Patents by Inventor Kimio Hashizume

Kimio Hashizume has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5248351
    Abstract: A copper alloy for an electronic device comprises 2.0 wt% -8 wt% of Ni, 0.1 wt% -0.8 wt% of P, 0.06 wt% -1 wt% of Si and the rest being Cu and unavoidable impurities.The rest may include 0.03 wt% -2.0 wt% of Zn. The copper allow has an oxygen content of 20 ppm or less.
    Type: Grant
    Filed: February 18, 1992
    Date of Patent: September 28, 1993
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Kenji Kubozono, Takashi Nakagima, Takefumi Itou, Kimio Hashizume, Shinichi Iwase
  • Patent number: 5167557
    Abstract: A method for manufacturing a shadow mask is used for color television picture tubes and the like. The surface of a shadow mask body, made of Fe-Ni type alloy, is ion-nitriding processed so as to make the most of the low thermal expansion property inherent in the alloy. The result is that the color purity degradation caused by the thermal expansion at temperature increases of the mask, and by the resonance of the mask itself, can be prevented, thereby realizing a shadow mask serving to render a highly refined CRT.
    Type: Grant
    Filed: January 8, 1991
    Date of Patent: December 1, 1992
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Hiroyuki Teramoto, Kimio Hashizume, Tetsuya Watanabe, Hideya Ito
  • Patent number: 5064611
    Abstract: An improved method for producing a copper alloy, wherein a molten metal consisting essentially of 1.0 to 8% by weight of Ni, 0.1 to 0.8% by weight of P, 0.06 to 1.0% by weight of Si, and a remainder of Cu and unavoidable impurities (or a molten metal consisting essentially of 1.0 to 8% by weight of Ni, 0.1 to 0.8% by weight of P, 0.06 to 1.0% by weight of Si, 0.03 to 0.5% by weight of Zn, and a remainder of Cu and unavoidable impurities) is quenched to solidify, at a cooling rate in the range from 10.sup.2 .degree. C./sec. to 10.sup.5 .degree. C./sec., and continuously cooling in succession said solidified metal to a normal temperature, to cause an intermetallic compound of Ni-P and Ni-Si to be finely and uniformly dispersed into the matrix material.
    Type: Grant
    Filed: January 17, 1991
    Date of Patent: November 12, 1991
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Kimio Hashizume, Keizo Kitakaze, Takefumi Itou
  • Patent number: 5028282
    Abstract: A Cu-Ni-Sn alloy with excellent fatigue properties comprising 6 to 25 wt % of Ni, 4 to 9 wt % of Sn, 0.04 to 5 wt % in total of at least one element selected from the following elements:Zn . . . 0.03-4 wt %, Zr . . . 0.01-0.2 wt %,Mn . . . 0.03-1.5 wt %, Fe . . . 0.03-0.7 wt %,Mg . . . 0.03-0.5 wt %, P . . . 0.01-0.5 wt %,Ti . . . 0.03-0.7 wt %, B . . . 0.001-0.1 wt %,Cr . . . 0.03-0.7 wt %, Co . . . 0.01-0.5 wt %,and the rest being substantially Cu, and subjected, before final finish working, to heat treatment for structure arrangement at a temperature of 500.degree. to 770.degree. C., then to finish working of at most 50%, followed by age treatment at a temperature of 350.degree. to 500.degree. C. for 3 to 300 minutes.
    Type: Grant
    Filed: January 3, 1990
    Date of Patent: July 2, 1991
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Kenji Kubozono, Kimio Hashizume, Teruo Nakanishi
  • Patent number: 4950451
    Abstract: A copper alloy for an electronic device comprises 1.0 wt %-4.0 wt % of Ni, more than 0.2 wt % and less than 0.8 wt % of P, 0.5 wt %-6.0 wt % of Zn and the rest being copper and unavoidable impurities. The rest may include 0.05 wt %-1.0 wt % of Mg.A wire of the above-mentioned copper alloy is prepared by heating the copper alloy having the composition described above at temperature of 750.degree. C.-950.degree. C. for more than one minute before the final rolling operation, and then, heating the material at a temperature of 350.degree. C.-500.degree. C., or slowly cooling it at a rate of 4.degree. C./min. or less, or cooling it at a rate of 1.degree. C./min. or more until temperature reaches 500.degree. C. and keeping its temperature for at least one hour in a temperature range of 500.degree. C.-350.degree. C.
    Type: Grant
    Filed: March 21, 1989
    Date of Patent: August 21, 1990
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Takashi Nakajima, Kenji Kubozono, Takefumi Itou, Kimio Hashizume, Shinichi Iwase