, 2013
    Publication date: February 27, 2014
    Inventors: Kim Marie Long, Michael Kamrath
  • METHODS OF POLISHING SAPPHIRE SURFACES
    Publication number: 20140057533
    Abstract: Described herein are methods for polishing sapphire surfaces using compositions comprising colloidal silica, wherein the colloidal silica has a broad particle size distribution.
    Type: Application
    Filed: August 23, 2013
    Publication date: February 27, 2014
    Inventors: Kim Marie Long, Michael Kamrath, Sean McCue