Patents by Inventor Kimberly A. Moeckli

Kimberly A. Moeckli has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for making polymers with intrinsic light-absorbing properties
    Patent number: 5578676
    Abstract: A composition and a method for forming an anti-reflective layer for DUV microlithographic processes is disclosed. The compositions of the present invention includes a polymer dissolved in a suitable solvent. The polymers are polysulfone and polyurea polymers which possess inherent light absorbing properties at deep ultraviolet wavelengths. In accordance with the method of the present invention, these compositions are applied to a substrate to form an anti-reflective coating, and thereafter a photoresist material that is compatible with the anti-reflective coating is applied.
    Type: Grant
    Filed: April 30, 1993
    Date of Patent: November 26, 1996
    Inventors: Tony Flaim, James Lamb, III, Kimberly A. Moeckli, Terry Brewer
  • Photolithographic article utilizing polymers with light-absorbing properties for anti-reflective coating
    Patent number: 5368989
    Abstract: A composition and a method for forming an anti-reflective layer for DUV microlithographic processes is disclosed. The compositions of the present invention includes a polymer dissolved in a suitable solvent. The polymers are polysulfone and polyurea polymers which possess inherent light absorbing properties at deep ultraviolet wavelengths. In accordance with the method of the present invention, these compositions are applied to a substrate to form an anti-reflective coating, and thereafter a photoresist material that is compatible with the anti-reflective coating is applied.
    Type: Grant
    Filed: April 30, 1993
    Date of Patent: November 29, 1994
    Assignee: Brewer Science, Inc.
    Inventors: Tony D. Flaim, James E. Lamb, III, Kimberly A. Moeckli, Terry Brewer
  • Polymers with intrinsic light-absorbing properties for anti-reflective coating applications in deep ultraviolet microlithography
    Patent number: 5234990
    Abstract: A composition and a method for forming an anti-reflective layer for DUV microlithographic processes is disclosed. The compositions of the present invention includes a polymer dissolved in a suitable solvent. The polymers are polysulfone and polyurea polymers which possess inherent light absorbing properties at deep ultraviolet wavelengths. In accordance with the method of the present invention, these compositions are applied to a substrate to form an anti-reflective coating, and thereafter a photoresist material that is compatible with the anti-reflective coating is applied.
    Type: Grant
    Filed: February 12, 1992
    Date of Patent: August 10, 1993
    Assignee: Brewer Science, Inc.
    Inventors: Tony Flaim, James Lamb, III, Kimberly A. Moeckli, Terry Brewer