Patents by Inventor Kimitoshi MIURA

Kimitoshi MIURA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate processing apparatus, simulation apparatus, storage medium and simulation method
    Patent number: 9558304
    Abstract: A substrate processing apparatus includes a substrate processing apparatus, including: a substrate processing chamber configured to accommodate a substrate and process the substrate; a piping coupled to the substrate processing chamber to allow a gas for processing the substrate to be introduced therethrough; and a simulation apparatus configured to simulate a path in which the gas for processing the substrate flows through the piping. The simulation apparatus includes: an information acquisition unit configured to acquire gas flow information defined by an operation mode in which the substrate is processed; a path determination unit configured to determine a gas path based on the gas flow information acquired by the information acquisition unit; and a simulation unit configured to simulate a flow of the gas by putting a color defined according to the type of gas on the gas path determined by the path determination unit.
    Type: Grant
    Filed: February 14, 2014
    Date of Patent: January 31, 2017
    Assignee: TOYKO ELECTRON LIMITED
    Inventors: Satoko Yamamoto, Kimitoshi Miura
  • SUBSTRATE PROCESSING APPARATUS, SIMULATION APPARATUS, STORAGE MEDIUM AND SIMULATION METHOD
    Publication number: 20140236556
    Abstract: A substrate processing apparatus includes a substrate processing apparatus, including: a substrate processing chamber configured to accommodate a substrate and process the substrate; a piping coupled to the substrate processing chamber to allow a gas for processing the substrate to be introduced therethrough; and a simulation apparatus configured to simulate a path in which the gas for processing the substrate flows through the piping. The simulation apparatus includes: an information acquisition unit configured to acquire gas flow information defined by an operation mode in which the substrate is processed; a path determination unit configured to determine a gas path based on the gas flow information acquired by the information acquisition unit; and a simulation unit configured to simulate a flow of the gas by putting a color defined according to the type of gas on the gas path determined by the path determination unit.
    Type: Application
    Filed: February 14, 2014
    Publication date: August 21, 2014
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Satoko YAMAMOTO, Kimitoshi MIURA